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1.发明申请FIBER SOI SUBSTRATE, SEMICONDUCTOR DEVICE USING THIS, AND MANUFACTURING METHOD THEREOF 有权光纤SOI衬底，使用此的半导体器件及其制造方法公开(公告)号：US20130023090A1
公开(公告)日：2013-01-24
申请号：US13614512
申请日：2012-09-13
CPC分类号： H01L29/78603 , H01L21/0242 , H01L21/02428 , H01L21/02532 , H01L21/02686 , H01L21/67069 , H01L21/84 , H01L27/016 , H01L27/12
摘要： The present invention provides a SOI substrate that can realize a composite device formed of a MOS integrated circuit and a passive device and can reduce a size and a manufacturing cost of a semiconductor device. There is provided a fiber SOI substrate 5 comprising a fiber 1 with a polygonal cross section, and a semiconductor thin film 3 crystallized after film formation on at least one surface of the fiber 1, and a plurality of grooves 8 that extend in a linear direction of the fiber 1 and are arranged at intervals in a width direction are formed on a surface of the fiber 1.
摘要翻译： 本发明提供一种可以实现由MOS集成电路和无源器件形成的复合器件的SOI衬底，并且可以减小半导体器件的尺寸和制造成本。 提供了一种光纤SOI衬底5，其包括具有多边形截面的光纤1和在光纤1的至少一个表面上成膜之后结晶的半导体薄膜3以及沿线性方向延伸的多个凹槽8 在纤维1的表面上形成宽度方向的间隔。
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公开(公告)号：US07883778B2
公开(公告)日：2011-02-08
申请号：US11626007
申请日：2007-01-23
IPC分类号： B32B9/00
CPC分类号： G11B5/8404 , C03B23/037 , C03C2204/08 , C03C2218/355 , G11B5/7315 , Y02P40/57 , Y10T428/24355
摘要： A sheet glass that has a side surface with an average surface roughness equal to or less than 0.2 μm is provided. Furthermore, a method of manufacturing a sheet glass is provided that includes processing a base-material glass sheet to obtain a sheet glass that has a side surface with an average surface roughness equal to or less than 0.2 μm. Moreover, a method of manufacturing a sheet glass is provided that includes processing a base-material glass sheet so that an average surface roughness of a side surface becomes equal to or less than a predetermined value according to a section modulus of the sheet glass that is to be manufactured.
摘要翻译： 提供具有等于或小于0.2μm的平均表面粗糙度的侧表面的平板玻璃。 此外，提供一种制造平板玻璃的方法，其包括加工基材玻璃板以获得具有等于或小于0.2μm的平均表面粗糙度的侧表面的平板玻璃。 此外，提供一种片状玻璃的制造方法，其包括：将基材玻璃板加工成使得侧面的平均表面粗糙度根据作为玻璃板的片状玻璃的截面模数而成为规定值以下 被制造。
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3.发明授权Fiber SOI substrate, semiconductor device using this, and manufacturing method thereof 有权光纤SOI衬底，使用该半导体器件的半导体器件及其制造方法公开(公告)号：US08598017B2
公开(公告)日：2013-12-03
申请号：US13614512
申请日：2012-09-13
IPC分类号： H01L21/20
CPC分类号： H01L29/78603 , H01L21/0242 , H01L21/02428 , H01L21/02532 , H01L21/02686 , H01L21/67069 , H01L21/84 , H01L27/016 , H01L27/12
摘要： The present invention provides a SOI substrate that can realize a composite device formed of a MOS integrated circuit and a passive device and can reduce a size and a manufacturing cost of a semiconductor device. There is provided a fiber SOI substrate 5 comprising a fiber 1 with a polygonal cross section, and a semiconductor thin film 3 crystallized after film formation on at least one surface of the fiber 1, and a plurality of grooves 8 that extend in a linear direction of the fiber 1 and are arranged at intervals in a width direction are formed on a surface of the fiber 1.
摘要翻译： 本发明提供一种可以实现由MOS集成电路和无源器件形成的复合器件的SOI衬底，并且可以减小半导体器件的尺寸和制造成本。 提供了一种光纤SOI衬底5，其包括具有多边形截面的光纤1和在光纤1的至少一个表面上成膜之后结晶的半导体薄膜3以及沿线性方向延伸的多个凹槽8 在纤维1的表面上形成宽度方向的间隔。
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公开(公告)号：US08418503B2
公开(公告)日：2013-04-16
申请号：US12987420
申请日：2011-01-10
IPC分类号： C03B23/037
CPC分类号： G11B5/8404 , C03B23/037 , C03C2204/08 , C03C2218/355 , G11B5/7315 , Y02P40/57 , Y10T428/24355
摘要： A sheet glass that has a side surface with an average surface roughness equal to or less than 0.2 μm is provided. Furthermore, a method of manufacturing a sheet glass is provided that includes processing a base-material glass sheet to obtain a sheet glass that has a side surface with an average surface roughness equal to or less than 0.2 μm. Moreover, a method of manufacturing a sheet glass is provided that includes processing a base-material glass sheet so that an average surface roughness of a side surface becomes equal to or less than a predetermined value according to a section modulus of the sheet glass that is to be manufactured.
摘要翻译： 提供具有等于或小于0.2μm的平均表面粗糙度的侧表面的平板玻璃。 此外，提供一种制造平板玻璃的方法，其包括加工基材玻璃板以获得具有等于或小于0.2μm的平均表面粗糙度的侧表面的平板玻璃。 此外，提供一种片状玻璃的制造方法，其包括：将基材玻璃板加工成使得侧面的平均表面粗糙度根据作为玻璃板的片状玻璃的截面模数而成为规定值以下 被制造。
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公开(公告)号：US20110100059A1
公开(公告)日：2011-05-05
申请号：US12987420
申请日：2011-01-10
IPC分类号： C03B23/037
CPC分类号： G11B5/8404 , C03B23/037 , C03C2204/08 , C03C2218/355 , G11B5/7315 , Y02P40/57 , Y10T428/24355
摘要： A sheet glass that has a side surface with an average surface roughness equal to or less than 0.2 μm is provided. Furthermore, a method of manufacturing a sheet glass is provided that includes processing a base-material glass sheet to obtain a sheet glass that has a side surface with an average surface roughness equal to or less than 0.2 μm. Moreover, a method of manufacturing a sheet glass is provided that includes processing a base-material glass sheet so that an average surface roughness of a side surface becomes equal to or less than a predetermined value according to a section modulus of the sheet glass that is to be manufactured.
摘要翻译： 提供具有等于或小于0.2μm的平均表面粗糙度的侧表面的平板玻璃。 此外，提供一种制造平板玻璃的方法，其包括加工基材玻璃板以获得具有等于或小于0.2μm的平均表面粗糙度的侧表面的平板玻璃。 此外，提供一种片状玻璃的制造方法，其包括：将基材玻璃板加工成使得侧面的平均表面粗糙度根据作为玻璃板的片状玻璃的截面模数而成为规定值以下 被制造。
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6.发明申请Method of forming continuous thin film and linear glass substrate with thin film 有权用薄膜形成连续薄膜和线性玻璃基板的方法公开(公告)号：US20100021727A1
公开(公告)日：2010-01-28
申请号：US12232183
申请日：2008-09-11
IPC分类号： C23C16/513 , C23C16/00 , B32B37/00
CPC分类号： C23C16/4583 , C03C17/002 , C03C17/09 , C03C2217/268 , C03C2218/152 , C23C16/24 , C23C16/46 , C23C16/545 , H01L21/02422 , H01L21/02532 , H01L21/0262 , H01L21/67109 , Y10T428/266
摘要： A method of continuously forming a thin film includes the step of: moving a glass substrate with a thin strip shape having a constant db/2(d+b), where d is a thickness thereof and b is a width thereof in a cross section thereof, within a range from 0.015 to 0.15 through a film depositing region in which a reaction gas is supplied and a temperature is controlled to be high so that the glass substrate is rapidly heated; and moving continuously the glass substrate, immediately after the film depositing region, to pass through a cooling region in which a temperature is lower than that of the film depositing region, so that the glass substrate is rapidly cooled and the thin film formed of a component of the reaction gas is formed on the glass substrate.
摘要翻译： 连续形成薄膜的方法包括以下步骤：移动具有恒定db / 2（d + b）的细条形状的玻璃基板，其中d是其厚度，b是其横截面的宽度 在0.015〜0.15的范围内，通过供给反应气体并控制温度高的膜沉积区域，使得玻璃基板迅速加热; 并且在膜沉积区域之后立即移动玻璃基板以通过温度低于成膜区域的温度的冷却区域，使得玻璃基板被快速冷却，并且由部件形成的薄膜 在玻璃基板上形成反应气体。
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7.发明授权Apparatus for manufacturing an optical fiber soot, and method for manufacturing an optical fiber soot using thereof 有权用于制造光纤烟灰的设备，以及使用其制造光纤烟灰的方法公开(公告)号：US06941773B2
公开(公告)日：2005-09-13
申请号：US09964623
申请日：2001-09-28
申请人： Hiroyuki Wada , Kiyoshi Arima , Masahide Kuwabara , Sadayuki Toda
发明人： Hiroyuki Wada , Kiyoshi Arima , Masahide Kuwabara , Sadayuki Toda
IPC分类号： G02B6/00 , C03B37/014 , C03B37/018
CPC分类号： C03B37/0144 , C03B37/01406 , C03B37/0142 , C03B2207/46 , C03B2207/50 , Y02P40/57
摘要： An apparatus for manufacturing an optical fiber soot, which comprises a core partition having an opening portion at core burner side provided on a periphery of a core burner, in a reactor of the apparatus to be used in a conventional VAD method.
摘要翻译： 一种用于制造光纤烟灰的装置，其包括在常规VAD方法中使用的装置的反应器中的具有在核心燃烧器的周围设置的核心燃烧器侧的开口部分的芯分隔件。
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8.发明授权公开(公告)号：US08758637B2
公开(公告)日：2014-06-24
申请号：US12242025
申请日：2008-09-30
申请人： Takeshi Hirayama , Imei Shu , Sadayuki Toda , Hisashi Koaizawa , Masaru Hori
发明人： Takeshi Hirayama , Imei Shu , Sadayuki Toda , Hisashi Koaizawa , Masaru Hori
IPC分类号： B44C1/22
CPC分类号： H02G1/1275 , G02B6/245 , H02G1/1287
摘要： An apparatus of removing coatings of a line-shaped body of the invention includes a non-equilibrium atmospheric pressure plasma source with radicals controlled, having a plasma generating gas, a microwave, a micro gap; a line-shaped body holding portion for holding the line-shaped body within a range of 2 to 3 mm from an electrode to generate a plasma jet; and a moving stage for relatively moving the line-shaped body in the longitudinal direction thereof.
摘要翻译： 除去本发明的线状体的涂层的装置包括具有自由基控制的非平衡大气压等离子体源，具有等离子体产生气体，微波，微隙; 线状体保持部，其将线状体保持在距离电极2〜3mm的范围内，以产生等离子体射流; 以及用于使线状体沿其纵向方向相对移动的移动台。
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9.发明授权Method of forming continuous thin film and linear glass substrate with thin film 有权用薄膜形成连续薄膜和线性玻璃基板的方法公开(公告)号：US08673396B2
公开(公告)日：2014-03-18
申请号：US12232183
申请日：2008-09-11
IPC分类号： C23C16/24 , C23C16/458 , C23C16/54 , C23C16/46 , H01L21/02
CPC分类号： C23C16/4583 , C03C17/002 , C03C17/09 , C03C2217/268 , C03C2218/152 , C23C16/24 , C23C16/46 , C23C16/545 , H01L21/02422 , H01L21/02532 , H01L21/0262 , H01L21/67109 , Y10T428/266
摘要： A method of continuously forming a thin film includes the step of: moving a glass substrate with a thin strip shape having a constant db/2(d+b), where d is a thickness thereof and b is a width thereof in a cross section thereof, within a range from 0.015 to 0.15 through a film depositing region in which a reaction gas is supplied and a temperature is controlled to be high so that the glass substrate is rapidly heated; and moving continuously the glass substrate, immediately after the film depositing region, to pass through a cooling region in which a temperature is lower than that of the film depositing region, so that the glass substrate is rapidly cooled and the thin film formed of a component of the reaction gas is formed on the glass substrate.
摘要翻译： 连续形成薄膜的方法包括以下步骤：移动具有恒定db / 2（d + b）的细条形状的玻璃基板，其中d是其厚度，b是其横截面的宽度 在0.015〜0.15的范围内，通过供给反应气体并控制温度高的膜沉积区域，使得玻璃基板迅速加热; 并且在膜沉积区域之后立即移动玻璃基板以通过温度低于成膜区域的温度的冷却区域，使得玻璃基板被快速冷却，并且由部件形成的薄膜 在玻璃基板上形成反应气体。
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10.发明申请公开(公告)号：US20090223929A1
公开(公告)日：2009-09-10
申请号：US12242025
申请日：2008-09-30
申请人： Takeshi HIRAYAMA , Imei SHU , Sadayuki TODA , Hisashi KOAIZAWA , Masaru HORI
发明人： Takeshi HIRAYAMA , Imei SHU , Sadayuki TODA , Hisashi KOAIZAWA , Masaru HORI
CPC分类号： H02G1/1275 , G02B6/245 , H02G1/1287
摘要： An apparatus of removing coatings of a line-shaped body of the invention includes a non-equilibrium atmospheric pressure plasma source with radicals controlled, having a plasma generating gas, a microwave, a micro gap; a line-shaped body holding portion for holding the line-shaped body within a range of 2 to 3 mm from an electrode to generate a plasma jet; and a moving stage for relatively moving the line-shaped body in the longitudinal direction thereof.
摘要翻译： 除去本发明的线状体的涂层的装置包括具有自由基控制的非平衡大气压等离子体源，具有等离子体产生气体，微波，微隙; 线状体保持部，其将线状体保持在距离电极2〜3mm的范围内，以产生等离子体射流; 以及用于使线状体沿其纵向方向相对移动的移动台。
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