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公开(公告)号：US07045275B2
公开(公告)日：2006-05-16
申请号：US10462389
申请日：2003-06-16
CPC分类号： G11B5/3967 , G11B5/1871 , G11B5/3116 , G11B5/3163 , G11B5/3166 , H01J37/3056 , H01J2237/30438 , Y10S430/143 , Y10T428/11 , Y10T428/1186
摘要： This invention relates to a multi-layer lithographically fabricated device used to produce improved thin-film recording heads. It further relates to a focused particle beam system for milling a recording head pole-tip assembly without irradiating a sensitive structure, e.g. a read head, of the recording head. The invention precisely forms a pole-tip assembly by milling a second structural element without irradiating a first structural element. The invention avoids irradiating the first structural element by placing a first marker element, which can be imaged and/or damaged, in the same layer of a multi-layer lithographically fabricated device as the first structural element. The marker element has a fixed spatial relationship to the first structural element. Thus, by imaging the first marker element and the second structural element, and knowing the separation between the first structural element and the first marker element, a focused particle beam system can determine the relative location of the first and second structural elements. Consequently, the focused particle beam system can determine, without irradiating the sensitive first structural element, which portions of the second structural element require milling. In this manner, the focused particle beam system mills the second structural element to produce a desired pole-tip configuration. By producing a desired pole-tip configuration, these methods and apparatus produce an improved recording head capable of higher storage density than prior art techniques.
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公开(公告)号：US06579665B2
公开(公告)日：2003-06-17
申请号：US10085490
申请日：2002-02-28
IPC分类号： G11B5127
CPC分类号： G11B5/3967 , G11B5/1871 , G11B5/3116 , G11B5/3163 , G11B5/3166 , H01J37/3056 , H01J2237/30438 , Y10S430/143 , Y10T428/11 , Y10T428/1186
摘要： This invention relates to a multi-layer lithographically fabricated device used to produce improved thin-film recording heads. It further relates to a focused particle beam system for milling a recording head pole-tip assembly without irradiating a sensitive structure, e.g. a read head, of the recording head. The invention precisely forms a pole-tip assembly by milling a second structural element without irradiating a first structural element. The invention avoids irradiating the first structural element by placing a first marker element, which can be imaged and/or damaged, in the same layer of a multi-layer lithographically fabricated device as the first structural element. The marker element has a fixed spatial relationship to the first structural element. Thus, by imaging the first marker element and the second structural element, and knowing the separation between the first structural element and the first marker element, a focused particle beam system can determine the relative location of the first and second structural elements. Consequently, the focused particle beam system can determine, without irradiating the sensitive first structural element, which portions of the second structural element require milling. In this manner, the focused particle beam system mills the second structural element to produce a desired pole-tip configuration. By producing a desired pole-tip configuration, these methods and apparatus produce an improved recording head capable of higher storage density than prior art techniques.
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公开(公告)号：US6004437A
公开(公告)日：1999-12-21
申请号：US810837
申请日：1997-03-04
CPC分类号： G11B5/3967 , G11B5/1871 , G11B5/3116 , G11B5/3163 , G11B5/3166 , H01J37/3056 , H01J2237/30438 , Y10S430/143 , Y10T428/11 , Y10T428/1186
摘要： This invention relates to a multi-layer lithographically fabricated device used to produce improved thin-film recording heads. It further relates to a focused particle beam system for milling a recording head pole-tip assembly without irradiating a sensitive structure, e.g. a read head, of the recording head. The invention precisely forms a pole-tip assembly by milling a second structural element without irradiating a first structural element. The invention avoids irradiating the first structural element by placing a first marker element, which can be imaged and/or damaged, in the same layer of a multi-layer lithographically fabricated device as the first structural element. The marker element has a fixed spatial relationship to the first structural element. Thus, by imaging the first marker element and the second structural element, and knowing the separation between the first structural element and the first marker element, a focused particle beam system can determine the relative location of the first and second structural elements. Consequently, the focused particle beam system can determine, without irradiating the sensitive first structural element, which portions of the second structural element require milling. In this manner, the focused particle beam system mills the second structural element to produce a desired pole-tip configuration. By producing a desired pole-tip configuration, these methods and apparatus produce an improved recording head capable of higher storage density than prior art techniques.
摘要翻译： 本发明涉及用于生产改进的薄膜记录头的多层光刻制造装置。 它还涉及一种用于在不照射敏感结构的情况下研磨记录头极尖组件的聚焦粒子束系统。 读头，记录头。 本发明通过研磨第二结构元件而不照射第一结构元件来精确地形成极尖组件。 本发明通过将可以成像和/或损坏的第一标记元件放置在与第一结构元件相同的多层光刻制造器件的相同层中来避免照射第一结构元件。 标记元件与第一结构元件具有固定的空间关系。 因此，通过对第一标记元件和第二结构元件进行成像，并且知道第一结构元件和第一标记元件之间的间隔，聚焦的粒子束系统可以确定第一和第二结构元件的相对位置。 因此，聚焦的粒子束系统可以在不照射敏感的第一结构元件的情况下确定第二结构元件的哪些部分需要研磨。 以这种方式，聚焦的粒子束系统研磨第二结构元件以产生期望的极尖构造。 通过产生期望的极尖构造，这些方法和装置产生能够比现有技术更高的存储密度的改进的记录头。
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4.发明授权公开(公告)号：US06354438B1
公开(公告)日：2002-03-12
申请号：US09370753
申请日：1999-08-09
申请人： Randall Grafton Lee , Charles J. Libby , Donald E. Yansen , Gregory J. Athas , Raymond Hill , Russell Mello
发明人： Randall Grafton Lee , Charles J. Libby , Donald E. Yansen , Gregory J. Athas , Raymond Hill , Russell Mello
IPC分类号： C23C1454
CPC分类号： G11B5/3967 , G11B5/1871 , G11B5/3116 , G11B5/3163 , G11B5/3166 , H01J37/3056 , H01J2237/30438 , Y10S430/143 , Y10T428/11 , Y10T428/1186
摘要： This invention relates to a multi-layer lithographically fabricated device used to produce improved thin-film recording heads. It further relates to a focused particle beam system for milling a recording head pole-tip assembly without irradiating a sensitive structure, e.g. a read head, of the recording head. The invention precisely forms a pole-tip assembly by milling a second structural element without irradiating a first structural element. The invention avoids irradiating the first structural element by placing a first marker element, which can be imaged and/or damaged, in the same layer of a multi-layer lithographically fabricated device as the first structural element. The marker element has a fixed spatial relationship to the first structural element. Thus, by imaging the first marker element and the second structural element, and knowing the separation between the first structural element and the first marker element, a focused particle beam system can determine the relative location of the first and second structural elements. Consequently, the focused particle beam system can determine, without irradiating the sensitive first structural element, which portions of the second structural element require milling. In this manner, the focused particle beam system mills the second structural element to produce a desired pole-tip configuration. By producing a desired pole-tip configuration, these methods and apparatus produce an improved recording head capable of higher storage density than prior art techniques.
摘要翻译： 本发明涉及用于生产改进的薄膜记录头的多层光刻制造装置。 它还涉及一种用于在不照射敏感结构的情况下研磨记录头极尖组件的聚焦粒子束系统。 读头，记录头。 本发明通过研磨第二结构元件而不照射第一结构元件来精确地形成极尖组件。 本发明通过将可以成像和/或损坏的第一标记元件放置在与第一结构元件相同的多层光刻制造器件的相同层中来避免照射第一结构元件。 标记元件与第一结构元件具有固定的空间关系。 因此，通过对第一标记元件和第二结构元件进行成像，并且知道第一结构元件和第一标记元件之间的间隔，聚焦的粒子束系统可以确定第一和第二结构元件的相对位置。 因此，聚焦的粒子束系统可以在不照射敏感的第一结构元件的情况下确定第二结构元件的哪些部分需要研磨。 以这种方式，聚焦的粒子束系统研磨第二结构元件以产生期望的极尖构造。 通过产生期望的极尖构造，这些方法和装置产生能够比现有技术更高的存储密度的改进的记录头。
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