公开(公告)号：US06559454B1

公开(公告)日：2003-05-06

申请号：US09763546

申请日：2001-05-29

Applicant: Adrian John Murrell ,  Erik Jan Hilda Collart ,  Bernard Francis Harrison ,  Amir Al-Bayati ,  Chris James Burgess ,  David Armour ,  Andrew Holmes ,  Simon Povall ,  Drew Arnold ,  Paul Anthony Burfield

Inventor： Adrian John Murrell ,  Erik Jan Hilda Collart ,  Bernard Francis Harrison ,  Amir Al-Bayati ,  Chris James Burgess ,  David Armour ,  Andrew Holmes ,  Simon Povall ,  Drew Arnold ,  Paul Anthony Burfield

IPC: H01J3715

CPC classification number: H01J27/022 ,  H01J2237/08 ,  H01J2237/31701

Abstract: An ion beam generation apparatus comprising an ion source (20) for generating ions, and a tetrode extraction assembly (11) comprising four electrodes for extracting and accelerating ions from the ion source. The extraction assembly comprises a source electrode (22) at the potential of the ion source, an extraction electrode (23) adjacent to the source electrode to extract ions from the ion source (20), a ground electrode (25), and a suppression electrode (24) between the extraction electrode and the ground electrode. Each electrode has an aperture to allow the ion beam to pass therethrough. The gap between the extraction (23) and suppression (24) electrodes is variable in the direction of ion beam travel.

Abstract translation: 一种离子束产生装置，包括用于产生离子的离子源（20）和四极提取组件（11），其包括用于从离子源提取和加速离子的四个电极。 提取组件包括位于离子源电位的源电极（22），与源电极相邻的提取电极（23），用于从离子源（20）提取离子，接地电极（25）和抑制 提取电极和接地电极之间的电极（24）。 每个电极具有允许离子束通过的孔。 提取（23）和抑制（24）电极之间的间隙在离子束行进方向上是可变的。

公开(公告)号：US5886355A

公开(公告)日：1999-03-23

申请号：US700268

申请日：1996-08-20

Applicant: Nicholas Bright ,  Paul Anthony Burfield ,  John Pontefract ,  Bernard Francis Harrison ,  Peter Meares ,  David R. Burgin ,  Andrew Stephen Devaney ,  Peter Torin Kindersley

Inventor： Nicholas Bright ,  Paul Anthony Burfield ,  John Pontefract ,  Bernard Francis Harrison ,  Peter Meares ,  David R. Burgin ,  Andrew Stephen Devaney ,  Peter Torin Kindersley

IPC: H01J27/02 ,  H01J27/08 ,  H01J27/18 ,  H01J27/00

CPC classification number: H01J27/18 ,  H01J27/022 ,  H01J27/08 ,  H01J2237/31701 ,  H01J2237/31705

Abstract: Ion implantation equipment is modified so as to provide filament reflectors to a filament inside of an arc chamber, and to remove the electrical insulators for the filament outside of the arc chamber and providing a means of shielding, thereby reducing the formation of a conductive layer on said insulators and greatly extending the lifetime and reducing downtime of the equipment. The efficiency of the equipment is further enhanced by means of an interchangeable liner for the arc chamber that increases the wall temperature of the arc chamber and thus the electron temperature. The use of tungsten parts inside the arc chamber, obtained either by making the arc chamber itself or portions thereof of tungsten, particularly the front plate having the exit aperture for the ion beam, or by inserting a removable tungsten liner therein, decreases contamination of the ion beam. Serviceability of the arc chamber is improved by means of a unitary clamp that separately grips both the filament and filament reflectors. This clamp can also advantageously be made of tungsten.

Abstract translation: 离子注入设备被修改，以便为电弧室内的灯丝提供灯丝反射器，并且去除电弧室外的灯丝的电绝缘体并提供屏蔽装置，从而减少导电层的形成 表示绝缘子，大大延长了使用寿命，减少了设备停机时间。 通过用于电弧室的可更换衬垫进一步提高了设备​​的效率，从而提高了电弧室的壁温，从而提高了电子温度。 通过使电弧室本身或其部分的钨，特别是具有用于离子束的出射孔的前板或通过在其中插入可移除的钨衬垫而获得的钨部件的使用减少了 离子束。 电弧室的可维护性通过单独夹紧来改善，该夹具分别夹住灯丝和灯丝反射器。 该夹具还可以有利地由钨制成。