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    TREATED SUBSTRATES
    7.
    发明公开
    TREATED SUBSTRATES 审中-公开

    公开(公告)号：US20230203699A1

    公开(公告)日：2023-06-29

    申请号：US18169148

    申请日：2023-02-14

    Applicant: PRC-DeSoto International, Inc.

    Inventor： Gordon L. Post ,  Michael A. Mayo ,  Edward F. Rakiewicz ,  Michael J. Pawlik

    IPC: C25D5/34 ,  C25D9/08 ,  C25D9/10 ,  C25D9/12

    CPC classification number: C25D5/34 ,  C25D9/08 ,  C25D9/10 ,  C25D9/12

    Abstract: Methods for treating a substrate are disclosed. The substrate is deoxidized and then immersed in an electrodepositable pretreatment composition comprising a lanthanide series element and/or a Group IIIB metal, an oxidizing agent, and a metal-complexing agent to deposit a coating from the electrodepositable pretreatment composition onto a surface of the substrate. Optionally, the electrodepositable pretreatment composition may comprise a surfactant. A coating from a spontaneously depositable pretreatment composition comprising a Group IIIB and/or Group IVB metal may be deposited on the substrate surface prior to electrodepositing a coating from the electrodepositable pretreatment composition. Following electrodeposition of the electrodepositable pretreatment composition, the substrate optionally may be contacted with a sealing composition comprising phosphate and a Group IIIB and/or IVB metal. Substrates treated according to the methods also are disclosed.

    MASK AND AIR PRESSURE CONTROL SYSTEMS FOR USE IN COATING DEPOSITION
    8.
    发明公开
    MASK AND AIR PRESSURE CONTROL SYSTEMS FOR USE IN COATING DEPOSITION 审中-公开

    公开(公告)号：US20230173523A1

    公开(公告)日：2023-06-08

    申请号：US17997937

    申请日：2021-05-07

    Applicant: PRC-Desoto International, Inc.

    Inventor： Yong Han Yeong ,  Mehran Arbab ,  Adam Colbourne ,  Jonny Waite ,  Henry Rolt ,  Simon Kew ,  Alan Hudd

    IPC: B05B12/22 ,  B05B14/00

    CPC classification number: B05B12/22 ,  B05B14/00

    Abstract: A mask and air pressure control system for use in coating deposition is disclosed. A method is provided for controlling liquid coating droplets during deposition onto a substrate by directing atomized liquid coating droplets in a flow path toward the substrate, and applying a vacuum or pressurized air from an air pressure control system to at least a portion of the atomized liquid coating droplets in the flow path. The air pressure control mask comprises an air pressure control fixture structured and arranged for connection to a source of vacuum or pressurized air, and a nozzle opening structured and arranged to at least partially surround a flow path of the liquid coating droplets and to selectively allow at least a portion of the liquid coating droplets to pass through the air pressure control mask, wherein the vacuum or pressurized air prevents at least a portion of oversprayed liquid coating droplets from being deposited on the substrate outside an intended edge of the coating.

    Low nucleation temperature polythioether prepolymers and uses thereof
    10.
    发明授权
    Low nucleation temperature polythioether prepolymers and uses thereof 有权

    公开(公告)号：US11466125B2

    公开(公告)日：2022-10-11

    申请号：US16721349

    申请日：2019-12-19

    Applicant: PRC-DeSoto International, Inc.

    Inventor： Chandra Rao

    IPC: C08G75/045 ,  C09K3/10

    Abstract: Polythioether prepolymers that have a low nucleation temperature. The symmetry of the polythioether prepolymers is modified by including pendent groups extending from the backbone of the polythioether prepolymer chain and/or the symmetry is modified by including segments having a different number of —C(R)2— groups between heteroatoms. The polythioether prepolymers are stable at low temperature storage conditions for an extended period of time. Compositions prepared using the low nucleation temperature polythioether prepolymers are useful as sealants.

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