Laser processing
    7.
    发明授权
    Laser processing 有权
    激光加工

    公开(公告)号:US06300590B1

    公开(公告)日:2001-10-09

    申请号:US09212974

    申请日:1998-12-16

    IPC分类号: B23K2600

    摘要: The invention provides a system and method for vaporizing a target structure on a substrate. According to the invention, a calculation is performed, as a function of wavelength, of an incident beam energy necessary to deposit unit energy in the target structure. Then, for the incident beam energy, the energy expected to be deposited in the substrate as a function of wavelength is calculated. A wavelength is identified that corresponds to a relatively low value of the energy expected to be deposited in the substrate, the low value being substantially less than a value of the energy expected to be deposited in the substrate at a higher wavelength. A laser system is provided configured to produce a laser output at the wavelength corresponding to the relatively low value of the energy expected to be deposited in the substrate. The laser output is directed at the target structure on the substrate at the wavelength corresponding to the relatively low value of the energy expected to be deposited in the substrate, in order to vaporize the target structure.

    摘要翻译: 本发明提供了一种用于在衬底上蒸发靶结构的系统和方法。 根据本发明,对目标结构中存储单元能量所需的入射光束能量进行与波长有关的计算。 然后,对于入射光束能量,计算预期沉积在衬底中作为波长的函数的能量。 识别出对应于预期沉积在衬底中的能量的较低值的波长,该低值基本上小于预期在较高波长下沉积在衬底中的能量的值。 提供的激光系统被配置为产生在预期沉积在衬底中的能量的相对较低值的波长处的激光输出。 激光输出以对应于期望沉积在衬底中的能量的相对较低值的波长指向衬底上的靶结构,以便蒸发靶结构。

    System for administering an electric shock
    8.
    发明授权
    System for administering an electric shock 失效
    管理电击系统

    公开(公告)号:US4120305A

    公开(公告)日:1978-10-17

    申请号:US722313

    申请日:1976-09-10

    IPC分类号: A61N1/38 H05C1/06

    CPC分类号: H05C1/06 A61N1/38

    摘要: There is disclosed a self-protective system for administering an electrical shock to a would-be assailant by first establishing a low resistance path to the nervous system of the assailant and then coupling thereto an interference signal voltage having a frequency within the passband of the nerves. It incorporates a novel compact power oscillator which is normally quiescent until applied to a load, to produce, under load, a waveform which has a unique application to self-protective devices and medical uses. The oscillator includes a high gain inverting amplifier, preferably a Darlington pair constituted by a germanium output transistor driven by a small signal transistor, a transformer, a D.C. source such as a battery, and a pair of output electrodes.

    摘要翻译: 公开了一种自我保护系统,用于通过首先建立到凶手的神经系统的低电阻路径,然后将其与具有在神经通带内的频率的干扰信号电压相耦合来对潜在的凶手施加电击 。 它集成了一种新颖的紧凑型功率振荡器,其通常静止直到施加到负载,以在负载下产生对自保护装置和医疗用途具有独特应用的波形。 振荡器包括高增益反相放大器,优选地由由小信号晶体管驱动的锗输出晶体管,变压器,诸如电池的直流源和一对输出电极构成的达林顿对。

    OPTICAL SCANNING APPARATUS, SYSTEM AND METHOD
    9.
    发明申请
    OPTICAL SCANNING APPARATUS, SYSTEM AND METHOD 有权
    光学扫描装置,系统和方法

    公开(公告)号:US20140085393A1

    公开(公告)日:2014-03-27

    申请号:US14122662

    申请日:2011-06-10

    IPC分类号: B41J2/385 G02B26/08

    摘要: An optical scanning apparatus, a system and a method of optical scanning independently determine illumination spot size and spacing. The apparatus includes an array of optical emitters to provide a plurality of optical beams and a plurality of microlenses to receive the optical beams. The microlenses form an intermediate image of the array at substantially unity array magnification. The apparatus further includes an adjustable collimator to receive the plurality of optical beams from the intermediate image, a beam scanner to scan the optical beams in an in-scan direction, and a scan lens to focus the scanned optical beams. An arrangement of illumination spots forms an image of the array.

    摘要翻译: 光学扫描装置,系统和光学扫描方法独立地确定照明点尺寸和间距。 该装置包括一组光发射器,以提供多个光束和多个微透镜来接收光束。 微透镜以基本上一致的阵列放大率形成阵列的中间图像。 该装置还包括可调节准直器,用于从中间图像接收多个光束,沿扫描方向扫描光束的光束扫描器和用于对扫描的光束进行聚焦的扫描透镜。 照明点的布置形成阵列的图像。

    System and method for automatic laser beam alignment
    10.
    发明授权
    System and method for automatic laser beam alignment 有权
    自动激光束对准的系统和方法

    公开(公告)号:US08379204B1

    公开(公告)日:2013-02-19

    申请号:US12192915

    申请日:2008-08-15

    IPC分类号: G01B11/00

    CPC分类号: B23K26/043 G01B11/00

    摘要: A method makes a discrete adjustment to static alignment of a laser beam in a machine for selectively irradiating conductive links on or within a semiconductor substrate using the laser beam. The laser beam propagates along a beam path having an axis extending from a laser to a laser beam spot at a location on or within the semiconductor substrate. The method generates, based on at least one measured characteristic of the laser beam, at least one signal to control an adjustable optical element of the machine affecting the laser beam path. The method also sends said at least one signal to the adjustable optical element. The method then adjusts the adjustable optical element in response to said at least one signal so as to improve static alignment of the laser beam path axis.

    摘要翻译: 一种方法对机器中的激光束的静态对准进行离散调整,用于使用激光束选择性地照射半导体衬底上或内部的导电连接。 激光束沿着具有从激光器延伸到半导体衬底上或内部的位置的激光束点的光束路径传播。 该方法基于激光束的至少一个测量特性产生至少一个信号,以控制影响激光束路径的机器的可调节光学元件。 该方法还将所述至少一个信号发送到可调光学元件。 该方法然后响应于所述至少一个信号调整可调光学元件,以改善激光束路径轴线的静态对准。