摘要:
A correction method for correcting unintended spatial variation in lightness across a physical image produced by a xerographic process, the method comprising producing a test image using the xerographic process, measuring a difference between actual lightness and intended lightness across at least part of the test image, and varying the light source level used subsequently in the xerographic process to correct for the measured unintended difference.
摘要:
Various embodiments and methods relating to groups of anamorphic prisms that are configured to reduce smile in a multi-beam optical system are disclosed.
摘要:
Various embodiments and methods relating to groups of anamorphic prisms that are configured to reduce smile in a multi-beam optical system are disclosed.
摘要:
An anamorphic optical element and an adjustment mechanism for selectively rotating the optical element either around an axis substantially in a vertical direction, an axis substantially in an optical axis direction, an axis substantially in a plane formed by the vertical direction and the optical axis direction, or combination of axes thereof is used to vary a vertical separation between two or more spots.
摘要:
The invention provides a system and method for vaporizing a target structure on a substrate. According to the invention, a calculation is performed, as a function of wavelength, of an incident beam energy necessary to deposit unit energy in the target structure. Then, for the incident beam energy, the energy expected to be deposited in the substrate as a function of wavelength is calculated. A wavelength is identified that corresponds to a relatively low value of the energy expected to be deposited in the substrate, the low value being substantially less than a value of the energy expected to be deposited in the substrate at a higher wavelength. A laser system is provided configured to produce a laser output at the wavelength corresponding to the relatively low value of the energy expected to be deposited in the substrate. The laser output is directed at the target structure on the substrate at the wavelength corresponding to the relatively low value of the energy expected to be deposited in the substrate, in order to vaporize the target structure.
摘要:
A laser polarization control apparatus includes a polarization modifying device, such as a liquid crystal variable retarder, and a controller. The polarization modifying device receives a laser beam and modifies the polarization of the laser beam. The controller, which is connected to the polarization modifying device, adjusts an input to the polarization modifying device in order to control modification of the polarization of the laser beam based on alignment of a structure to be processed by the laser beam. For example, the polarization of the laser beam may be rotated to correspond with the alignment of a link in a semiconductor device to be cut by the laser beam. The polarization modifying device is configured for incorporation into a laser processing system that produces the laser beam received by the polarization modifying device and that focuses the laser beam modified by the polarization modifying device onto a workpiece that includes the structure to be processed by the laser beam. An analyzer tool receives the laser beam modified by the polarization modification device and measures the modification of the polarization of the laser beam by the polarization modification device.
摘要:
The invention provides a system and method for vaporizing a target structure on a substrate. According to the invention, a calculation is performed, as a function of wavelength, of an incident beam energy necessary to deposit unit energy in the target structure. Then, for the incident beam energy, the energy expected to be deposited in the substrate as a function of wavelength is calculated. A wavelength is identified that corresponds to a relatively low value of the energy expected to be deposited in the substrate, the low value being substantially less than a value of the energy expected to be deposited in the substrate at a higher wavelength. A laser system is provided configured to produce a laser output at the wavelength corresponding to the relatively low value of the energy expected to be deposited in the substrate. The laser output is directed at the target structure on the substrate at the wavelength corresponding to the relatively low value of the energy expected to be deposited in the substrate, in order to vaporize the target structure.
摘要:
There is disclosed a self-protective system for administering an electrical shock to a would-be assailant by first establishing a low resistance path to the nervous system of the assailant and then coupling thereto an interference signal voltage having a frequency within the passband of the nerves. It incorporates a novel compact power oscillator which is normally quiescent until applied to a load, to produce, under load, a waveform which has a unique application to self-protective devices and medical uses. The oscillator includes a high gain inverting amplifier, preferably a Darlington pair constituted by a germanium output transistor driven by a small signal transistor, a transformer, a D.C. source such as a battery, and a pair of output electrodes.
摘要:
An optical scanning apparatus, a system and a method of optical scanning independently determine illumination spot size and spacing. The apparatus includes an array of optical emitters to provide a plurality of optical beams and a plurality of microlenses to receive the optical beams. The microlenses form an intermediate image of the array at substantially unity array magnification. The apparatus further includes an adjustable collimator to receive the plurality of optical beams from the intermediate image, a beam scanner to scan the optical beams in an in-scan direction, and a scan lens to focus the scanned optical beams. An arrangement of illumination spots forms an image of the array.
摘要:
A method makes a discrete adjustment to static alignment of a laser beam in a machine for selectively irradiating conductive links on or within a semiconductor substrate using the laser beam. The laser beam propagates along a beam path having an axis extending from a laser to a laser beam spot at a location on or within the semiconductor substrate. The method generates, based on at least one measured characteristic of the laser beam, at least one signal to control an adjustable optical element of the machine affecting the laser beam path. The method also sends said at least one signal to the adjustable optical element. The method then adjusts the adjustable optical element in response to said at least one signal so as to improve static alignment of the laser beam path axis.