公开(公告)号：US5420436A

公开(公告)日：1995-05-30

申请号：US155857

申请日：1993-11-23

申请人： Eiichi Seya ,  Massaaki Ito ,  Soichi Katagiri ,  Tsuneo Terasawa ,  Minoru Hidaka ,  Eiji Takeda ,  Norio Saitou

发明人： Eiichi Seya ,  Massaaki Ito ,  Soichi Katagiri ,  Tsuneo Terasawa ,  Minoru Hidaka ,  Eiji Takeda ,  Norio Saitou

IPC分类号： G01M11/02 ,  G03F7/20 ,  H01L21/027 ,  H01L21/30 ,  H01L21/00 ,  G01B9/02

CPC分类号： G03F7/70233

摘要： A technique and exposure apparatus measures, with a high degree of accuracy, figure and placement errors of individual optical elements constituting optics embedded inside of an exposure apparatus or the like, with the optics kept in an embedded state as they are. The system measures the distribution of wavefront distortions in the optics while changing the positions of a light source and an image point inside an exposure field of the optics being observed. Optimal displacements of reflective surfaces constituting the optics are then found by calculation based on the measured distribution of wave-front distortions. Finally, the positions of the reflective surfaces are corrected in accordance with the calculated optimal displacements. The positions of the reflective surfaces are corrected by individually controlling displacements output by a plurality of actuators attached to each reflective surface and by mechanically modifying appropriate portions of the reflective surfaces.

摘要翻译： 技术和曝光装置以高度精确度的方式测量构成放置在曝光装置内部的光学元件的各个光学元件的图形和放置误差，其中光学器件保持处于嵌入状态。 该系统在改变光源的位置和观察到的光学元件的曝光场内的图像点的同时测量光学器件中的波前失真的分布。 然后通过基于波前失真的测量分布的计算来找到构成光学器件的反射表面的最佳位移。 最后，根据计算出的最佳位移校正反射面的位置。 通过单独地控制由附接到每个反射表面的多个致动器输出的位移以及通过机械地改变反射表面的适当部分来校正反射表面的位置。