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    RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME
    4.
    发明申请
    RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME 审中-公开
    使用它的耐蚀组合物和图案形成方法

    公开(公告)号：US20080081289A1

    公开(公告)日：2008-04-03

    申请号：US11862916

    申请日：2007-09-27

    申请人： Fumiyuki NISHIYAMA ,  Kazuyoshi MIZUTANI ,  Masaomi MAKINO ,  Shinichi SUGIYAMA

    发明人： Fumiyuki NISHIYAMA ,  Kazuyoshi MIZUTANI ,  Masaomi MAKINO ,  Shinichi SUGIYAMA

    IPC分类号： G03C1/73 ,  G03C5/00

    CPC分类号： G03F7/0392 ,  G03F7/0048 ,  G03F7/0397

    摘要： A resist composition, comprises: (A) a resin containing a repeating unit represented by formula (I); (B) a compound capable of generating an acid upon irradiation with actinic rays or radiation; and (C) a solvent containing: (C1) a propylene glycol monoalkyl ether carboxylate; and (C2) at least one member selected from the group consisting of a propylene glycol monoalkyl ether, an alkyl lactate, an acetic acid ester, an alkyl alkoxypropionate, a chain ketone and a cyclic ketone: wherein AR represents a substituted or unsubstituted benzene ring or a substituted or unsubstituted naphthalene ring; Rn represents a substituted or unsubstituted alkyl group, a substituted or unsubstituted cycloalkyl group or a substituted or unsubstituted aryl group; and A represents a hydrogen atom, a substituted or unsubstituted alkyl group, a substituted or unsubstituted cycloalkyl group, a halogen atom, a cyano group or a substituted or unsubstituted alkyloxycarbonyl group, and the pattern forming method uses the same.

    摘要翻译： 抗蚀剂组合物包含：（A）含有式（I）表示的重复单元的树脂; （B）能够在用光化射线或辐射照射时能够产生酸的化合物; 和（C）含有：（C1）丙二醇单烷基醚羧酸酯的溶剂; 和（C2）选自丙二醇单烷基醚，乳酸烷基酯，乙酸酯，烷基丙酸酯，链酮和环酮的组中的至少一种：其中AR表示取代或未取代的苯环 或取代或未取代的萘环; Rn表示取代或未取代的烷基，取代或未取代的环烷基或取代或未取代的芳基; A表示氢原子，取代或未取代的烷基，取代或未取代的环烷基，卤素原子，氰基或取代或未取代的烷氧基羰基，图案形成方法使用。

    Positive resist composition and pattern forming method using the same
    5.
    发明申请
    Positive resist composition and pattern forming method using the same 有权
    正型抗蚀剂组合物和使用其的图案形成方法

    公开(公告)号：US20070218407A1

    公开(公告)日：2007-09-20

    申请号：US11717645

    申请日：2007-03-14

    申请人： Kazuyoshi Mizutani ,  Kaoru Iwato ,  Kunihiko Kodama ,  Masaomi Makino

    发明人： Kazuyoshi Mizutani ,  Kaoru Iwato ,  Kunihiko Kodama ,  Masaomi Makino

    IPC分类号： G03C1/00

    CPC分类号： G03F7/0397 ,  Y10S430/108 ,  Y10S430/111

    摘要： A resist composition, which comprises: (A) a resin containing a repeating unit represented by formula (I); and (B) a compound capable of generating an acid upon irradiation with actinic rays or radiation: wherein AR represents a benzene ring or a naphthalene ring; R represents a hydrogen atom, an alkyl group, a cycloalkyl group or an aryl group; Z represents a linking group for forming a ring together with AR; and A represents an atom or group selected from the group consisting of a hydrogen atom, an alkyl group, a halogen atom, a cyano group and an alkyloxycarbonyl group, and a pattern forming method using the resist composition.

    摘要翻译： 一种抗蚀剂组合物，其包含：（A）含有由式（I）表示的重复单元的树脂; 和（B）能够在用光化射线或辐射照射时能产生酸的化合物：其中AR表示苯环或萘环; R表示氢原子，烷基，环烷基或芳基; Z表示与AR一起形成环的连接基团; A表示选自氢原子，烷基，卤素原子，氰基和烷氧基羰基的原子或基团，以及使用该抗蚀剂组合物的图案形成方法。

    Positive resist composition and pattern forming method using the same
    9.
    发明申请
    Positive resist composition and pattern forming method using the same 有权
    正型抗蚀剂组合物和使用其的图案形成方法

    公开(公告)号：US20070218406A1

    公开(公告)日：2007-09-20

    申请号：US11717618

    申请日：2007-03-14

    申请人： Kazuyoshi Mizutani ,  Kaoro Iwato ,  Kunihiko Kodama ,  Masaomi Makino ,  Toru Tsuchihashi

    发明人： Kazuyoshi Mizutani ,  Kaoro Iwato ,  Kunihiko Kodama ,  Masaomi Makino ,  Toru Tsuchihashi

    IPC分类号： G03C1/00

    CPC分类号： G03F7/0392 ,  Y10S430/106 ,  Y10S430/108 ,  Y10S430/111

    摘要： A resist composition, which comprises: (A) a resin containing a repeating unit represented by formula (I); and (B) a compound capable of generating an acid upon irradiation with actinic rays or radiation: wherein AR represents an aryl group; Rn represents an alkyl group, a cycloalkyl group or an aryl group; and A represents an atom or group selected from the group consisting of a hydrogen atom, an alkyl group, a halogen atom, a cyano group and an alkyloxycarbonyl group, and a pattern forming method using the resist composition.

    摘要翻译： 一种抗蚀剂组合物，其包含：（A）含有由式（I）表示的重复单元的树脂; 和（B）能够在用光化射线或辐射照射时能够产生酸的化合物：其中AR表示芳基; Rn表示烷基，环烷基或芳基; A表示选自氢原子，烷基，卤素原子，氰基和烷氧基羰基的原子或基团，以及使用该抗蚀剂组合物的图案形成方法。

    Compound, polymerizable composition, color filter, and method of producing the same, solid-state imaging device, and planographic printing plate precursor
    10.
    发明授权
    Compound, polymerizable composition, color filter, and method of producing the same, solid-state imaging device, and planographic printing plate precursor 有权
    化合物，可聚合组合物，滤色器及其制备方法，固态成像装置和平版印刷版前体

    公开(公告)号：US08846277B2

    公开(公告)日：2014-09-30

    申请号：US13144600

    申请日：2010-01-12

    申请人： Masaomi Makino ,  Tomotaka Tsuchimura

    发明人： Masaomi Makino ,  Tomotaka Tsuchimura

    IPC分类号： G02B5/20 ,  G03F7/028

    CPC分类号： C07D491/044 ,  B33Y70/00 ,  C07D209/86 ,  C07D471/04 ,  C07D487/04 ,  C07D495/04 ,  C08F2/50 ,  G03F7/0007 ,  G03F7/031

    摘要： Provided is a photopolymerizable composition that is highly sensitive to light having wavelengths of 365 nm and 405 nm, and is capable of forming a curable film that can suppress deterioration in physical properties of the film due to heat-aging. The photopolymerizable composition include: (A) an oxime polymerization initiator which includes a condensed ring formed by containing two or more rings selected from an aromatic ring and a heterocyclic ring, and a cyclic structure which is connected to the condensed ring, the cyclic structure containing a carbonyl group and having an oxime group directly connected to the carbonyl group; and (B) a polymerizable compound.

    摘要翻译： 提供对波长为365nm和405nm的光高度敏感的可光聚合组合物，并且能够形成能够抑制由于热老化而导致的膜的物理性能劣化的固化膜。 光聚合性组合物包括：（A）肟聚合引发剂，其包含通过含有选自芳香环和杂环的两个以上的环形成的稠环和与稠环连接的环状结构，所述环状结构含有 具有与羰基直接相连的肟基的羰基; 和（B）可聚合化合物。