公开(公告)号：US07492091B2

公开(公告)日：2009-02-17

申请号：US11061143

申请日：2005-02-18

申请人： Maryam Kharrazi-Olsson ,  Hai Tran Quoc ,  Alice Gallissian

发明人： Maryam Kharrazi-Olsson ,  Hai Tran Quoc ,  Alice Gallissian

IPC分类号： H05B33/00

CPC分类号： H01L51/0097 ,  H01L51/5253 ,  H01L51/5256 ,  Y02E10/549 ,  Y02P70/521 ,  Y10S428/917 ,  Y10T428/325

摘要： A diffusion barrier system for a display device comprising a layer system with at least two layers of dielectric material, wherein at least two adjacent layers of that layer system comprise the same material. A respective method for manufacturing such a diffusion barrier system in a single process chamber of a plasma deposition system has the steps of introducing a substrate to be treated in said process chamber, discretely varying in a controlled manner during deposition at least one process parameter in the process chamber, without completely interrupting such process parameter, which results in layers with different properties and finally unloading said substrate from said process.

摘要翻译： 一种用于显示装置的扩散阻挡系统，包括具有至少两层介电材料的层系统，其中该层系统的至少两个相邻层包括相同的材料。 用于在等离子体沉积系统的单个处理室中制造这种扩散阻挡系统的相应方法具有以下步骤：在沉积期间引入待处理的衬底，以便在沉积期间以受控的方式离散地改变处理室中的至少一个工艺参数 处理室，而不完全中断这样的工艺参数，这导致具有不同特性的层并且最终从所述工艺卸载所述衬底。

公开(公告)号：US20090087998A1

公开(公告)日：2009-04-02

申请号：US12330903

申请日：2008-12-09

申请人： Maryam Kharrazi-Olsson ,  Hai Tran Quoc ,  Alice Gallissian

发明人： Maryam Kharrazi-Olsson ,  Hai Tran Quoc ,  Alice Gallissian

IPC分类号： H01L21/31

CPC分类号： H01L51/0097 ,  H01L51/5253 ,  H01L51/5256 ,  Y02E10/549 ,  Y02P70/521 ,  Y10S428/917 ,  Y10T428/325

摘要： A diffusion barrier system for a display device comprising a layer system with at least two layers of dielectric material, wherein at least two adjacent layers of that layer system comprise the same material. A respective method for manufacturing such a diffusion barrier system in a single process chamber of a plasma deposition system has the steps of introducing a substrate to be treated in said process chamber, discretely varying in a controlled manner during deposition at least one process parameter in the process chamber, without completely interrupting such process parameter, which results in layers with different properties and finally unloading said substrate from said process.

摘要翻译： 一种用于显示装置的扩散阻挡系统，包括具有至少两层介电材料的层系统，其中该层系统的至少两个相邻层包括相同的材料。 用于在等离子体沉积系统的单个处理室中制造这种扩散阻挡系统的相应方法具有以下步骤：在沉积期间引入待处理的衬底，以便在沉积期间以受控的方式离散地改变处理室中的至少一个工艺参数 处理室，而不完全中断这样的工艺参数，这导致具有不同特性的层并且最终从所述工艺卸载所述衬底。

公开(公告)号：US20050194898A1

公开(公告)日：2005-09-08

申请号：US11061143

申请日：2005-02-18

申请人： Maryam Kharrazi-Olsson ,  Hai Tran Quoc ,  Alice Gallissian

发明人： Maryam Kharrazi-Olsson ,  Hai Tran Quoc ,  Alice Gallissian

IPC分类号： H01J1/62 ,  H01J63/04 ,  H01L51/00 ,  H01L51/52

CPC分类号： H01L51/0097 ,  H01L51/5253 ,  H01L51/5256 ,  Y02E10/549 ,  Y02P70/521 ,  Y10S428/917 ,  Y10T428/325

摘要： A diffusion barrier system for a display device comprising a layer system with at least two layers of dielectric material, wherein at least two adjacent layers of that layer system comprise the same material. A respective method for manufacturing such a diffusion barrier system in a single process chamber of a plasma deposition system has the steps of introducing a substrate to be treated in said process chamber, discretely varying in a controlled manner during deposition at least one process parameter in the process chamber, without completely interrupting such process parameter, which results in layers with different properties and finally unloading said substrate from said process.

摘要翻译： 一种用于显示装置的扩散阻挡系统，包括具有至少两层介电材料的层系统，其中该层系统的至少两个相邻层包括相同的材料。 用于在等离子体沉积系统的单个处理室中制造这种扩散阻挡系统的相应方法具有以下步骤：在沉积期间引入待处理的衬底，以便在沉积期间以受控的方式离散地改变处理室中的至少一个工艺参数 处理室，而不完全中断这样的工艺参数，这导致具有不同特性的层并且最终从所述工艺卸载所述衬底。