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    Paste containing nanoscale powder and dispersant and dispersion made therefrom
    3.
    发明申请
    Paste containing nanoscale powder and dispersant and dispersion made therefrom 审中-公开
    含有纳米级粉末和分散剂和由其制成的分散体的糊状物

    公开(公告)号：US20070199477A1

    公开(公告)日：2007-08-30

    申请号：US11509741

    申请日：2006-08-25

    申请人： Sven Hill ,  Kathrin Lehmann ,  Pedro Cavaleiro ,  Stefan Heberer ,  Markus Pridoehl

    发明人： Sven Hill ,  Kathrin Lehmann ,  Pedro Cavaleiro ,  Stefan Heberer ,  Markus Pridoehl

    IPC分类号： C09D11/00 ,  C08K5/00

    CPC分类号： C01G9/03 ,  C01G15/00 ,  C09C1/04 ,  C09C1/043 ,  C09D17/004

    摘要： A paste is provided having as solid phase at least one nanoscale powder and as liquid phase at least one dispersant, wherein the fraction of the nanoscale powder is 30% to 95% by weight and the fraction of the liquid phase is at least 5% by weight, based in each case on the total amount of the paste, the paste has a water content of less than 3% by weight of water and the liquid phase has a VOC content of less than 10 g/l, and the use of the paste in preparing dispersions, the dispersions prepared thereby, and use in a variety of other enduses.

    摘要翻译： 提供糊状物，其具有固相至少一种纳米级粉末和液相至少一种分散剂，其中纳米级粉末的分数为30％至95％重量，液相的分数为至少5％，通过 重量，基于每种情况下的糊料的总量，糊料的水含量小于3重量％的水，并且液相的VOC含量小于10g / l，并​​且使用 糊状制备分散体，由此制备的分散体，并用于各种其他的末端。

    Nanoscale, crystalline silicon powder
    6.
    发明申请
    Nanoscale, crystalline silicon powder 审中-公开
    纳米级，晶体硅粉末

    公开(公告)号：US20070172406A1

    公开(公告)日：2007-07-26

    申请号：US10579762

    申请日：2004-11-13

    申请人： Markus Pridoehl ,  Paul Roth ,  Hartmut Wiggers ,  Peter Kress ,  Guido Zimmermann ,  Stefan Heberer ,  Frank-Martin Petrat

    发明人： Markus Pridoehl ,  Paul Roth ,  Hartmut Wiggers ,  Peter Kress ,  Guido Zimmermann ,  Stefan Heberer ,  Frank-Martin Petrat

    IPC分类号： C01B33/00

    CPC分类号： C01B33/02 ,  C01B33/027

    摘要： Aggregated, crystalline silicon powder with a BET surface of more than 50 m2/g. The powder is produced by continuously feeding at least one vaporous or gaseous silane and optionally at least one vaporous or gaseous doping substance and an inert gas into a reactor and mixing the components there, wherein the proportion of silane is between 0.1 and 90 wt. % referred to the sum total of silane, doping substance and inert gas, the mixture is caused to react by input of energy, wherein a plasma is produced by the input of energy by means of electromagnetic radiation in the microwave range at a pressure of 10 to 1100 mbar, the reaction mixture is allowed to cool and the reaction product is separated in the form of a powder from gaseous substances. The powder may be used for the production of electronic components.

    摘要翻译： 聚集的BET表面积大于50m 2 / g的结晶硅粉末。 通过将至少一种蒸气或气态硅烷和任选的至少一种蒸汽或气态掺杂物质和惰性气体连续地供入反应器并混合其中的组分来生产粉末，其中硅烷的比例为0.1-90重量％。 ％是指硅烷，掺杂物质和惰性气体的总和，通过输入能量使混合物反应，其中通过在微波范围内以10的压力通过电磁辐射输入能量来产生等离子体 至1100毫巴，使反应混合物冷却，将反应产物以粉末形式从气态物质中分离。 粉末可用于生产电子元件。

    Dispersion containing pyrogenically manufactured abrasive particles with superparamagnetic domains
    7.
    发明授权
    Dispersion containing pyrogenically manufactured abrasive particles with superparamagnetic domains 失效
    含有热原制造的具有超顺磁畴的磨料颗粒的分散体

    公开(公告)号：US06761747B2

    公开(公告)日：2004-07-13

    申请号：US10278846

    申请日：2002-10-24

    申请人： Heiko Gottfried ,  Markus Pridoehl ,  Berthold Trageser ,  Guido Zimmermann ,  Stefan Heberer ,  Heike Muehlenweg

    发明人： Heiko Gottfried ,  Markus Pridoehl ,  Berthold Trageser ,  Guido Zimmermann ,  Stefan Heberer ,  Heike Muehlenweg

    IPC分类号： C09G102

    CPC分类号： B82Y25/00 ,  B24B1/005 ,  H01F1/0063 ,  H01F1/36 ,  H01F1/44

    摘要： An aqueous dispersion containing abrasive particles comprises abrasive particles having superparamagnetic metal oxide domains in a non-magnetic metal oxide or non-metal oxide matrix. The abrasive particles of the aqueous dispersion can have an average particle size of below 400 nm and a BET surface area of 50 to 600 m2/g. The dispersion can be produced by dispersing the abrasive particles with an energy of at least 200 kJ/m3 using a device in which the abrasive particles are first subjected to high pressure, then decompressed through a nozzle so that the abrasive particles collide with one another or against sections of wall in the device. The aqueous dispersion can be used for chemical mechanical polishing (CMP).

    摘要翻译： 含有磨料颗粒的含水分散体包括在非磁性金属氧化物或非金属氧化物基质中具有超顺磁性金属氧化物畴的磨粒。 水性分散体的研磨颗粒的平均粒径可以在400nm以下，BET表面积为50〜600m 2 / g。 分散体可以通过使用其中研磨颗粒首先经受高压的装置分散具有至少200kJ / m 3的能量的磨料颗粒，然后通过喷嘴减压使得磨料颗粒与 彼此或相对于设备中的墙壁部分。 水性分散体可用于化学机械抛光（CMP）。

    NANOSCALE CRYSTALLINE SILICON POWDER
    10.
    发明申请
    NANOSCALE CRYSTALLINE SILICON POWDER 有权
    纳米结晶硅粉

    公开(公告)号：US20100193746A1

    公开(公告)日：2010-08-05

    申请号：US12759346

    申请日：2010-04-13

    申请人： Markus PRIDOEHL ,  Paul ROTH ,  Hartmut WIGGERS ,  Frank-Martin PETRAT ,  Michael KRAEMER

    发明人： Markus PRIDOEHL ,  Paul ROTH ,  Hartmut WIGGERS ,  Frank-Martin PETRAT ,  Michael KRAEMER

    IPC分类号： C01B33/02 ,  H01B1/04

    CPC分类号： C01B33/03 ,  C01B33/02 ,  C01B33/029 ,  Y10T428/2982

    摘要： An aggregated crystalline silicon powder with a BET surface area of 20 to 150 m2/g is provided. The aggregated silicon powder may be doped with phosphorus, arsenic, antimony, bismuth, boron, aluminium, gallium, indium, thallium, europium, erbium, cerium, praseodymium, neodymium, samarium, gadolinium, terbium, dysprosium, holmium, thulium, lutetium, lithium, ytterbium, germanium, iron, ruthenium, osmium, cobalt, rhodium, iridium, nickel, palladium, platinum, copper, silver, gold, or zinc.

    摘要翻译： 提供BET表面积为20-150m2 / g的聚集的结晶硅粉末。 聚集的硅粉末可以掺杂有磷，砷，锑，铋，硼，铝，镓，铟，铊，铕，铒，铈，镨，钕，钐，钆，铽，镝，钬，ium，镥， 锂，镱，锗，铁，钌，锇，钴，铑，铱，镍，钯，铂，铜，银，金或锌。