FORMATION METHOD OF HEXAGONAL BORON NITRIDE THICK FILM ON A SUBSTRATE AND HEXAGONAL BORON NITRIDE THICK FILM LAMINATES THEREBY
    1.
    发明申请
    FORMATION METHOD OF HEXAGONAL BORON NITRIDE THICK FILM ON A SUBSTRATE AND HEXAGONAL BORON NITRIDE THICK FILM LAMINATES THEREBY 审中-公开
    基底上的六方硼酸盐薄膜的形成方法和六方硼氮化物厚膜层压板

    公开(公告)号:US20160281221A1

    公开(公告)日:2016-09-29

    申请号:US15055290

    申请日:2016-02-26

    摘要: The present disclosure relates to a method of producing a multilayer hexagonal boron nitride (h-BN) thick film on a substrate, and more particularly, to a method of forming a multilayer h-BN thick film on a substrate including (a) a substrate heating step of heating a first substrate, (b) a h-BN precursor supply step of supplying h-BN precursors to the heated first substrate, (c) a precursor dissolving step of dissolving the supplied h-BN precursors in the first substrate, and (d) a substrate cooling step of cooling the first substrate containing the dissolved h-BN precursors therein, and a laminate including a multilayer h-BN thick film prepared by the preparation method and a substrate which forms a stack structure with the h-BN thick film

    摘要翻译: 本发明涉及在基板上制造多层六方氮化硼(h-BN)厚膜的方法,更具体地说,涉及一种在基板上形成多层h-BN厚膜的方法,该方法包括:(a) (b)将h-BN前体供应到加热的第一基底的h-BN前体供应步骤,(c)将所供应的h-BN前体溶解在第一基底中的前体溶解步骤, 以及(d)将含有溶解的h-BN前体的第一基板冷却的基板冷却工序,以及包含通过制备方法制备的多层h-BN厚膜的层压体和形成具有h- BN厚膜