公开(公告)号：US20050016818A1

公开(公告)日：2005-01-27

申请号：US10859340

申请日：2004-06-03

申请人： Kazuhiko Ito ,  Kazutoshi Ishimaru ,  Jun Ookura ,  Michio Kinoshita ,  Yuichi Douki

发明人： Kazuhiko Ito ,  Kazutoshi Ishimaru ,  Jun Ookura ,  Michio Kinoshita ,  Yuichi Douki

IPC分类号： H01L21/68 ,  B05B12/12 ,  B05B13/02 ,  H01L21/00

CPC分类号： H01L21/67259 ,  B05B12/122 ,  B05B13/0228 ,  Y10S414/136

摘要： A substrate processing apparatus can align a substrate with a high precision and a high speed by monitoring a mark formed on a surface of the substrate; operating an amount of misalignment between the center of the substrate and a rotation center of a substrate support member; determining a presence of the misalignment and adjusting the substrate such that the center of the substrate coincides with the rotation center of the substrate support member.

公开(公告)号：US06973370B2

公开(公告)日：2005-12-06

申请号：US10859340

申请日：2004-06-03

申请人： Kazuhiko Ito ,  Kazutoshi Ishimaru ,  Jun Ookura ,  Michio Kinoshita ,  Yuichi Douki

发明人： Kazuhiko Ito ,  Kazutoshi Ishimaru ,  Jun Ookura ,  Michio Kinoshita ,  Yuichi Douki

IPC分类号： H01L21/68 ,  B05B12/12 ,  B05B13/02 ,  H01L21/00 ,  G06F7/00

CPC分类号： H01L21/67259 ,  B05B12/122 ,  B05B13/0228 ,  Y10S414/136

摘要： A substrate processing apparatus can align a substrate with a high precision and a high speed by monitoring a mark formed on a surface of the substrate; operating an amount of misalignment between the center of the substrate and a rotation center of a substrate support member; determining a presence of the misalignment and adjusting the substrate such that the center of the substrate coincides with the rotation center of the substrate support member.

摘要翻译： 基板处理装置可以通过监视形成在基板的表面上的标记来对准基板的高精度和高速度; 操作所述基板的中心与基板支撑构件的旋转中心之间的未对准量; 确定不对准的存在并调整衬底，使得衬底的中心与衬底支撑构件的旋转中心重合。