-
1.发明授权Energy beam curable epoxy resin composition, stereolithographic resin composition and stereolithographic method 失效能量束固化环氧树脂组合物，立体光刻树脂组合物和立体光刻方法
公开(公告)号：US5985510A
公开(公告)日：1999-11-16
申请号：US978581
申请日：1997-11-26
Applicant: Mitsuo Akutsu , Tetsuyuki Nakayashiki , Hiroyuki Tachikawa , Kazuo Ohkawa , Satoyuki Chikaoka
Inventor： Mitsuo Akutsu , Tetsuyuki Nakayashiki , Hiroyuki Tachikawa , Kazuo Ohkawa , Satoyuki Chikaoka
CPC classification number: B29C67/0055 , C08G59/24 , C08G59/30 , C08G59/68 , G03F7/0037 , G03F7/038 , B29K2063/00
Abstract: The energy beam curable epoxy resin composition comprising as essential components, (1) specific cationically polymerizing organic substance, (2) energybeam sensitive cation polimerization initiator, (3) cationically polymerizing organic substance except for the specific cationically polymerizing organic substance, described above, (4) radically polymerizing organic compound, and (5) energy beam sensitive radical polymerization initiator. The cured articles resulted from said resin composition, have superior properties and particularlly superior dimensional stability on humidity absorption. Therefore, a stereolithographic resin composition and a stereolithographic method are also provided.
Abstract translation: 作为必要成分的能量束固化性环氧树脂组合物，（1）特定的阳离子聚合性有机物，（2）能量敏感阳离子聚合引发剂，（3）上述特定的阳离子聚合性有机物以外的阳离子聚合性有机物（ 4）自由基聚合有机化合物，和（5）能量束敏感自由基聚合引发剂。 由所述树脂组合物产生的固化制品具有优异的性能和特别优异的湿度吸收尺寸稳定性。 因此，还提供了立体光刻树脂组合物和立体光刻方法。
-
2.发明授权Actinic radiation-reactive pressure-sensitive adhesive composition wherein adhesiveness is reduced upon irradiation 失效光化辐射反应性压敏粘合剂组合物，其中在照射时粘合性降低
公开(公告)号：US5278199A
公开(公告)日：1994-01-11
申请号：US632190
申请日：1990-12-21
Applicant: Kazuo Ohkawa , Seiichi Saito
Inventor： Kazuo Ohkawa , Seiichi Saito
IPC: C08F2/46 , C08F2/48 , C08F290/00 , C08F299/00 , C09D5/00 , C09J167/00 , C09J181/02 , C09J201/00 , G03F7/00 , H01L21/302 , C09J133/06 , C08L33/08 , C08L33/10
CPC classification number: H01L21/302 , C08F299/00 , C09J167/00 , C09J201/00 , G03F7/0012
Abstract: An actinic radiation-reactive pressure-sensitive adhesive composition can be cured in air at a high speed, without irritation and bad smell, and comprises1 a pressure-sensitive adhesive organic compound, and2 an actinic radiation-curable resin comprising (1) one or more polythiol compounds and (2) one or more polyene compounds each having at least two actinic radiation-reactive carbon-to-carbon double bonds in the molecule.
Abstract translation: 光化辐射反应型压敏粘合剂组合物可以在空气中高速固化，无刺激和不良气味，并且包含+ E，crc / 1 / a压敏粘合有机化合物和+ E，crc / 2 /一种光化辐射固化树脂，其包含（1）一种或多种多硫醇化合物和（2）一种或多种在分子中具有至少两个光化辐射反应性碳 - 碳双键的多烯化合物。
-
3.发明授权
公开(公告)号：US5236967A
公开(公告)日：1993-08-17
申请号：US837311
申请日：1992-02-18
Applicant: Kazuo Ohkawa , Seiichi Saito
Inventor： Kazuo Ohkawa , Seiichi Saito
IPC: C08F299/02 , G02B1/04
CPC classification number: C08F299/022 , G02B1/04
Abstract: An optical molding composition is used for casting and does not cause irritation to the skin or possess a bad smell. This composition comprises1. an actinic radiation-curable, radical-polymerizable organic compound comprising(1) one or more polythiol compounds and(2) one or more polyene compounds each having at least two actinic radiation-reactive carbon-to-carbon double bonds in the molecule, and2. an actinic radiation-sensitive radical polymerization initiator.
Abstract translation: 光学模塑组合物用于铸造，并且不会对皮肤产生刺激或具有不良气味。 该组合物包含1.一种光化辐射固化的可自由基聚合的有机化合物，其包含（1）一种或多种多硫醇化合物和（2）一种或多种多烯化合物，其各自具有至少两个光化辐射反应性碳 - 碳双键 在分子中，和2.光化辐射敏感的自由基聚合引发剂。
-
公开(公告)号：US06130025A
公开(公告)日：2000-10-10
申请号：US952160
申请日：1997-11-12
Applicant: Satoyuki Chikaoka , Kazuo Ohkawa
Inventor： Satoyuki Chikaoka , Kazuo Ohkawa
CPC classification number: G03F7/031 , G03F7/0037 , G03F7/038
Abstract: The stereolithographic resin composition comprising,(1)a catinically polymerizing organic compound, (2)an energy beam sensitive cationic polymerization initiator, and (3)a thermoplastic polymer compound which uniformly dissolves in said resin composition was provided. Therefore, the process for optical solid molding, which enabled the production of highly precise solid shape, was provided using said resin composition.
Abstract translation: PCT No.PCT / JP96 / 01244 Sec。 371日期：1997年11月12日 102（e）日期1997年11月12日PCT提交1996年5月10日PCT公布。 公开号WO96 / 35756 日期：1996年11月14日提供了包含（1）有机聚合有机化合物，（2）能量敏感性阳离子聚合引发剂和（3）均匀溶解在所述树脂组合物中的热塑性聚合物化合物的立体光刻树脂组合物。 因此，使用所述树脂组合物提供了能够制造高精度固体形状的光学固体成型方法。
-
公开(公告)号：US5525645A
公开(公告)日：1996-06-11
申请号：US417758
申请日：1995-04-06
Applicant: Kazuo Ohkawa , Seiichi Saito
Inventor： Kazuo Ohkawa , Seiichi Saito
CPC classification number: C08G59/68 , C08G65/105
Abstract: The present invention relates to a resin composition for optical molding which comprises (a) an actinic radical-curable and cationically polymerizable organic substance and (b) an actinic radiation-sensitive initiator for cationic polymerization. This composition can be cured without being affected by atmospheric oxygen.
Abstract translation: 本发明涉及一种光学成型用树脂组合物，其包含（a）光化自由基固化性和阳离子聚合性有机物质和（b）阳离子聚合用光化射线敏感性引发剂。 该组合物可以在不受大气氧的影响的情况下固化。
-
Patent Agency Ranking
公开(公告)号：US5434196A
公开(公告)日：1995-07-18
申请号：US270058
申请日：1994-07-01
Applicant: Kazuo Ohkawa , Seiichi Saito
Inventor： Kazuo Ohkawa , Seiichi Saito
CPC classification number: C08G59/68 , C08G65/105
Abstract: The present invention relates to a resin composition for optical molding which comprises (a) an actinic radical-curable and cationically polymerizable organic substance and (b) an actinic radiation-sensitive initiator for cationic polymerization. This composition can be cured without being affected by atomospheric oxygen.
Abstract translation: 本发明涉及一种光学成型用树脂组合物，其包含（a）光化自由基固化性和阳离子聚合性有机物质和（b）阳离子聚合用光化射线敏感性引发剂。 这种组合物可以在不受大气氧的影响的情况下固化。
-
7.发明授权Aromatic sulfonium compounds, photoacid generators comprising the same, photopolymerizable compositions containing the same, stereolithographic resin compositions, and stereolithographic process 有权芳族锍化合物，含有它们的光酸产生剂，含有它们的光聚合组合物，立体光刻树脂组合物和立体光刻法公开(公告)号：US06368769B1
公开(公告)日：2002-04-09
申请号：US09555632
申请日：2000-07-06
Applicant: Kazuo Ohkawa , Hiroyuki Tachikawa , Satoyuki Chikaoka
Inventor： Kazuo Ohkawa , Hiroyuki Tachikawa , Satoyuki Chikaoka
IPC: G03F7004
CPC classification number: G03F7/0045 , B33Y70/00 , C07C381/12 , C08F2/50 , C08G59/687 , G03F7/0037 , G03F7/038
Abstract: Novel aromatic sulfonium compounds of general formula (I), photoacid generators comprising the same, and photopolymerizable compositions containing the same, capable of providing stereolithographic resin compositions which do not suffer from the hindrance to curing by oxygen, can easily give shaped articles having desired sizes by virtue of the high accuracy thereof in curing, and can attain a satisfactory curing depth owing to the high sensitivity thereof for radiant energy; and a stereolithographic process.
Abstract translation: 通式（I）的新型芳香族锍化合物，含有它们的光酸产生剂和含有它们的可光聚合组合物能够提供不受氧气固化阻碍的立体光刻树脂组合物，可以容易地得到具有所需尺寸的成型制品 由于其固化的高精度，并且由于其对辐射能的高灵敏度而可以获得令人满意的固化深度; 和立体光刻工艺。
-
公开(公告)号：US06319652B1
公开(公告)日：2001-11-20
申请号：US09396800
申请日：1999-09-15
Applicant: Mitsuo Akutsu , Tetsuyuki Nakayashiki , Hiroyuki Tachikawa , Kazuo Ohkawa , Satoyuki Chikaoka
Inventor： Mitsuo Akutsu , Tetsuyuki Nakayashiki , Hiroyuki Tachikawa , Kazuo Ohkawa , Satoyuki Chikaoka
IPC: G03F7038
CPC classification number: G03F7/038 , B29C64/106 , B29K2063/00 , B33Y10/00 , B33Y70/00 , C08G59/24 , C08G59/30 , C08G59/68 , G03F7/0037
Abstract: The energy beam curable epoxy resin composition comprising as essential components, (1) specific cationically polymerizing organic substance,(2) energybeam sensitive cation polymerization initiator, (3) cationically polymerizing organic substance except for the specific cationically polymerizing organic substance, described above, (4) radically polymerizing organic compound, and (5) energy beam sensitive radical polymerization initiator. The cured articles resulted from said resin composition, have superior properties and particularlly superior dimensional stability on humidity absorption. Therefore, a stereolithographic resin composition and a stereolithographic method are also provided.
Abstract translation: 作为必要成分的能量束固化性环氧树脂组合物，（1）特定的阳离子聚合性有机物，（2）能量敏感性阳离子聚合引发剂，（3）上述特定的阳离子聚合性有机物以外的阳离子聚合性有机物（ 4）自由基聚合有机化合物，和（5）能量束敏感自由基聚合引发剂。 由所述树脂组合物产生的固化制品具有优异的性能和特别优异的湿度吸收尺寸稳定性。 因此，还提供了立体光刻树脂组合物和立体光刻方法。
-
公开(公告)号：US4684671A
公开(公告)日：1987-08-04
申请号：US855310
申请日：1986-04-09
Applicant: Hiroshi Tsuchiya , Kazuhiko Morio , Hisashi Murase , Kazuo Ohkawa
Inventor： Hiroshi Tsuchiya , Kazuhiko Morio , Hisashi Murase , Kazuo Ohkawa
IPC: C08G59/00 , C08F2/50 , C08F4/06 , C08G59/40 , C08G59/68 , C08G85/00 , C09D5/00 , C09D163/00 , G03F7/029 , C08G59/72 , C08G59/62
CPC classification number: C08G85/00 , C08G59/687 , G03F7/029 , Y10S430/122
Abstract: There is provided an energy beam curable resin composition which comprises as an essential component a cationically polymerizable substance and an effective amount of an onium salt of a Lewis acid represented the following formula (I). ##STR1## [where X is a sulfonio group represented by the following formula (II)]. ##STR2## (where at least one of R.sub.1 -R.sub.10 is (A) a C.sub.1 -C.sub.18 aliphatic group having at least one hydroxyl group or (B) a C.sub.3 -C.sub.19 aliphatic group having a group of --OCH.sub.2 CH.sub.2 O--).
-
公开(公告)号：US06878827B2
公开(公告)日：2005-04-12
申请号：US10432605
申请日：2001-11-28
Applicant: Hiroki Ono , Masaru Hayashi , Masaru Ohnishi , Kazuo Ohkawa , Masato Kitayama
Inventor： Hiroki Ono , Masaru Hayashi , Masaru Ohnishi , Kazuo Ohkawa , Masato Kitayama
IPC: C07D277/40 , C07D277/56
CPC classification number: C07D277/40
Abstract: This invention provides a novel industrial process for preparation of an anhydride of 2-(2-aminothiazole-4-yl)-2-hydroxy compound.
Abstract translation: 本发明提供了制备2-（2-氨基噻唑-4-基）-2-羟基化合物的酸酐的新工业方法。
-
-
-
-
-
-
-
-
-
Search Results
12
records
(took 0.011 seconds)
