公开(公告)号：US07343666B2

公开(公告)日：2008-03-18

申请号：US10881782

申请日：2004-06-30

Applicant: Kim Y. Lee ,  Jyh-Shuey Jerry Lo ,  Dennis Richard McKean

Inventor： Kim Y. Lee ,  Jyh-Shuey Jerry Lo ,  Dennis Richard McKean

IPC: G11B5/127 ,  H04R31/00

CPC classification number: G11B5/3163 ,  G11B5/3116 ,  Y10T29/49043 ,  Y10T29/49046 ,  Y10T29/49048 ,  Y10T29/49052

Abstract: In one illustrative example, a method for use in making a magnetic write head includes the steps of forming a first pole piece layer of a first pole piece; forming a patterned resist over the first pole piece layer; electroplating a pedestal over the first pole piece layer within a channel of the patterned resist; electroplating a metal gap layer over the pedestal within the channel of the patterned resist; forming a resist channel shrinking film over the patterned resist; baking the resist channel shrinking film over the patterned to thereby reduce a width of the channel; removing the resist channel shrinking film; electroplating a second pole piece within the reduced-width channel of the patterned resist; removing the patterned resist; and milling the pedestal, using the second pole piece as a mask, to form a central notched pedestal having side walls with angled slopes.

Abstract translation: 在一个说明性示例中，用于制造磁写头的方法包括以下步骤：形成第一极片的第一极片层; 在所述第一极片层上形成图案化抗蚀剂; 在图案化的抗蚀剂的通道内的第一极片层上电镀一个基座; 在图案化的抗蚀剂的通道内的基座上方电镀金属间隙层; 在图案化的抗蚀剂上形成抗蚀剂通道收缩膜; 在图案上烘烤抗蚀剂通道收缩膜，从而减小通道的宽度; 去除抗蚀剂通道收缩膜; 在图案化的抗蚀剂的减小宽度的通道内电镀第二极片; 去除图案化的抗蚀剂; 并使用第二极片作为掩模铣削基座，以形成具有倾斜斜面的侧壁的中心凹口底座。

公开(公告)号：US07086139B2

公开(公告)日：2006-08-08

申请号：US10836136

申请日：2004-04-30

Applicant: Kim Y. Lee ,  Jyh-Shuey Jerry Lo

Inventor： Kim Y. Lee ,  Jyh-Shuey Jerry Lo

IPC: G11B5/127 ,  G11B5/187

CPC classification number: G11B5/1878 ,  Y10T29/49021 ,  Y10T29/49032 ,  Y10T29/49039 ,  Y10T29/49041 ,  Y10T29/49043 ,  Y10T29/49046 ,  Y10T29/49052

Abstract: A pedestal is formed over a first pole piece layer and insulator materials are formed to surround it. A gap layer made of a non-magnetic insulator or metal is then formed over the pedestal and the insulator, followed by the optional formation of a seed layer. A second pole piece is formed over the gap layer with or without the seed layer by forming a patterned resist using E-beam lithography and electroplating second pole piece materials within the patterned resist. After milling to remove side portions of the gap layer and the optional seed layer, a chemical etch is performed to remove a top portion of the insulator materials. The pedestal is then notched and trimmed by ion milling using the second pole piece as a mask to form a central notched structure. Since the second pole piece is precisely centered over the pedestal prior to notching, the pedestal is notched symmetrically to form a notched structure having side walls with angled slopes.

Abstract translation: 在第一极片层上形成基座，并且形成绝缘体材料以围绕它。 然后在基座和绝缘体上形成由非磁性绝缘体或金属制成的间隙层，随后可选地形成种子层。 通过在图案化的抗蚀剂内使用电子束光刻和电镀第二极片材料形成图案化的抗蚀剂，形成具有或不具有种子层的间隙层上的第二极片。 在研磨以除去间隙层和任选种子层的侧面部分之后，进行化学蚀刻以去除绝缘体材料的顶部。 然后通过使用第二极片作为掩模的离子铣削将基座切口并修整以形成中心的切口结构。 由于第二极靴在开槽之前精确地位于基座上方，因此基座被对称地切口以形成具有斜边的侧壁的凹口结构。

公开(公告)号：US06857181B2

公开(公告)日：2005-02-22

申请号：US10217768

申请日：2002-08-12

Applicant: Jyh-Shuey (Jerry) Lo ,  Timothy J. Moran

Inventor： Jyh-Shuey (Jerry) Lo ,  Timothy J. Moran

IPC: G11B5/31 ,  G11B5/33 ,  G11B5/39 ,  G11B5/127 ,  H04R31/00

CPC classification number: B82Y10/00 ,  G11B5/3103 ,  G11B5/3116 ,  G11B5/313 ,  G11B5/332 ,  G11B5/3967 ,  Y10T29/49032 ,  Y10T29/49041 ,  Y10T29/49043 ,  Y10T29/49044 ,  Y10T29/49046

Abstract: First, second and third pole tip components of a write head are formed with the second pole tip located between the first and third components and a write gap layer located between the first and second pole tip components. The second pole tip is formed with a width that defines a track width of the write head. The third pole tip component is formed with top and bottom surfaces wherein the bottom surface interfaces a top surface of the second pole tip component and has a width equal to the track width and wherein the top surface of the third pole tip has a width greater than the track width.

公开(公告)号：US6054023A

公开(公告)日：2000-04-25

申请号：US361392

申请日：1999-07-26

Applicant: Thomas Young Chang ,  Jyh-Shuey Jerry Lo

Inventor： Thomas Young Chang ,  Jyh-Shuey Jerry Lo

IPC: G11B5/012 ,  G11B5/31 ,  G11B5/39 ,  C23C14/34 ,  G11B5/127 ,  H04R31/00

CPC classification number: G11B5/3967 ,  G11B5/3116 ,  G11B5/313 ,  G11B5/3163 ,  G11B5/012 ,  Y10T29/49043

Abstract: A method of making provides an inverted merged MR head wherein frame plating is not required for forming a highly defined submicron track width of a top first pole tip portion. A forming structure is formed on a bottom first pole tip portion with a vertical wall located at a site where one of the edges of the top first pole tip is to be located. The top first pole tip is sputtered or plated on the vertical wall of the forming structure with a thickness that defines the track width of the write head. A mask with a recessed portion may be employed for forming the top first pole tip with a back wall that defines a zero throat height of the head. In a preferred embodiment a forming layer is formed adjacent an opposite edge of the top first pole tip and then the top surfaces of the top first pole tip, the forming layer and the forming structure are lapped until these top surfaces are flush with one another. The material of the top first pole tip has an ion milling rate that is greater than the ion milling rates of the forming layer and the forming structure. Ion milling is then employed to ion mill the top of the top first pole tip at a greater rate than the other layers causing a recess which is centered above the top surface of the top first pole tip. After depositing a write gap layer and a seedlayer in the recess the second pole tip is deposited in the recess causing the base of the second pole tip to be substantially aligned with the top surface of the top first pole tip. Sloping surfaces extending from the base of the second pole tip are similar to notching of a first pole piece in the prior art which promotes flux transfer between the pole tips and minimizes stray flux from the second pole tip to the bottom first pole tip.

Abstract translation: 一种制造方法提供反向合并的MR头，其中不需要框架电镀以形成顶部第一极尖端部分的高度限定的亚微米轨道宽度。 形成结构形成在底部第一极尖端部分上，其中垂直壁位于顶部第一极尖端的一个边缘将被定位的位置处。 顶部的第一极尖被溅射或镀在成形结构的垂直壁上，其厚度限定了写入头的轨道宽度。 可以采用具有凹陷部分的掩模来形成具有限定头部的零喉部高度的后壁的顶部第一极尖端。 在优选实施例中，形成层邻近顶部第一极尖端的相对边缘形成，然后上顶部第一极尖端，成形层和成形结构的顶表面被研磨直到这些顶部表面彼此齐平。 顶部第一极尖的材料的离子研磨速率大于成形层和成形结构的离子研磨速率。 然后使用离子铣削以比其它层更大的速率将顶部第一极尖的顶部离子磨，从而形成位于顶部第一极尖顶部顶部的中心的凹部。 在凹槽中沉积写间隙层和种子层之后，第二极尖沉积在凹槽中，使得第二极尖的基部与顶部第一极尖的顶表面基本上对准。 从第二极尖的基部延伸的斜面类似于现有技术中的第一极靴的切口，其促进极尖之间的磁通传递并使从第二极尖到底部第一极尖的杂散磁通最小化。

公开(公告)号：US07489474B2

公开(公告)日：2009-02-10

申请号：US12046270

申请日：2008-03-11

Applicant: Wen-Chein David Hsiao ,  Jyh-Shuey Jerry Lo

Inventor： Wen-Chein David Hsiao ,  Jyh-Shuey Jerry Lo

IPC: G11B33/02

CPC classification number: G11B5/3163 ,  G11B5/3116 ,  G11B5/3967 ,  Y10T29/49044

Abstract: A magnetic head includes a first pole piece; a second pole piece; a pedestal formed over a central portion of the first pole piece; a gap separating the pedestal from the second pole piece; and at least one of a top straight walled portion over the pedestal and a bottom straight-walled portion underneath the pedestal, the pedestal being notched with angled side walls.

Abstract translation: 磁头包括第一极片; 第二极片; 形成在所述第一极靴的中心部分上的基座; 将所述基座与所述第二极靴分开的间隙; 并且在基座上方的顶部直壁部分中的至少一个和底座下方的底部直壁部分之间的至少一个，基座以成角度的侧壁切口。

公开(公告)号：US07391591B2

公开(公告)日：2008-06-24

申请号：US11202712

申请日：2005-08-11

Applicant: Wen-Chein David Hsiao ,  Jyh-Shuey Jerry Lo

Inventor： Wen-Chein David Hsiao ,  Jyh-Shuey Jerry Lo

IPC: G11B5/147

CPC classification number: G11B5/3163 ,  G11B5/3116 ,  G11B5/3967 ,  Y10T29/49044

Abstract: A magnetic head having an improved fringing field and overwrite capability, and a method of making the same, are described. The method includes the acts of frame plating a pedestal over a first pole piece; depositing an insulator over the first pole piece and plated pedestal; chemically mechanically polishing (CMP) the top of the insulator to expose a top of the plated pedestal; depositing a gap layer over the top of the insulator and plated pedestal; depositing a seed layer over the gap layer; forming a second pole piece over the seed layer; ion milling, using the second pole piece as a mask, such that end portions of the seed layer are removed and a central portion remains; reactive ion milling, using the central portion of the seed layer as a mask, such that end portions of the gap layer are removed and a central portion of the gap layer having a width that is greater than a width of the second pole piece is formed; and ion milling the plated pedestal, using the central portion of the gap layer as a mask, to form a central notched structure having angled side walls of 25 degrees±24 degrees relative to normal.

Abstract translation: 描述了具有改善的边缘场和覆盖能力的磁头及其制造方法。 该方法包括在第一极片上对基座进行框架电镀的动作; 在第一极靴和电镀底座上沉积绝缘体; 化学机械地抛光（CMP）绝缘体的顶部以暴露电镀底座的顶部; 在绝缘体和电镀底座的顶部上沉积间隙层; 在间隙层上沉积种子层; 在种子层上形成第二极片; 离子铣削，使用第二极片作为掩模，使得种子层的端部被去除并且中心部分保留; 使用种子层的中心部分作为掩模的反应离子研磨，使得间隙层的端部被去除，并且间隙层的具有大于第二极靴的宽度的宽度的中心部分形成 ; 并且使用间隙层的中心部分作为掩模离子研磨电镀基座，以形成具有相对于法线为25度±24度的成角度侧壁的中心凹口结构。

公开(公告)号：US6158107A

公开(公告)日：2000-12-12

申请号：US54055

申请日：1998-04-02

Applicant: Thomas Young Chang ,  Jyh-Shuey Jerry Lo

Inventor： Thomas Young Chang ,  Jyh-Shuey Jerry Lo

IPC: G11B5/23 ,  G11B5/31 ,  G11B5/39 ,  G11B5/127 ,  G11B5/187

CPC classification number: G11B5/3116 ,  G11B5/3163 ,  G11B5/232 ,  G11B5/3967 ,  Y10T29/49032 ,  Y10T29/49044 ,  Y10T29/49046

Abstract: A method makes an inverted merged MR head with a second pole tip which is self-aligned with a top first pole tip. After forming a bottom first pole tip layer a top first pole tip is frame plated thereon with a width that defines a track width of the merged MR head. A photoresist layer, which is employed in the frame plating of the top first pole tip, is then soft baked which causes a photoresist opening above the top first pole tip to have sloping side edges which form a recess. An electrically-conductive sacrificial layer, such as copper, is then plated into the recess on top of the top first pole tip and the photoresist is removed. A forming layer, such as alumina, is then deposited and lapped so that the forming layer and the sacrificial layer have top surfaces that are flush with respect to one another. The sacrificial layer is then removed by an etchant that will not attack the materials of the pole tips and the forming layer. The forming layer now has a recess with sloping edges into which a gap layer, a seedlayer and a second pole tip layer are deposited. By this method the second pole tip is self-aligned with the top first pole tip with the second pole tip having a bottom that is substantially the same width as the top of the top first pole tip.

Abstract translation: 一种方法使得具有与顶部第一极尖自身对准的第二极尖的反向合并MR头。 在形成底部第一极尖端层之后，顶部第一极端部被框架镀覆在其上，其宽度限定了合并的MR头的轨道宽度。 用于顶部第一极尖端的框架电镀中的光致抗蚀剂层然后被软烘烤，这使得顶部第一极尖端上方的光致抗蚀剂开口具有形成凹部的倾斜侧边缘。 然后将诸如铜的导电牺牲层电镀到顶部第一极尖顶部的凹部中，并且去除光致抗蚀剂。 然后沉积和研磨诸如氧化铝的成形层，使得成形层和牺牲层具有相对于彼此齐平的顶表面。 然后通过不会攻击极尖和成形层的材料的蚀刻剂去除牺牲层。 成形层现在具有倾斜边缘的凹部，间隙层，籽晶层和第二极尖端层沉积到该凹部中。 通过该方法，第二极尖与顶部第一极尖自对准，第二极尖具有与顶部第一极尖的顶部基本相同的宽度的底部。

公开(公告)号：US07363698B2

公开(公告)日：2008-04-29

申请号：US10956221

申请日：2004-09-30

Applicant: Amanda Baer ,  Hamid Balamane ,  Daniel Wayne Bedell ,  Jyh-Shuey Jerry Lo ,  Vladimir Nikitin ,  Aron Pentek ,  Yvette Winton

Inventor： Amanda Baer ,  Hamid Balamane ,  Daniel Wayne Bedell ,  Jyh-Shuey Jerry Lo ,  Vladimir Nikitin ,  Aron Pentek ,  Yvette Winton

IPC: G11B5/127 ,  H04R31/00

CPC classification number: G11B5/1871 ,  G11B5/3163 ,  Y10T29/49021 ,  Y10T29/49032 ,  Y10T29/49034 ,  Y10T29/49043 ,  Y10T29/49046 ,  Y10T29/49048 ,  Y10T29/49052

Abstract: Methods for creating a write head by forming a bump after the top pole is formed are provided. In one embodiment, a bottom pole is created out of a first layer. A non-magnetic gap material is applied to the surface of the wafer. A top pole is created out of a second layer. After creating the top pole, a bump is created. The bump is used to protect at least a portion of the first layer while etching to create a stray flux absorber.

Abstract translation: 提供了通过在形成顶极之后形成凸块来创建写入头的方法。 在一个实施例中，从第一层产生底极。 将非磁隙材料施加到晶片的表面。 第二层创建顶杆。 创建顶极后，会创建一个凸起。 凸块用于在蚀刻时保护第一层的至少一部分以产生杂散通量吸收体。

公开(公告)号：US06747850B1

公开(公告)日：2004-06-08

申请号：US09721853

申请日：2000-11-24

Applicant: Thomas Young Chang ,  Edward Hinpong Lee ,  Jyh-Shuey Jerry Lo

Inventor： Thomas Young Chang ,  Edward Hinpong Lee ,  Jyh-Shuey Jerry Lo

IPC: G11B539

CPC classification number: G11B5/3967 ,  G11B5/024 ,  G11B5/23 ,  G11B5/232 ,  G11B5/3116 ,  G11B5/3163 ,  Y10T29/49044 ,  Y10T29/49046

Abstract: A single-sided, notched write head is provided for writing narrow erase band servo tracks as well as a double-notched write head, and for writing data tracks better than a double-notched write head. The single-sided, notched write head writes a narrow erase band on the notched side and a wide erase band on the unnotched side. In one embodiment, only one side of the first pole piece layer is notched, and in another embodiment a first side of the first pole piece layer is notched more than a second side. By writing servo tracks only a fraction of the track width of the write head, a wide erase band region is overwritten so that a narrow erase band is on each side of the servo track. Data tracks are written with a narrow erase band on one side and a wide erase band on the other side. The wide erase band on one side of the data track allows more flexibility in spacing the read head from adjacent tracks. The single-sided, notched write head can be manufactured with methods that require less processing time than a double-notched write head. In one method, a notching layer is employed where removal of a small corner of the notching layer provides the first pole piece with a notch. Other methods employ photoresist to protect the side of the first pole piece that is not to be notched, and/or oscillating the workpiece less than 360° so that milling is more concentrated at the notch site.

Abstract translation: 提供单面，带缺口的写入头，用于写入窄擦除带伺服磁道以及双切口写入头，并且用于比双切口写入头更好地写入数据轨道。 单面缺口写头在缺口侧写入窄擦除带，并在无缺口侧写入宽擦除带。 在一个实施例中，仅第一极靴层的一侧被切口，而在另一实施例中，第一极靴层的第一侧比第二侧更多地被切口。 通过仅将写入磁道的磁道宽度的一部分写入伺服磁道，将覆盖宽的擦除带区域，使得在伺服磁道的每一侧上存在窄的擦除带。 数据磁道在一侧写入窄的擦除频带，另一侧写入宽的擦除频带。 在数据轨道的一侧上的宽擦除带允许在读取头与相邻轨道间隔距离方面更加灵活。 单面，缺口写头可以使用比双切口写头要少的处理时间的方法制造。 在一种方法中，采用切口层，其中切口凹陷层的小角的移除为第一极片提供凹口。 其他方法使用光致抗蚀剂来保护第一极靴的不被切口的一侧和/或使工件摆动小于360°，使得铣削更集中在切口部位。

公开(公告)号：US06539610B1

公开(公告)日：2003-04-01

申请号：US09616838

申请日：2000-07-14

Applicant: Jyh-Shuey (Jerry) Lo ,  John I. Kim ,  Timothy J. Moran

Inventor： Jyh-Shuey (Jerry) Lo ,  John I. Kim ,  Timothy J. Moran

IPC: G11B5127

CPC classification number: G11B5/3163 ,  G11B5/3116 ,  Y10T29/49032 ,  Y10T29/49043 ,  Y10T29/49044 ,  Y10T29/49046 ,  Y10T29/49048 ,  Y10T29/49052

Abstract: A high throughput method for producing the narrow track width inductive head is also provided, whereby the heads may be manufactured in substantial volumes. The new head may be merged or piggy-backed MR or GMR heads, comprising a first pole piece, P1, and a second pole piece, P2, and is distinctly characterized by write track width is significantly reduced by a preliminary ion milling process before P1 notching is performed. The preliminary step utilizes an ion milling process to trim the write track width, P2B, at an angle between 45 to 85 degrees from the wafer normal. The MR head may then undergo conventional P1 notching.

Abstract translation: 还提供了用于生产窄轨道宽度感应头的高通量方法，由此可以大量地制造头部。 新的头部可以合并或带有背负的MR或GMR头，包括第一极靴P1和第二极靴P2，并且明显的特征在于通过在P1之前的初步离子铣削加工显着地减少写入轨道宽度 进行切口。 该初步步骤利用离子铣削工艺来以与晶片法线成45至85度的角度来修剪写入轨道宽度P2B。 然后，MR头可以经历常规的P1切口。