公开(公告)号：US20180051388A1

公开(公告)日：2018-02-22

申请号：US15678256

申请日：2017-08-16

申请人： Fengyan Hou ,  Yuxin Wang ,  Bo Hu ,  Christopher William Goode ,  Junzhe Dong

发明人： Fengyan Hou ,  Yuxin Wang ,  Bo Hu ,  Christopher William Goode ,  Junzhe Dong

IPC分类号： C25D11/04 ,  C25D13/20 ,  C25D5/44 ,  C25D21/08

摘要： In example implementations, a method for producing a thin film coating is provided. The method includes pre-treating a substrate, placing the substrate in a bath comprising at least phosphoric acid and sulphuric acid to produce a thin anodized layer, rinsing the thin anodized layer in a solution, plating a surface of the thin anodized layer in an electro deposition bath following a plating current profile for a predetermined period, and increasing the plating current to the recommended bath plating current to produce the thin film coating having a desired initial coating thickness.

公开(公告)号：US10519562B2

公开(公告)日：2019-12-31

申请号：US15678256

申请日：2017-08-16

申请人： Fengyan Hou ,  Yuxin Wang ,  Bo Hu ,  Christopher William Goode ,  Junzhe Dong

发明人： Fengyan Hou ,  Yuxin Wang ,  Bo Hu ,  Christopher William Goode ,  Junzhe Dong

IPC分类号： C25D11/20 ,  C25D11/22 ,  C25D5/44 ,  C25D5/18 ,  C25D11/04 ,  C25D13/20 ,  C25D21/08 ,  C25D5/38 ,  C25D5/42 ,  C25D11/08 ,  C25D11/16 ,  C25D11/26 ,  C25D11/30 ,  C25D5/14 ,  C25D11/10

摘要： In example implementations, a method for producing a thin film coating is provided. The method includes pre-treating a substrate, placing the substrate in a bath comprising at least phosphoric acid and sulphuric acid to produce a thin anodized layer, rinsing the thin anodized layer in a solution, plating a surface of the thin anodized layer in an electro deposition bath following a plating current profile for a predetermined period, and increasing the plating current to the recommended bath plating current to produce the thin film coating having a desired initial coating thickness.