摘要:
The invention pertains to a silicone release composition of which the peeling force can be controlled and also a silicone release film coated with the composition. With the inventive composition and the release film coated with the composition, it is possible to obtain a reproducible peeling force with a given value, and also possible to produce a uniformly coated release film without discharged harmful solvent. The silicone release film produced as such can have controlled peeling force with a stable peeling force characteristic compatible with viscous agent. To this end, the invention is characterized in that the silicone release composition of which the peeling force can be controlled according to the invention is a silicone water-dispersed release coating composition, contains organopolysiloxane, organopolysiloxane resin, organo hydrogen polysiloxane and platinum chelate catalyst, and meets the following math figure for peeling force: Peeling Force=a X+b, where a=61.62±3.98, and b=16.43±3.01, X=the content(%) of organopolysiloxane resin in the release coating composition.
摘要翻译:本发明涉及可以控制剥离力的有机硅剥离组合物,以及涂覆有组合物的硅氧烷剥离膜。 利用本发明的组合物和涂布有组合物的剥离膜,可以获得具有给定值的可再现的剥离力,并且还可以生产均匀涂布的脱模膜而不排出有害溶剂。 这样制造的有机硅剥离膜可以具有受控的剥离力,具有与粘性剂相容的稳定的剥离力特性。 为此,本发明的特征在于根据本发明可以控制剥离力的有机硅剥离组合物是硅氧烷水分散剥离涂料组合物,其包含有机聚硅氧烷,有机聚硅氧烷树脂,有机氢聚硅氧烷和铂螯合催化剂, 并符合以下剥离力数学:剥离力= a X + b,其中a = 61.62±3.98,b = 16.43±3.01,X =剥离涂料组合物中有机聚硅氧烷树脂的含量(%)。
摘要:
The invention relates to an antistatic silicone release film having a layer coated with an antistatic silicone release composition, and, used for semiconductors, electronics and display devices while addressing problems of static electricity generated when a general release film is separated from adhesive or an adhesive layer, and of contamination by such static electricity that causes critical product defects. The invention also relates to an antistatic silicon release film that can reduce product contamination caused by static electricity in peeling the film from adhesive or an adhesive layer, and achieves close adhesion between a substrate and a coated layer because of no interruption in curing a release layer, and also thereby has a stable release property.
摘要:
The invention relates to an antistatic silicone release film having a layer coated with an antistatic silicone release composition, and, used for semiconductors, electronics and display devices while addressing problems of static electricity generated when a general release film is separated from adhesive or an adhesive layer, and of contamination by such static electricity that causes critical product defects. The invention also relates to an antistatic silicon release film that can reduce product contamination caused by static electricity in peeling the film from adhesive or an adhesive layer, and achieves close adhesion between a substrate and a coated layer because of no interruption in curing a release layer, and also thereby has a stable release property.
摘要:
The present invention relates to a high strength light-weight ceramic insulator and a method for manufacture thereof wherein the light-weight ceramic insulator may be used at a high temperature by using a heat-resisting ceramic fiber. A colloidal silica or colloidal alumina which is an inorganic binder, and a methyl cellulose or a liquid-phase organic polymer which is an organic binder are added to an alumina-silica-based fiber containing zirconia, a concentration thereof is adjusted, a slurry is vacuum-molded, and drying and heating are carried out, thereby fabricating the ceramic insulator. Here, it is possible to fabricate the high strength light-weight ceramic insulator by artificially selectively positioning the inorganic binder to a contact point of the fibers.