公开(公告)号：US5049540A

公开(公告)日：1991-09-17

申请号：US353341

申请日：1989-05-17

Applicant: Jin Y. Park ,  Robert J. Kearney

Inventor： Jin Y. Park ,  Robert J. Kearney

IPC: B03C1/021

CPC classification number: B03C1/021 ,  Y10S505/727 ,  Y10S505/786 ,  Y10S505/932

Abstract: The specification and drawings describe a series of devices and methods for classifying and separating superconductive particles. The superconductive particles may be separated from non-superconductive particles, and the superconductive particles may be separated by degrees of susceptibility to the Meissner effect force. The particles may also be simultaneously separated by size or volume and mass to obtain substantially homogeneous groups of particles. The separation techniques include levitation, preferential sedimentation and preferential concentration. Multiple separation vector forces are disclosed.

Abstract translation: 说明书和附图描述了一系列用于分级和分离超导颗粒的装置和方法。 超导颗粒可以与非超导颗粒分离，并且超导颗粒可以与Meissner效应力的敏感度分开。 颗粒也可以通过尺寸或体积和质量同时分离，以获得基本均匀的颗粒组。 分离技术包括悬浮，优先沉淀和优先浓缩。 公开了多个分离矢量力。

公开(公告)号：US5579300A

公开(公告)日：1996-11-26

申请号：US434308

申请日：1995-05-02

Applicant: Sang R. Lee ,  Jin Y. Park

Inventor： Sang R. Lee ,  Jin Y. Park

IPC: H04Q11/04 ,  H04L12/50

CPC classification number: H04Q11/0464

Abstract: A private automatic branch exchange for an integrated services digital network, comprising primary rate interface boards. Each of the primary rate interface boards has a frame structure of 32 channels and layer-1, layer-2, layer-3 and operating system software to perform a subscriber's telephone function through interfacing with a data distribution board and a data switching board. Each of the primary rate interface boards provides a 2048 Kbps interface between the private automatic branch exchange and a central office exchange.

Abstract translation: 一个集成业务数字网络的专用自动分支交换机，包括主速率接口板。 每个主速率接口板具有32个通道的帧结构，第1层，第2层，第3层和操作系统软件，通过与数据分配板和数据交换板接口来执行用户的电话功能。 每个主速率接口板在私人自动分支交换机和中心局交换机之间提供2048Kbps的接口。

公开(公告)号：US5087323A

公开(公告)日：1992-02-11

申请号：US551925

申请日：1990-07-12

Applicant: Jin Y. Park

Inventor： Jin Y. Park

IPC: H01L21/311

CPC classification number: H01L21/31144 ,  H01L21/31111

Abstract: A wafer etching system for forming a fine line pattern on a wafer of a semiconductive material having an etchable film layer with an outer surface being divided by masking into exposed regions and masked regions includes an etchant vapor supply system for producing an etchant vapor of an etchant reactable with the etchable film layer. The system also includes an aerosol centrifuge etching device, including an expansion nozzle for adibatically expanding the etchant vapor received from the supply system to form therefrom etchant aerosols. The aerosol centrifuge etching device also includes a centrifuge which receives and uniformly accelerates the received etchant aerosols with a centrifugal force toward the wafer to be etched. The aerosol centrifuge etching device further includes mounting means for mounting the wafer within the centrifuge so the etchant aerosols may impinge upon the outer surface of the wafer and etch away the exposed regions of the etchable film layer. A method is also provided of using the aerosol centrifuge etching device and system for forming fine line patterns on wafers.

Abstract translation: 用于在具有可蚀刻膜层的半导体材料的晶片上形成细线图案的晶片蚀刻系统包括用于产生蚀刻剂的蚀刻剂蒸气的蚀刻剂蒸气供应系统 可与可蚀刻膜层反应。 该系统还包括气溶胶离心刻蚀装置，其包括用于使从供给系统接收的蚀刻剂蒸汽附着扩展从而形成蚀刻剂气溶胶的膨胀喷嘴。 气溶胶离心机蚀刻装置还包括离心机，其接收并均匀地加速接收的蚀刻剂气溶胶，其中离心力朝向要蚀刻的晶片。 气溶胶离心机蚀刻装置还包括用于将晶片安装在离心机内的安装装置，使得蚀刻剂气溶胶可以撞击晶片的外表面并蚀刻掉可蚀刻膜层的暴露区域。 还提供了一种使用用于在晶片上形成细线图案的气溶胶离心刻蚀装置和系统的方法。

公开(公告)号：US4604362A

公开(公告)日：1986-08-05

申请号：US691246

申请日：1985-01-14

Applicant: Jin Y. Park ,  Barry H. O'Brien ,  Woo G. Lee

Inventor： Jin Y. Park ,  Barry H. O'Brien ,  Woo G. Lee

IPC: G01N33/00 ,  B01J10/02 ,  B01J19/18 ,  B01L99/00 ,  G01N33/50

CPC classification number: B01J19/1887 ,  B01J10/02 ,  B01J2219/00063 ,  B01J2219/00065 ,  B01J2219/00094 ,  B01J2219/00162 ,  B01J2219/00164 ,  B01J2219/185

Abstract: A gas-liquid reactor comprising an outside containment vessel and an inside reaction vessel rotatably supported within the outside containment vessel. A liquid is conducted into the inside reaction vessel, and that vessel is rotated to force the liquid therein against a wall of the reaction vessel and into a film having a stable and geometrically simple shape. A gas is also conducted into the inside reaction vessel to react with the liquid therein. Because of the stable and simple shape of the liquid, the reactions between the liquid and gases are relatively easy to analyze quantitatively.

Abstract translation: 一种气液反应器，包括外部容纳容器和可旋转地支撑在外部容纳容器内的内部反应容器。 将液体引入内部反应容器中，并且使该容器旋转以迫使其中的液体抵靠反应容器的壁并且形成具有稳定且几何简单形状的膜。 气体也被引入到内部反应容器中以与其中的液体反应。 由于液体的稳定和简单的形状，液体和气体之间的反应相对容易定量分析。

公开(公告)号：US4589782A

公开(公告)日：1986-05-20

申请号：US618961

申请日：1984-06-11

Applicant: Jin Y. Park

Inventor： Jin Y. Park

IPC: G01N5/00 ,  G01N9/30 ,  G01N25/00

CPC classification number: G01N9/30 ,  G01N5/00

Abstract: A method and six devices for measuring the change in mass of a sample subjected to selected temperatures and fluid variables is disclosed. The test sample is subjected to centrifugal force to amplify the "apparent mass" of the sample by rotating the sample about a first axis of rotation. Any change in the mass of the test sample is then amplified by the centrifugal force and measured by the displacement or the displacement force of the sample. The above method and six separate devices are disclosed. The first device balances the mass of the test sample against a known reference weight. The second device generates a counter-rotational force about a second axis to bring the sample to a "nulled" position. The third device balances the force generated about the second axis against a known and adjustable balance beam. A reciprocating means is used to couple the balance beam to a rotating sample holder. The fourth device generates a counter force along the balance beam to bring the sample to a "nulled" position. The radial displacement force is measured in the fifth device and the radial displacement is measured in the sixth device. The devices are particularly adapted for mass change analysis in high temperature environments using high sweep gas rates and a variety of gaseous fluids.

Abstract translation: 公开了一种用于测量经受所选温度和流体变量的样品的质量变化的方法和六个装置。 通过围绕第一旋转轴旋转样品，使测试样品经受离心力以放大样品的“表观质量”。 然后通过离心力放大测试样品质量的任何变化，并通过样品的位移或位移力进行测量。 公开了上述方法和六个单独的装置。 第一个装置将测试样品的质量与已知参考重量平衡。 第二装置产生围绕第二轴线的反向旋转力，以使样本处于“无效”位置。 第三装置平衡了围绕第二轴产生的力与已知和可调平衡梁的平衡。 往复运动装置用于将平衡梁连接到旋转的样品架上。 第四装置沿着平衡梁产生反作用力以使样本处于“无效”位置。 在第五装置中测量径向位移力，并且在第六装置中测量径向位移。 该装置特别适用于使用高吹扫气体速率和各种气态流体的高温环境中的质量变化分析。

公开(公告)号：US4596470A

公开(公告)日：1986-06-24

申请号：US686341

申请日：1984-12-26

Applicant: Jin Y. Park

Inventor： Jin Y. Park

IPC: G01N5/00 ,  G01N9/30 ,  G01N25/00

CPC classification number: G01N5/00 ,  G01N9/30

Abstract: A method and four devices for measuring the change in mass of a sample subjected to selected temperatures and fluid variables is disclosed. The test sample is subjected to centrifugal force to apply the "apparent mass" of the sample by rotating the sample about a first axis of rotation. Any change in the mass of the test sample is then amplified by the centrifugal force and measured by the displacement of the sample about a second axis of rotation. The above method and four separate devices are disclosed. The first device balances the mass of the test sample against a known reference sample. The second device generates a counter-rotational force about the second axis to bring the sample to a "nulled" position. The third device balances the force generated about the second axis against a known and adjustable balance beam. A reciprocating means is used to couple the balance beam to a rotating sample holder. The fourth device generates a counter force along the balance beam to bring the sample to a "nulled" position. The devices are particularly adapted for mass change analysis in high temperature environments using high sweep gas rates and a variety of gaseous fluids.

Abstract translation: 公开了一种用于测量经受所选温度和流体变量的样品的质量变化的方法和四个装置。 通过围绕第一旋转轴旋转样品，使测试样品经受离心力以施加样品的“表观质量”。 然后通过离心力放大测试样品的质量的任何变化，并通过样品围绕第二旋转轴的位移来测量。 公开了上述方法和四个单独的装置。 第一个装置将测试样品的质量与已知参考样品平衡。 第二装置产生围绕第二轴线的反向旋转力，以使样本处于“无效”位置。 第三装置平衡了围绕第二轴产生的力与已知和可调平衡梁的平衡。 往复运动装置用于将平衡梁连接到旋转的样品架上。 第四装置沿着平衡梁产生反作用力以使样本处于“无效”位置。 该装置特别适用于使用高吹扫气体速率和各种气态流体的高温环境中的质量变化分析。