公开(公告)号：US20080055597A1

公开(公告)日：2008-03-06

申请号：US11467930

申请日：2006-08-29

申请人： Jie-Wei Sun ,  Wen-Kai Hung ,  Benjamin Szu-Min Lin

发明人： Jie-Wei Sun ,  Wen-Kai Hung ,  Benjamin Szu-Min Lin

IPC分类号： G01J4/00 ,  G01B11/14

CPC分类号： G01B11/24 ,  G01N21/211 ,  G01N21/956 ,  G01N2021/213

摘要： A method for characterizing line width roughness of printed features is provided. A wafer having thereon a plurality of gratings formed within a test key region is prepared. The wafer is transferred to a spectroscopic ellipsometry tool having a light source, a detector and a computer. A polarized light beam emanated from the light source is directed onto the gratings. Spectrum data of reflected light is measured and recorded. The spectrum data is compared to a library linked to the computer in real time. The library contains a plurality of contact-hole model based spectra created by incorporating parameter values that describes the line width roughness. The spectrum data is matched with the contact-hole model based spectra, thereby determining the parameter values.

摘要翻译： 提供了一种表征印刷特征线宽粗糙度的方法。 制备其上具有形成在测试键区域内的多个光栅的晶片。 将晶片转移到具有光源，检测器和计算机的分光椭圆仪。 从光源发出的偏振光束被引导到光栅上。 测量和记录反射光的光谱数据。 将频谱数据与实时连接到计算机的库进行比较。 该库包含通过引入描述线宽粗糙度的参数值而创建的多个基于接触孔模型的光谱。 光谱数据与基于接触孔模型的光谱匹配，从而确定参数值。

公开(公告)号：US20130038336A1

公开(公告)日：2013-02-14

申请号：US13208440

申请日：2011-08-12

申请人： Jie-Wei SUN ,  Chao-Hsien Wu ,  Chia-Chun Sun ,  Yun-San Huang ,  Chien-Li Kuo

发明人： Jie-Wei SUN ,  Chao-Hsien Wu ,  Chia-Chun Sun ,  Yun-San Huang ,  Chien-Li Kuo

IPC分类号： G01R35/00

CPC分类号： G01R35/00 ,  G01R1/073 ,  G01R35/005

摘要： A calibration device applied for a test apparatus with at least a first probe and a second probe, the calibration device comprising: a first testing region and a second testing region, the first testing region and the second testing region divides into n×n sensing units respectively, the first testing region for generating n×n average electricity corresponding to a contact degree of the first probe contacted with the calibration device, and the second testing region for generating another n×n average electricity corresponding to a contact degree of the second probe contacted with the calibration device, and the pitch is the distance between the center of the first testing region to the center of the second testing region that is the same as that of the center of the first probe to the center of the second probe.

摘要翻译： 一种用于具有至少第一探针和第二探针的测试装置的校准装置，所述校准装置包括：第一测试区域和第二测试区域，所述第一测试区域和所述第二测试区域分为n×n个感测单元 分别产生与接收校准装置的第一探针的接触度相对应的n×n平均电力的第一测试区域和用于产生与第二探针的接触度相对应的另外n×n平均电流的第二测试区域 与校准装置接触，间距是第一测试区域的中心与第二测试区域的中心之间的距离，其与第一探针的中心相对于第二探测器的中心的距离相同。