公开(公告)号：US20080055597A1

公开(公告)日：2008-03-06

申请号：US11467930

申请日：2006-08-29

申请人： Jie-Wei Sun ,  Wen-Kai Hung ,  Benjamin Szu-Min Lin

发明人： Jie-Wei Sun ,  Wen-Kai Hung ,  Benjamin Szu-Min Lin

IPC分类号： G01J4/00 ,  G01B11/14

CPC分类号： G01B11/24 ,  G01N21/211 ,  G01N21/956 ,  G01N2021/213

摘要： A method for characterizing line width roughness of printed features is provided. A wafer having thereon a plurality of gratings formed within a test key region is prepared. The wafer is transferred to a spectroscopic ellipsometry tool having a light source, a detector and a computer. A polarized light beam emanated from the light source is directed onto the gratings. Spectrum data of reflected light is measured and recorded. The spectrum data is compared to a library linked to the computer in real time. The library contains a plurality of contact-hole model based spectra created by incorporating parameter values that describes the line width roughness. The spectrum data is matched with the contact-hole model based spectra, thereby determining the parameter values.

摘要翻译： 提供了一种表征印刷特征线宽粗糙度的方法。 制备其上具有形成在测试键区域内的多个光栅的晶片。 将晶片转移到具有光源，检测器和计算机的分光椭圆仪。 从光源发出的偏振光束被引导到光栅上。 测量和记录反射光的光谱数据。 将频谱数据与实时连接到计算机的库进行比较。 该库包含通过引入描述线宽粗糙度的参数值而创建的多个基于接触孔模型的光谱。 光谱数据与基于接触孔模型的光谱匹配，从而确定参数值。