公开(公告)号：US07728253B2

公开(公告)日：2010-06-01

申请号：US11478348

申请日：2006-06-29

申请人： Jeffrey A. Hopwood

发明人： Jeffrey A. Hopwood

IPC分类号： B23K10/00

CPC分类号： G01N21/68 ,  G01N15/0656 ,  G01N2015/0693 ,  H01J37/32366

摘要： A system and method employing a microplasma to electrically charge nano- or micro-particles in a gas phase and, subsequently, trap the charged particles within the microplasma using the microplasma's built-in electric fields are disclosed. Confinement of the particles allows their density to be increased over time such that very low concentrations of particles can be detected, e.g., by methods such as laser scattering and/or detection of the plasma-induced charge on the particles. Preferably, charge detection methods are employed when nano-particles are to be trapped and detected.

摘要翻译： 公开了一种使用微质体对气相中的纳米或微粒进行电荷并随后使用微质体内置电场捕获微量等离子体内的带电粒子的系统和方法。 颗粒的限制允许其密度随时间增加，使得可以例如通过诸如激光散射和/或检测颗粒上的等离子体诱导电荷的方法来检测非常低浓度的颗粒。 优选地，当纳米颗粒被捕获和检测时，采用电荷检测方法。

公开(公告)号：US5622635A

公开(公告)日：1997-04-22

申请号：US417026

申请日：1995-04-05

申请人： Jerome J. Cuomo ,  C. Richard Guarnieri ,  Jeffrey A. Hopwood

发明人： Jerome J. Cuomo ,  C. Richard Guarnieri ,  Jeffrey A. Hopwood

IPC分类号： C23C14/00 ,  C23C16/50 ,  C23F4/00 ,  H01J37/32 ,  H01L21/205 ,  H01L21/302 ,  H01L21/3065 ,  H05H1/46 ,  C03C25/06 ,  H05H1/24

CPC分类号： H01J37/321 ,  H05H1/46

摘要： A method of gas plasma treating a workpiece in a process chamber having RF coil outside the chamber, a flat dielectric window, and a electrically conducting shield, adapted to be located between the RF coil and the dielectric window. The shield comprises a planar body section having a periphery, central opening, and outer gaps forming a substantially continuous opening about the periphery. A uniform magnetic field, inductively coupled with the plasma, is formed by routing the flux lines of the magnetic field through the central opening and outer gaps of the shield. Contamination from sputtering is substantially eliminated by reducing the capacitive electric fields generated by the coil that interfere with the inductive coupling between the coil and the gas plasma.

摘要翻译： 一种在室外具有RF线圈的处理室中的气体等离子体处理方法，平坦电介质窗口和导电屏蔽件，其适于位于RF线圈和电介质窗口之间。 屏蔽包括具有周边，中心开口和外部间隙的平面主体部分，其围绕周边形成基本上连续的开口。 通过使磁场的磁通线穿过屏蔽的中心开口和外部间隙来形成与等离子体感应耦合的均匀磁场。 通过减少线圈产生的电容电场干扰线圈和气体等离子体之间的电感耦合，基本上消除了溅射污染。

公开(公告)号：US5280154A

公开(公告)日：1994-01-18

申请号：US828060

申请日：1992-01-30

申请人： Jerome J. Cuomo ,  Charles R. Guarnieri ,  Jeffrey A. Hopwood ,  Stanley J. Whitehair

发明人： Jerome J. Cuomo ,  Charles R. Guarnieri ,  Jeffrey A. Hopwood ,  Stanley J. Whitehair

IPC分类号： H01L21/205 ,  C23F4/00 ,  H01J37/32 ,  H01L21/027 ,  H01L21/30 ,  H01L21/302 ,  H01L21/3065 ,  H01L21/31 ,  B23K9/00

CPC分类号： H01J37/321

摘要： A plasma processing apparatus comprising: a chamber for supporting a workpiece; an inlet for introducing a gas into the chamber; a coil of conductive material having a generally flattened configuration whereby to provide a at least one generally planar surface defined by parallel conductors disposed on the chamber; and apparatus for applying radio frequency energy to the coil.

摘要翻译： 一种等离子体处理装置，包括：用于支撑工件的室; 用于将气体引入所述室的入口; 导电材料的线圈，其具有大致扁平的构造，由此提供由设置在所述腔室上的平行导体限定的至少一个大致平坦的表面; 以及用于向线圈施加射频能量的装置。

公开(公告)号：US20100072391A1

公开(公告)日：2010-03-25

申请号：US11478348

申请日：2006-06-29

申请人： Jeffrey A. Hopwood

发明人： Jeffrey A. Hopwood

IPC分类号： H01J3/26 ,  G01N21/85

CPC分类号： G01N21/68 ,  G01N15/0656 ,  G01N2015/0693 ,  H01J37/32366

摘要： A system and method employing a microplasma to electrically charge nano- or micro-particles in a gas phase and, subsequently, trap the charged particles within the microplasma using the microplasma's built-in electric fields are disclosed. Confinement of the particles allows their density to be increased over time such that very low concentrations of particles can be detected, e.g., by methods such as laser scattering and/or detection of the plasma-induced charge on the particles. Preferably, charge detection methods are employed when nano-particles are to be trapped and detected.

摘要翻译： 公开了一种使用微质体对气相中的纳米或微粒进行电荷并随后使用微质体内置电场捕获微量等离子体内的带电粒子的系统和方法。 颗粒的限制允许其密度随时间增加，使得可以例如通过诸如激光散射和/或检测颗粒上的等离子体诱导电荷的方法来检测非常低浓度的颗粒。 优选地，当纳米颗粒被捕获和检测时，采用电荷检测方法。

公开(公告)号：US06917165B2

公开(公告)日：2005-07-12

申请号：US10743124

申请日：2003-12-22

申请人： Jeffrey A. Hopwood ,  Felipe Iza

发明人： Jeffrey A. Hopwood ,  Felipe Iza

IPC分类号： H05H1/24 ,  H05H1/46 ,  H01J7/24 ,  C23C16/00

CPC分类号： H05H1/46 ,  H05H2001/4622

摘要： A low power plasma generator is provided which can be fabricated in micro-miniature size and which is capable of efficient portable operation. The plasma generator comprises a microwave stripline high Q resonant ring, which may be circular or non-circular, disposed on a dielectric substrate and having a discharge gap in the plane of the substrate. The resonant ring is one-half wavelength in circumference at the operating frequency and is matched to the impedance of the microwave power supply. The voltages at the resonator ends at the gap are 180° out of phase and create an intense electric field in the gap, and a resultant discharge across the gap. The discharge is non-thermal and operates near room temperature and has an intense optical emission. The generator is well suited for low power portable and other applications and can be readily fabricated by known microcircuit techniques. Alternatively, the gap of the resonant ring can extend through the substrate and in which the discharge is formed. A bias coil can be coupled to the ring to provide a bias voltage to the plasma. A feedback path can be provided for self oscillation and closed loop frequency control.

摘要翻译： 提供了一种低功率等离子体发生器，其可以以微型尺寸制造，并且能够有效地进行便携操作。 等离子体发生器包括布置在电介质基板上并且在基板的平面中具有放电间隙的微波带状线高Q谐振环，其可以是圆形或非圆形。 谐振环在工作频率下周长为半波长，与微波电源的阻抗相匹配。 谐振器在间隙处结束的电压是180°异相，并且在间隙中产生强电场，并且在间隙上产生放电。 放电是非热的并且在室温附近操作并具有强烈​​的光发射。 该发生器非常适用于低功率便携式和其他应用，并且可以通过已知的微电路技术容易地制造。 或者，谐振环的间隙可以延伸穿过衬底并且其中形成放电。 偏置线圈可以耦合到环以向等离子体提供偏置电压。 可以为自振荡和闭环频率控制提供反馈路径。

公开(公告)号：US09006972B2

公开(公告)日：2015-04-14

申请号：US13266396

申请日：2010-04-27

申请人： Jeffrey A. Hopwood

发明人： Jeffrey A. Hopwood

IPC分类号： H01J19/80 ,  H01J7/46 ,  H01L31/18 ,  C23C16/24 ,  C23C16/511 ,  C23C16/54 ,  H01J37/32 ,  H05H1/46

CPC分类号： H01L31/1876 ,  C23C16/24 ,  C23C16/511 ,  C23C16/545 ,  H01J37/32366 ,  H01J37/32825 ,  H05H1/46 ,  H05H2001/4622 ,  Y02E10/50 ,  Y02P70/521

摘要： A low-temperature, atmospheric-pressure microplasma generator comprises at least one strip of metal on a dielectric substrate. A first end of the strip is connected to a ground plane and the second end of the strip is adjacent to a grounded electrode, with a gap being defined between the second end of the strip and the grounded electrode. High frequency power is supplied to the strip. The frequency is selected so that the length of the strip is an odd integer multiple of ¼ of the wavelength traveling on the strip. A microplasma forms in the gap between the second end of the strip and the grounded electrode due to electric fields in that region. A microplasma generator array comprises a plurality of strongly-coupled resonant strips in close proximity to one another. At least one of the strips has an input for high-frequency electrical power. The remaining strips resonate due to coupling from the at least one powered strip. The array can provide a continuous line or ring of plasma. The microplasma generator can be used to alter the surface of a substrate, such as by adding material (deposition), removal of material (etching), or modifying surface chemistry.

摘要翻译： 低温大气压微量发生器在电介质基底上包括至少一条金属条。 带的第一端连接到接地平面，并且带的第二端与接地电极相邻，在带的第二端和接地电极之间限定间隙。 高频电源被提供给带。 选择频率使得条的长度是在带上行进的波长的1/4的奇整数倍。 由于该区域中的电场，在条带的第二端和接地电极之间的间隙中形成微米。 微量发生器阵列包括彼此靠近的多个强耦合谐振条。 至少一个条具有用于高频电力的输入。 剩余的条由于至少一个动力带的联接而共振。 阵列可以提供连续的等离子体线或环。 微量发生器可以用于改变基底的表面，例如通过添加材料（沉积），去除材料（蚀刻）或改变表面化学。

公开(公告)号：US20140159571A1

公开(公告)日：2014-06-12

申请号：US14235510

申请日：2012-07-26

申请人： Jeffrey A. Hopwood ,  Chen Wu ,  Alan R. Hoskinson ,  Sameer Sonkusale

发明人： Jeffrey A. Hopwood ,  Chen Wu ,  Alan R. Hoskinson ,  Sameer Sonkusale

IPC分类号： H01J7/46

CPC分类号： H01J7/46 ,  H05H1/2406 ,  H05H2001/2425

摘要： A microplasma generator includes first and second conductive resonators disposed on a first surface of a dielectric substrate. The first and second conductive resonators are arranged in line with one another with a gap defined between a first end of each resonator. A ground plane is disposed on a second surface of the dielectric substrate and a second end of each of the first and second resonators is coupled to the ground plane. A power input connector is coupled to the first resonator at a first predetermined distance from the second end chosen as a function of the impedance of the first conductive resonator. A microplasma generating array includes a number of resonators in a dielectric material substrate with one end of each resonator coupled to ground. A micro-plasma is generated at the non-grounded end of each resonator. The substrate includes a ground electrode and the microplasmas are generated between the non-grounded end of the resonator and the ground electrode. The coupling of each resonator to ground may be made through controlled switches in order to turn each resonator off or on and therefore control where and when a microplasma will be created in the array.

摘要翻译： 微生物发生器包括设置在电介质基板的第一表面上的第一和第二导电谐振器。 第一和第二导电谐振器彼此成直线排列，间隙限定在每个谐振器的第一端之间。 接地平面设置在电介质基板的第二表面上，并且第一和第二谐振器中的每一个的第二端耦合到接地平面。 电力输入连接器以与第一导电谐振器的阻抗的函数相应的第二端的第一预定距离耦合到第一谐振器。 微量产生阵列包括在每个谐振器的一端耦合到地的电介质材料衬底中的多个谐振器。 在每个谐振器的非接地端产生微等离子体。 衬底包括接地电极，并且在谐振器的非接地端和接地电极之间产生微量等离子体。 每个谐振器到地的耦合可以通过受控的开关来实现，以便关闭或接通每个谐振器，从而控制在阵列中何时和何时产生微等离子体。

公开(公告)号：US07256669B2

公开(公告)日：2007-08-14

申请号：US09844251

申请日：2001-04-27

申请人： Richard H. Morrison, Jr. ,  Nicol E. McGruer ,  Jeffrey A. Hopwood

发明人： Richard H. Morrison, Jr. ,  Nicol E. McGruer ,  Jeffrey A. Hopwood

IPC分类号： H01H51/22

CPC分类号： H01H1/0036 ,  H01H1/021 ,  H01H11/04 ,  Y10T29/49105 ,  Y10T29/49155

摘要： Processes for preparing contacts on microswitches have been invented. The first is a wet process, involving the use of one or more acids, bases and peroxides, in some formulations diluted in water, to flush the contacts. The second process involves exposing the contacts to plasmas of various gases, including (1) oxygen, (2) a mixture of carbon tetrafluoride and oxygen, or (3) argon.

摘要翻译： 已经发明了在微动开关上制备接触的方法。 第一个是湿法，涉及在一些稀释在水中的配方中使用一种或多种酸，碱和过氧化物，以冲洗接触物。 第二种方法包括将接触暴露于各种气体的等离子体，包括（1）氧气，（2）四氟化碳和氧气的混合物，或（3）氩气。

公开(公告)号：US5942855A

公开(公告)日：1999-08-24

申请号：US703975

申请日：1996-08-28

申请人： Jeffrey A. Hopwood

发明人： Jeffrey A. Hopwood

IPC分类号： H01J37/32 ,  H05H1/24 ,  H05H1/46

CPC分类号： H01J37/32174 ,  H01J37/321 ,  H05H1/24 ,  H05H1/46

摘要： A monolithic inductively coupled plasma generator includes a first substrate having an electrical circuit disposed thereon which includes a substantially planar inductive coil, a capacitor electrically coupled in series with the coil, and a drive circuit electrically coupled to the coil for driving the circuit at resonance. The plasma generator further includes a plasma chamber proximate the coil in which a gas is excited. In accordance with the invention, a method of fabricating an inductively coupled plasma generator includes the steps of providing a first substrate, depositing at least one layer of conductive material on the first substrate, patterning and etching the at least one layer of conductive material to form an electrical circuit including a coil and a capacitor, providing a plasma chamber proximate the electrical circuit, providing a gas to the plasma chamber, and connecting an oscillator to the electrical circuit for providing radio frequency energy to the electrical circuit wherein the gas is excited into a plasma.

摘要翻译： 单片电感耦合等离子体发生器包括具有设置在其上的电路的第一基板，其包括基本上平面的感应线圈，与线圈串联电耦合的电容器，以及电耦合到线圈的驱动电路，用于在谐振时驱动电路。 等离子体发生器还包括靠近线圈的等离子体室，其中气体被激发。 根据本发明，制造电感耦合等离子体发生器的方法包括以下步骤：提供第一衬底，在第一衬底上沉积至少一层导电材料，图案化和蚀刻至少一层导电材料以形成 包括线圈和电容器的电路，在电路附近提供等离子体室，向等离子体室提供气体，以及将振荡器连接到电路以向电路提供射频能量，其中气体被激发成 等离子体

公开(公告)号：US5433812A

公开(公告)日：1995-07-18

申请号：US5678

申请日：1993-01-19

申请人： Jerome J. Cuomo ,  C. Richard Guarnieri ,  Jeffrey A. Hopwood

发明人： Jerome J. Cuomo ,  C. Richard Guarnieri ,  Jeffrey A. Hopwood

IPC分类号： C23C14/00 ,  C23C16/50 ,  C23F4/00 ,  H01J37/32 ,  H01L21/205 ,  H01L21/302 ,  H01L21/3065 ,  H05H1/46 ,  C23F1/02 ,  C23C16/00

CPC分类号： H01J37/321 ,  H05H1/46

摘要： A shield for shunting capacitive electric fields generated by an RF coil away from a gas plasma process chamber's dielectric window and toward ground. The shield comprise an electrically conducting, substantially planar body section having a periphery and adapted to be located between the RF coil and the dielectric window during plasma treating of a workpiece. A central opening in the body section and gaps about the periphery permit RF magnetic fields to inductively couple with the plasma and return around the coil, respectively. The shield substantially reduces interference by capacitive electric fields generated by the coil with inductive coupling between the coil and the gas plasma, thus substantially eliminating contamination from sputtering of the dielectric window by the capacitive electric fields.

摘要翻译： 用于分流由RF线圈远离气体等离子体处理室的电介质窗口并朝向地面产生的电容性电场的屏蔽。 屏蔽包括导电的，基本平坦的主体部分，其具有周边并且适于在等离子体处理工件期间位于RF线圈和电介质窗口之间。 主体部分的中心开口和围绕周边的间隙允许RF磁场与等离子体感应耦合并分别绕线圈返回。 屏蔽层通过线圈和气体等离子体之间的感应耦合，大大减小了线圈产生的电容电场的干扰，从而基本上消除了电容电场对介质窗的溅射的污染。