Binder Resin for Color Toners and Color Toner Using the Same
    2.
    发明申请
    Binder Resin for Color Toners and Color Toner Using the Same 有权
    彩色调色剂用粘合剂树脂及使用其的彩色调色剂

    公开(公告)号:US20100209837A1

    公开(公告)日:2010-08-19

    申请号:US12675362

    申请日:2008-08-27

    IPC分类号: G03G9/087 G03G9/09 G03G9/08

    摘要: Provided is a binder resin for color toners which comprises at least a carboxyl group-containing vinyl resin (C), a glycidyl group-containing vinyl resin (E) and a reaction product thereof, wherein the storage modulus G′ at 160 degrees centigrade is not less than 20 and less than 800 Pa measured at a frequency of 6.28 rad/sec, the tetrahydrofuran (THF) soluble portion in the binder resin has a main peak in the molecular weight region of not less than 20,000 and less than 40,000 in the molecular weight distribution measured by gel permeation chromatography (GPC), and the binder resin contains at least one of releasing agents having a melting point of not lower than 60 and not higher than 120 degrees centigrade in an amount of not less than 3.5 and not more than 12 mass % based on 100 mass % of the total amount of the carboxyl group-containing vinyl resin (C), the glycidyl group-containing vinyl resin (E) and a reaction product thereof.

    摘要翻译: 提供一种用于彩色调色剂的粘合剂树脂,其至少包含含羧基的乙烯基树脂(C),含缩水甘油基的乙烯基树脂(E)及其反应产物,其中160摄氏度的储能模量G' 在6.28rad / sec的频率下测定的不低于20和小于800Pa的粘合剂树脂中的四氢呋喃(THF)可溶部分在分子量区域中的主峰不小于20,000并且小于40,000 通过凝胶渗透色谱法(GPC)测定的分子量分布,粘合剂树脂含有熔点不低于60℃且不高于120℃的脱模剂中的至少一种,不低于3.5,而不是更多 基于含羧基的乙烯基树脂(C),含缩水甘油基的乙烯基树脂(E)和其反应产物的总量的100质量%为12质量%以上。

    Processing apparatus and method for plasma processing
    4.
    发明授权
    Processing apparatus and method for plasma processing 失效
    等离子体处理装置和方法

    公开(公告)号:US5134965A

    公开(公告)日:1992-08-04

    申请号:US538150

    申请日:1990-06-14

    摘要: Disclosed is a plasma CVD apparatus and a method therefor, the apparatus comprising: a microwave generating portion; a coaxial cavity resonator for making a microwave supplied from the microwave generating portion resonate; a plurality of gas leading inlets provided in under portions of an axis of the cavity resonator and in peripheral wall portions of the cavity resonator for leading-in a supplied CVD gas; and a plasma generating chamber in which the CVD gas lead into the plasma generating chamber through the gas leading inlets and made to flow uniformly onto a surface of a substrate is subject to the microwave made intensive through resonance in the cavity resonator and radiated through a coupling plate so that uniform plasma is generated to thereby form a thin film on the surface of the substrate.Further disclosed is a plasma processing apparatus and a method therefor, the apparatus comprising; a plasma chamber for maintaining plasma generated in the inside of the plasma chamber so as to perform plasma processing; a first microwave accumulating and intensifying cavity resonance chamber connected with the plasma chamber through a first slot plate; a second microwave accumulating and intensifying cavity resonance chamber connected with the first cavity resonance chamber through a second slot plate parallel to the first slot plate; and a microwave generator for leading a microwave into the second cavity resonance chamber through a waveguide.

    摘要翻译: 公开了一种等离子体CVD装置及其方法,该装置包括:微波产生部分; 用于使从微波产生部供给的微波共振的同轴空腔谐振器; 设置在空腔谐振器的轴的下部的多个气体导入口和用于引入所提供的CVD气体的空腔谐振器的周壁部; 以及等离子体产生室,其中CVD气体通过气体引入入口进入等离子体发生室并使其均匀地流动到衬底的表面上受到微波在空腔谐振器中通过谐振强化并通过耦合辐射 使得产生均匀的等离子体,从而在衬底的表面上形成薄膜。 另外公开了一种等离子体处理装置及其方法,该装置包括: 等离子体室,用于保持等离子体室内部产生的等离子体,以进行等离子体处理; 通过第一槽板与等离子体室连接的第一微波积聚和增强腔共振腔; 第二微波积聚和增强腔谐振室,通过与第一槽板平行的第二槽板与第一空腔共振室连接; 以及微波发生器,用于通过波导将微波引导到第二腔谐振室。

    Method of and apparatus for removing foreign particles
    7.
    发明授权
    Method of and apparatus for removing foreign particles 失效
    去除异物的方法和设备

    公开(公告)号:US5531862A

    公开(公告)日:1996-07-02

    申请号:US277017

    申请日:1994-07-19

    摘要: A method of and apparatus removes foreign particles in a vacuum or in a dry atmosphere before and in continuation to performing a dry process, such as a dry etching or a sputtering process. For this purpose, the foreign particles are separated from a substrate by subjecting the foreign particles to a force for separating the foreign particles from the substrate and a vibrating force for vibrating the foreign particles at the same time, and then the frequency of vibration is changed to match the resonant frequency of a vibration system formed by each of the foreign particles and the substrate, thereby applying a vibration energy to the foreign particles due to resonance. The separated foreign particles floating in a plasma are drawn to an electrode having a potential which is controlled such that a flowing-in of electrons is reduced, and the particles are discharged from the inside of the plasma. In this way, the foreign particles can be reduced and the yield of the product in manufacturing semiconductors and TFTs can be promoted. Further, a cleaning step, a film forming operation, an etching process and the like can continuously be processed, thereby achieving a reduction in steps and a promotion in productivity.

    摘要翻译: 一种和设备的方法和装置在进行干法或干法蚀刻或溅射工艺之前和之后的真空或干燥气氛中去除异物。 为此目的,通过使外来颗粒受到来自基板的异物分离的力和用于同时振动异物的振动力,使外来颗粒与基板分离,然后振动频率发生变化 以匹配由每个异物和衬底形成的振动系统的谐振频率,从而由于共振而向外来颗粒施加振动能。 将等离子体中漂浮的分离的异物吸引到具有被控制的电位的电极,使得电子的流入减少,并且粒子从等离子体的内部排出。 以这种方式,可以减少外来颗粒,并且可以促进制造半导体和TFT的产品的产率。 此外,可以连续地处理清洁步骤,成膜操作,蚀刻处理等,从而实现步骤的降低和生产率的提高。

    Plasma processing apparatus using plasma produced by microwaves
    8.
    发明授权
    Plasma processing apparatus using plasma produced by microwaves 失效
    使用微波产生的等离子体处理装置

    公开(公告)号:US5304277A

    公开(公告)日:1994-04-19

    申请号:US767798

    申请日:1991-09-30

    摘要: A plasma processing apparatus includes a plasma processing chamber having a stage for placing a substrate to be plasma processed, an exhaust port and a gas introduction nozzle for plasma processing coupled therewith, and a cavity resonator for closing the plasma processing chamber in vacuum manner and coupled through a microwave introducing window through which microwaves are introduced and having slots for radiating microwaves to the plasma processing chamber. Microwaves having increased intensity of an electromagnetic field is supplied to the processing chamber to produce plasma to effect processing of the substrate. An area in which diffusion of plasma is suppressed to reduce loss is formed only in the vicinity of an inner wall of the processing chamber.

    摘要翻译: 等离子体处理装置包括等离子体处理室,其具有用于放置待等离子体处理的基板的台,排气口和与其结合的等离子体处理的气体引入喷嘴,以及用于以真空方式关闭等离子体处理室的空腔谐振器, 通过其中引入微波的微波引入窗口并具有用于向等离子体处理室辐射微波的槽。 具有增加的电磁场强度的微波被提供给处理室以产生等离子体以实现衬底的处理。 仅在处理室的内壁附近形成等离子体的扩散被抑制以减少损耗的区域。

    Binder resin for color toners and color toner using the same
    9.
    发明授权
    Binder resin for color toners and color toner using the same 有权
    用于彩色调色剂的粘合剂树脂和使用其的彩色调色剂

    公开(公告)号:US08450039B2

    公开(公告)日:2013-05-28

    申请号:US12675362

    申请日:2008-08-27

    IPC分类号: G03G9/087

    摘要: Provided is a binder resin for color toners which comprises at least a carboxyl group-containing vinyl resin (C), a glycidyl group-containing vinyl resin (E) and a reaction product thereof, wherein the storage modulus G′ at 160 degrees centigrade is not less than 20 and less than 800 Pa measured at a frequency of 6.28 rad/sec, the tetrahydrofuran (THF) soluble portion in the binder resin has a main peak in the molecular weight region of not less than 20,000 and less than 40,000 in the molecular weight distribution measured by gel permeation chromatography (GPC), and the binder resin contains at least one of releasing agents having a melting point of not lower than 60 and not higher than 120 degrees centigrade in an amount of not less than 3.5 and not more than 12 mass % based on 100 mass % of the total amount of the carboxyl group-containing vinyl resin (C), the glycidyl group-containing vinyl resin (E) and a reaction product thereof.

    摘要翻译: 提供一种用于彩色调色剂的粘合剂树脂,其至少包含含羧基的乙烯基树脂(C),含缩水甘油基的乙烯基树脂(E)及其反应产物,其中160摄氏度的储能模量G' 在6.28rad / sec的频率下测定的不低于20和小于800Pa的粘合剂树脂中的四氢呋喃(THF)可溶部分在分子量区域中的主峰不小于20,000并且小于40,000 通过凝胶渗透色谱法(GPC)测定的分子量分布,粘合剂树脂含有熔点不低于60℃且不高于120℃的脱模剂中的至少一种,不低于3.5,而不是更多 基于含羧基的乙烯基树脂(C),含缩水甘油基的乙烯基树脂(E)和其反应产物的总量的100质量%为12质量%以上。