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    SILICON AND SILICA NANOSTRUCTURES AND METHOD OF MAKING SILICON AND SILICA NANOSTRUCTURES
    2.
    发明申请
    SILICON AND SILICA NANOSTRUCTURES AND METHOD OF MAKING SILICON AND SILICA NANOSTRUCTURES 审中-公开
    硅和二氧化硅纳米结构和制备硅和二氧化硅纳米结构的方法

    公开(公告)号：US20160002096A1

    公开(公告)日：2016-01-07

    申请号：US14750047

    申请日：2015-06-25

    申请人： Corning Incorporated ,  ICFO

    发明人： Albert Carrilero ,  Prantik Mazumder ,  Valerio Pruneri

    IPC分类号： C03C15/00 ,  C01B33/12

    CPC分类号： C03C15/00 ,  C01B33/12 ,  C01P2004/13 ,  C30B11/12 ,  C30B29/06 ,  C30B29/18 ,  C30B29/60 ,  C30B29/602

    摘要： Provided herein are methods for forming one or more silicon nanostructures, such as silicon nanotubes, and a silica-containing glass substrate. As a result of the process used to prepare the silicon nanostructures, the silica-containing glass substrate comprises one or more nanopillars and the one or more silicon nanostructures extend from the nanopillars of the silica-containing glass substrate. The silicon nanostructures include nanotubes and optionally nanowires. A further aspect is a method for preparing silicon nanostructures on a silica-containing glass substrate. The method includes providing one or more metal nanoparticles on a silica-containing glass substrate and then performing reactive ion etching of the silica-containing glass substrate under conditions that are suitable for the formation of one or more silicon nanostructures.

    摘要翻译： 本文提供了形成一个或多个硅纳米结构的方法，例如硅纳米管和含二氧化硅的玻璃基板。 作为用于制备硅纳米结构的方法的结果，含二氧化硅的玻璃基底包括一个或多个纳米柱，并且一个或多个硅纳米结构从含二氧化硅玻璃基底的纳米柱延伸。 硅纳米结构包括纳米管和任选的纳米线。 另一方面是在含二氧化硅的玻璃基板上制备硅纳米结构的方法。 该方法包括在含二氧化硅的玻璃衬底上提供一种或多种金属纳米颗粒，然后在适合于形成一种或多种硅纳米结构的条件下进行含二氧化硅的玻璃衬底的反应离子蚀刻。

    ARTICLES WITH MONOLITHIC, STRUCTURED SURFACES AND METHODS FOR MAKING AND USING SAME
    5.
    发明申请
    ARTICLES WITH MONOLITHIC, STRUCTURED SURFACES AND METHODS FOR MAKING AND USING SAME 审中-公开
    具有单晶，结构化表面的制品及其制造和使用方法

    公开(公告)号：US20150174625A1

    公开(公告)日：2015-06-25

    申请号：US14625010

    申请日：2015-02-18

    申请人： CORNING INCORPORATED ,  ICFO (THE INSTITUE OF PHOTONIC SCIENCES) ,  ICREA (INSTITUTE CATALANA DE RECERCA I ESTUDIS AVANCATS)

    发明人： Shandon Dee Hart ,  Karl William Koch, III ,  Domenico Tulli ,  Prantik Mazumder ,  Valerio Pruneri ,  Paul Arthur Sachenik ,  Lili Tian ,  Johann Osmond ,  Albert Carrilero

    IPC分类号： B08B17/06 ,  G06F3/041

    CPC分类号： B08B17/065 ,  C03C15/00 ,  C03C17/30 ,  C03C2204/08 ,  G06F3/041 ,  G06F2203/04103 ,  Y10S977/773 ,  Y10S977/89 ,  Y10T428/24355

    摘要： A textured article that includes a transparent substrate having at least one primary surface and a glass, glass-ceramic or ceramic composition; a micro-textured surface on the primary surface of the substrate, the micro-textured surface comprising a plurality of hillocks; and a nano-structured surface on the micro-textured surface, the nano-structured surface comprising a plurality of nano-sized protrusions or a multilayer coating comprising a plurality of layers having a nano-scale thickness. Further, the hillocks have an average height of about 10 to about 1000 nm and an average longest lateral cross-sectional dimension of about 1 to about 100 μm, and the nano-sized protrusions have an average height of about 10 to about 500 nm and an average longest lateral cross-sectional dimension of about 10 to about 500 nm. The substrate may be chemically strengthened with a compressive stress greater than about 500 MPa and a compressive depth-of-layer greater than about 15 μm.

    摘要翻译： 一种纹理制品，其包括具有至少一个主表面的透明基材和玻璃，玻璃陶瓷或陶瓷组合物; 在所述基底的主表面上的微纹理表面，所述微纹理表面包括多个小丘; 以及纳米结构化表面，所述纳米结构化表面包括多个纳米尺寸的突起或包含具有纳米级厚度的多个层的多层涂层。 此外，小丘的平均高度为约10至约1000nm，平均最大横向横截面尺寸为约1至约100μm，并且纳米尺寸的突起具有约10至约500nm的平均高度，以及 约10至约500nm的平均最长横向横截面尺寸。 衬底可以用大于约500MPa的压缩应力和大于约15μm的压缩深度层进行化学强化。