公开(公告)号：US06753126B2

公开(公告)日：2004-06-22

申请号：US10073693

申请日：2002-02-11

Applicant: Joohyeon Park ,  Dongchul Seo ,  Jongbum Lee ,  Hyunpyo Jeon ,  Seongju Kim

Inventor： Joohyeon Park ,  Dongchul Seo ,  Jongbum Lee ,  Hyunpyo Jeon ,  Seongju Kim

IPC: G03C173

CPC classification number: C08K5/42 ,  C08F220/28 ,  G03F7/0392 ,  G03F7/0397 ,  Y10S430/108 ,  Y10S430/111 ,  Y10S430/115 ,  Y10S430/122 ,  Y10S430/126

Abstract: Disclosed is a polymer for use in a chemically amplified resist, a resist composition including such a polymer is suitable for use in a chemically amplified resist, which is sensitive to KrF or ArF excimer laser and forms a photoresist pattern having low dependence on and good adhesion to substrate, high transparency in the wavelength range of the above radiation, strong resistance to dry etching, and excellencies in sensitivity, resolution and developability. The resist composition can have a stronger etching resistance with a maximized content of unsaturated aliphatic ring in the polymer and a reduced edge roughness of the photoresist pattern with an alkoxyalkyl acrylate monomer employed.

Abstract translation: 公开了一种用于化学增幅抗蚀剂的聚合物，包含这种聚合物的抗蚀剂组合物适用于对KrF或ArF准分子激光敏感的化学放大型抗蚀剂，并形成具有低依赖性和良好粘附性的光致抗蚀剂图案 到基板，在上述辐射的波长范围内的高透明度，对干蚀刻的强耐性，以及灵敏度，分辨率和显影性方面的优异性。 抗蚀剂组合物可以具有更强的抗蚀刻性，聚合物中不饱和脂肪族环的含量最大，并且所用的具有烷氧基烷基丙烯酸酯单体的光致抗蚀剂图案的边缘粗糙度降低。

公开(公告)号：US06639036B2

公开(公告)日：2003-10-28

申请号：US10056124

申请日：2002-01-24

Applicant: JooHyeon Park ,  DongChul Seo ,  YoungTaek Lim ,  HyunSang Joo ,  SeongDuk Cho ,  SeongJu Kim

Inventor： JooHyeon Park ,  DongChul Seo ,  YoungTaek Lim ,  HyunSang Joo ,  SeongDuk Cho ,  SeongJu Kim

IPC: C08F1000

CPC classification number: G03F7/0397 ,  C08F222/06 ,  C08F232/00 ,  G03F7/0392 ,  G03F7/0395

Abstract: A chemically amplified resist composition consists of an acid generating agent, additive, solvent and a copolymer represented by the following formula: where R1, R2 and R6 are independent of each other and respectively include a hydrogen atom or an alkyl, alkoxymethylene, alkoxyethylene, phenyl, alkoxyalkylene, alkylphenyl, alkoxyphenyl, allyl, benzyl, alkylbenzyl, alkoxybenzyl containing 1 to 34 carbon atoms having or not having an hydroxy, ether, ester, carbonyl, acetal, epoxy, nitrile or aldehyde; R5 is a hydrogen atom, an alkyl or alkoxy group containing 1 to 18 carbon atoms; R7 is a hydrogen atom, an alkyl group containing 1 to 18 carbon atoms, an alkyl group containing alkoxy 1 to 18 carbon atoms or an alkyl group containing ester of 1 to 18 carbon atoms; R3 and R4 are independent and respectively include a hydrogen atom, hydroxy, nitrile, aldehyde, hydroxymethylene, and alkylcarbonyloxy, alky, hydroxyalkylene, alkoxycarbonyl, alkoxymethylene or alkoxyalkanyl group containing 1 to 18 carbon atoms; X is olefin derivatives, vinyl ether derivatives or styrene derivatives containing 1 to 40 carbon atoms, alternatively these derivatives may be comprised of hydroxy, ester, alkoxyalkyloxycarbonyl, ketone or ether; a, b, c, d, e and f are a number represented a repeating unit in the main chain, wherein a+b+c+d+e+f=1, the content of a and b are 0 to 0.7, respectively, (a+b)/(a+b+c+d+e+f)>0.3, and the content of c, d, e and f are 0 to 0.9, respectively; and n is an integer of 0 or 1.

Abstract translation: 化学放大抗蚀剂组合物由酸产生剂，添加剂，溶剂和由下式表示的共聚物组成：其中R1，R2和R6彼此独立，分别包括氢原子或烷基，烷氧基亚甲基，烷氧基亚乙基，苯基 烷基苯基，烷氧基苯基，烯丙基，苄基，烷基苄基，含有或不具有羟基，醚，酯，羰基，缩醛，环氧，腈或醛的1至34个碳原子的烷氧基苄基; R5是氢原子，含有1至18个碳原子的烷基或烷氧基; R7是氢原子，含有1至18个碳原子的烷基，含有1至18个碳原子的烷氧基的烷基或含有1至18个碳原子的烷基的酯; R3和R4独立地分别包括含有1至18个碳原子的氢原子，羟基，腈，醛，羟基亚甲基和烷基羰基氧基，烷基，羟基亚烷基，烷氧基羰基，烷氧基亚甲基或烷氧基烷基; X是含有1至40个碳原子的烯烃衍生物，乙烯基醚衍生物或苯乙烯衍生物，或者这些衍生物可以由羟基，酯，烷氧基烷氧基羰基，酮或醚组成。 a，b，c，d，e和f是主链中重复单元的数字，其中a + b + c + d + e + f = 1，a和b的含量分别为0〜0.7 ，（a + b）/（a + b + c + d + e + f）> 0.3，c，d，e和f的含量分别为0〜0.9， n为0或1的整数。