Work item rules for a work item tracking system

    公开(公告)号:US20060218030A1

    公开(公告)日:2006-09-28

    申请号:US11090692

    申请日:2005-03-25

    CPC classification number: G06Q10/10 G06Q10/063114 G06Q10/06316

    Abstract: Work item rules for a work item tracking system are provided. Work item rules may be accessible, usable and subject to interpretation by multiple software entities. Further, work item rules may be configured to be subject to creation and change by users, for example, by exposure to users through a user interface. A work item rule may specify an identifier by which the abstraction can be identified and/or a name, and may specify, or be indicative of, a condition and an action to be taken if the condition is satisfied. In response to a first user action affecting a first work item rule, one or more work item rules corresponding to the first user and/or the first work item may be determined. The one or more work item rules then may be interpreted, and the user action responded to based on the interpretation.

    Process for xylanase production
    2.
    发明申请
    Process for xylanase production 审中-公开
    木聚糖酶生产过程

    公开(公告)号:US20050106699A1

    公开(公告)日:2005-05-19

    申请号:US10485347

    申请日:2002-08-02

    CPC classification number: C12N15/8257 C12N9/2482 C12N15/8214 C12Y302/01008

    Abstract: The invention provides a process of obtaining a xylanase, said process comprising: providing a protein-containing extract of a transplastomic plant tissue comprising plastids transformed with a polynucleotide encoding said xylanase, said extract having been subjected to heat treatment that has denatured at least some of the protein content of said tissue but under which the xylanase has remained stable; and recovering said xylanase from said extract.

    Abstract translation: 本发明提供了一种获得木聚糖酶的方法,所述方法包括:提供含有编码所述木聚糖酶的多核苷酸转化的质体的转基因植物组织的含蛋白质的提取物,所述提取物已进行热处理,所述热处理已变性至少部分 所述组织的蛋白质含量,但木聚糖酶保持稳定; 并从所述提取物中回收所述木聚糖酶。

    Rotatable multi-pin apparatus, and process for friction driven stitch welding and structural modification of materials
    3.
    发明授权
    Rotatable multi-pin apparatus, and process for friction driven stitch welding and structural modification of materials 失效
    可旋转多针装置,以及摩擦驱动针迹焊接和材料结构改性的工艺

    公开(公告)号:US07597237B2

    公开(公告)日:2009-10-06

    申请号:US11409895

    申请日:2006-04-24

    Applicant: Amit Ghosh

    Inventor: Amit Ghosh

    CPC classification number: B23K20/125 B23K20/1255 B23K20/1275

    Abstract: A process is disclosed that creates a high shear rate in a workpiece using a head including a ring-shaped rotatable shoulder, a first pin and a second pin, both pins extending downwardly relative to the shoulder. The process includes coupling the workpiece to a table and rotating the first pin and the second pin in the same direction, wherein the first pin has a diameter, wherein a gap between the first pin and the second pin is less than the diameter. The head is plowed through the workpiece with the shoulder bearing downwardly against the workpiece and the first and second pin disposed in the first and second workpieces. The first pin rotates in a direction opposite the direction of the second pin in the gap to create a high shear rate of the workpiece within the gap.

    Abstract translation: 公开了一种方法,其使用包括环形可旋转肩部,第一销和第二销的头部在工件中产生高剪切速率,两个销相对于肩部向下延伸。 该工艺包括将工件连接到工作台上并沿同一方向旋转第一销和第二销,其中第一销具有直径,其中第一销和第二销之间的间隙小于直径。 头部穿过工件,其肩部肩部向下抵靠工件,并且第一和第二销设置在第一和第二工件中。 第一销在与间隙中的第二销的方向相反的方向上旋转以在间隙内产生工件的高剪切速率。

    Enabling inter-subsystem resource sharing

    公开(公告)号:US20060123432A1

    公开(公告)日:2006-06-08

    申请号:US11004608

    申请日:2004-12-03

    CPC classification number: G06F9/547 G06F9/541

    Abstract: Techniques for enabling inter-subsystem resource sharing are provided. The techniques include providing an RPC client on a first subsystem for acting as a proxy for a resource of a second subsystem. When the first subsystem receives a request from an application to access the resource, the RPC client may invoke a function of an RPC server associated with the second subsystem. The RPC server may load the resource on the second subsystem. The RPC client may then act as a proxy for the resource.

    Operating system performance
    6.
    发明申请
    Operating system performance 有权
    操作系统性能

    公开(公告)号:US20060150203A1

    公开(公告)日:2006-07-06

    申请号:US11003934

    申请日:2004-12-03

    CPC classification number: G06F9/461

    Abstract: Techniques for improving operating system performance are provided. A subsystem of an operating system operates as a kernel mode component, such as a kernel mode driver, instead of operating as a user mode component.

    Abstract translation: 提供了提高操作系统性能的技术。 操作系统的子系统作为内核模式组件(如内核模式驱动程序)运行,而不是作为用户模式组件运行。

    Rotatable multi-pin apparatus, and process for friction driven stitch welding and structural modification of materials

    公开(公告)号:US20060273140A1

    公开(公告)日:2006-12-07

    申请号:US11409895

    申请日:2006-04-24

    Applicant: Amit Ghosh

    Inventor: Amit Ghosh

    CPC classification number: B23K20/125 B23K20/1255 B23K20/1275

    Abstract: A process is disclosed that creates a high shear rate in a workpiece using a head including a ring-shaped rotatable shoulder, a first pin and a second pin, both pins extending downwardly relative to the shoulder. The process includes coupling the workpiece to a table and rotating the first pin and the second pin in the same direction, wherein the first pin has a diameter, wherein a gap between the first pin and the second pin is less than the diameter. The head is plowed through the workpiece with the shoulder bearing downwardly against the workpiece and the first and second pin disposed in the first and second workpieces. The first pin rotates in a direction opposite the direction of the second pin in the gap to create a high shear rate of the workpiece within the gap.

    Semiconductor mask alignment system utilizing pellicle with zero layer image placement indicator
    9.
    发明授权
    Semiconductor mask alignment system utilizing pellicle with zero layer image placement indicator 有权
    半导体掩模对准系统利用具有零层图像放置指示器的防护薄膜

    公开(公告)号:US06569579B2

    公开(公告)日:2003-05-27

    申请号:US09805846

    申请日:2001-03-13

    CPC classification number: G03F9/7088 G03F7/70983 G03F9/7076 Y10S438/975

    Abstract: An exposure apparatus is provided for a semiconductor wafer, which includes a light source, a body containing the light source, and an illumination optical system for directing light from the light source to the semiconductor wafer. A holder in the body holds a reticle and a zero layer reticle is disposed between the illumination optical system and the light source for masking light from the light source. The zero layer reticle has a pellicle frame and a pellicle film with a zero layer image placement indicator thereon.

    Abstract translation: 提供了一种用于半导体晶片的曝光装置,其包括光源,包含光源的主体,以及用于将来自光源的光引导到半导体晶片的照明光学系统。 身体中的保持器保持掩模版,并且在照明光学系统和光源之间设置零层掩模版,用于掩蔽来自光源的光。 零层掩模版具有防护薄膜组件和防护薄膜,其上具有零层图像放置指示器。

Patent Agency Ranking