公开(公告)号：US20090314762A1

公开(公告)日：2009-12-24

申请号：US12485160

申请日：2009-06-16

Applicant: Anqing Cui ,  Binh Tran ,  Alexander Tam ,  Jacob W. Smith ,  R. Suryanarayanan Iyer ,  Joseph Yudovsky ,  Sean M. Seutter

Inventor： Anqing Cui ,  Binh Tran ,  Alexander Tam ,  Jacob W. Smith ,  R. Suryanarayanan Iyer ,  Joseph Yudovsky ,  Sean M. Seutter

IPC: H05B3/68

CPC classification number: H01L21/67103 ,  H01L21/67248 ,  H05B3/68

Abstract: Apparatus, reactors, and methods for heating substrates are disclosed. The apparatus comprises a stage comprising a body and a surface having an area to support a substrate, a shaft coupled to the stage, a first heating element disposed within a central region of the body of the stage, and at least second and third heating elements disposed within the body of the stage, the at least second and third heating elements each partially surrounding the first heating element and wherein the at least second and third heating elements are circumferentially adjacent to each other.

Abstract translation: 公开了用于加热基底的装置，反应器和方法。 该装置包括一个舞台，包括主体和具有支撑衬底的区域的表面，耦合到舞台的轴，设置在舞台的身体的中心区域内的第一加热元件，以及至少第二和第三加热元件 设置在所述台体内，所述至少第二和第三加热元件各自部分地围绕所述第一加热元件，并且其中所述至少第二和第三加热元件彼此周向相邻。

公开(公告)号：US07377002B2

公开(公告)日：2008-05-27

申请号：US10976012

申请日：2004-10-28

Applicant: Joseph Yudovsky ,  Avi Tepman ,  Kenneth R. Reynolds ,  Younes Achkire ,  Dan A. Marohl ,  Steve G. Ghanayem ,  Alexander S. Polyak ,  Gary Ettinger ,  Haochuan Zhang ,  Hui Chen

Inventor： Joseph Yudovsky ,  Avi Tepman ,  Kenneth R. Reynolds ,  Younes Achkire ,  Dan A. Marohl ,  Steve G. Ghanayem ,  Alexander S. Polyak ,  Gary Ettinger ,  Haochuan Zhang ,  Hui Chen

IPC: B08B1/04

CPC classification number: H01L21/67046 ,  B08B1/04

Abstract: A scrubber box is provided that includes a tank adapted to receive a substrate for cleaning, supports outside of the tank and adapted to couple to ends of scrubber brushes disposed within the tank, a motor mounted to each of the supports and adapted to rotate the scrubber brushes, a base to which the supports are pivotally mounted via spherical bearings adapted to permit toe-in of the scrubber brushes, a brush gap actuator adapted, via a crank and rocker mechanism, to substantially simultaneously pivot the supports toward or away from each other so as to permit the scrubber brushes to substantially simultaneously achieve or break contact with the substrate, and a toe-in actuator adapted to move two of the spherical bearings toward or away from each other so as to adjust a toe-in angle between the scrubber brushes.

Abstract translation: 提供了一种洗涤器箱，其包括适于接收用于清洁的基底的罐，支撑在罐外部并且适于耦合到设置在罐内的洗涤器刷的端部;马达，其安装到每个支撑件上并适于旋转洗涤器 电刷，支架通过适于允许洗涤器刷子进入的球面轴承可枢转地安装的基座，经由曲柄和摇臂机构适应的基本上同时地使支撑件朝向或远离彼此枢转的电刷间隙致动器 以便允许洗涤器刷子基本上同时实现或断开与基板的接触，以及适于将两个球形轴承朝向或远离彼此移动的脚趾致动器，以便调节洗涤器之间的束缚角度 刷子

公开(公告)号：US20080072823A1

公开(公告)日：2008-03-27

申请号：US11870285

申请日：2007-10-10

Applicant: Joseph Yudovsky ,  Lawrence Lei ,  Salvador Umotoy ,  Tom Madar ,  Girish Dixit ,  Gwo-Chuan Tzu

Inventor： Joseph Yudovsky ,  Lawrence Lei ,  Salvador Umotoy ,  Tom Madar ,  Girish Dixit ,  Gwo-Chuan Tzu

IPC: C23C16/458

CPC classification number: C23C16/4585 ,  C30B25/12 ,  C30B31/14

Abstract: The invention provides a removable first edge ring configured for pin and recess/slot coupling with a second edge ring disposed on the substrate support. In one embodiment, a first edge ring includes a plurality of pins, and a second edge ring includes one or more alignment recesses and one or more alignment slots for mating engagement with the pins. Each of the alignment recesses and alignment slots are at least as wide as the corresponding pins, and each of the alignment slots extends in the radial direction a length that is sufficient to compensate for the difference in thermal expansion between the first edge ring and the second edge ring.

Abstract translation: 本发明提供了可拆卸的第一边缘环，其被配置用于与设置在基板支撑件上的第二边缘环的销和凹槽/狭槽联接。 在一个实施例中，第一边缘环包括多个销，并且第二边缘环包括一个或多个对准凹槽和用于与销配合接合的一个或多个对准槽。 每个对准凹槽和对准槽至少与相应的销一样宽，并且每个对准槽在径向方向上延伸的长度足以补偿第一边缘环和第二边缘之间的热膨胀差 边缘环。

公开(公告)号：US20070259111A1

公开(公告)日：2007-11-08

申请号：US11464121

申请日：2006-08-11

Applicant: Kaushal K. Singh ,  Maitreyee Mahajani ,  Steve G. Ghanayem ,  Joseph Yudovsky ,  Brendan McDougall

Inventor： Kaushal K. Singh ,  Maitreyee Mahajani ,  Steve G. Ghanayem ,  Joseph Yudovsky ,  Brendan McDougall

IPC: C23C16/00

CPC classification number: H01J37/32009 ,  C23C16/0209 ,  C23C16/0245 ,  C23C16/045 ,  C23C16/34 ,  C23C16/403 ,  C23C16/405 ,  C23C16/4405 ,  C23C16/45504 ,  C23C16/45508 ,  C23C16/45574 ,  C23C16/45591 ,  C23C16/4583 ,  C23C16/46 ,  C23C16/482 ,  C23C16/509

Abstract: The invention generally provides a method for depositing materials, and more particularly, embodiments of the invention relate to chemical vapor deposition processes and atomic layer deposition processes utilizing photoexcitation techniques to deposit barrier layers, seed layers, conductive materials, and dielectric materials. Embodiments of the invention generally provide methods of the assisted processes and apparatuses, in which the assisted processes may be conducted for providing uniformly deposited material.

Abstract translation: 本发明通常提供一种用于沉积材料的方法，更具体地说，本发明的实施方案涉及利用光激发技术沉积阻挡层，种子层，导电材料和电介质材料的化学气相沉积方法和原子层沉积方法。 本发明的实施方案通常提供了辅助方法和装置的方法，其中可以进行辅助过程以提供均匀沉积的材料。

公开(公告)号：US20070259110A1

公开(公告)日：2007-11-08

申请号：US11381970

申请日：2006-05-05

Applicant: Maitreyee Mahajani ,  Joseph Yudovsky ,  Brendan McDougall

Inventor： Maitreyee Mahajani ,  Joseph Yudovsky ,  Brendan McDougall

IPC: C23C16/00 ,  H05H1/24

CPC classification number: H01J37/32009 ,  C23C16/45508 ,  C23C16/45574 ,  C23C16/4583 ,  C23C16/46 ,  C23C16/509

Abstract: A batch processing chamber includes a chamber housing, a substrate boat for containing a batch of substrates in a process region, and an excitation assembly for exciting species of a processing gas. The excitation assembly is positioned within the chamber housing and may include plasma, UV, or ion assistance.

Abstract translation: 批处理室包括：室壳体，用于在处理区域中容纳一批衬底的衬底舟和用于激发加工气体种类的激发组件。 激发组件定位在腔室内，并且可以包括等离子体，UV或离子辅助。

公开(公告)号：US20070059128A1

公开(公告)日：2007-03-15

申请号：US11216969

申请日：2005-08-31

Applicant: Joseph Yudovsky ,  Robert Cook ,  Nir Merry

Inventor： Joseph Yudovsky ,  Robert Cook ,  Nir Merry

IPC: H01L21/677

CPC classification number: H01L21/67309 ,  H01L21/67757

Abstract: Aspects of the invention include methods and apparatus for processing a batch of substrates. In one embodiment, a compressed substrate boat is configured to reduce pumping volume in a batch processing chamber. The compressed substrate boat comprises a stationary substrate boat and a movable substrate boat, each may be loaded/unloaded independently. The movable substrate boat and the stationary substrate boat may be interleaving with one another such that the distance between the substrates is reduced. In another embodiment, a substrate boat having removable substrate holder is configured to provide susceptors without dramatically increasing pumping volume. The removable substrate holder may be loaded/unloaded away from the substrate boat with susceptors. The removable substrate holder is engaged with the substrate boat such that substrates thereon are interleaving with the susceptors. Embodiments of the present invention reduces pumping volume and increases throughput, hence reduces cost of ownership during batch processing.

Abstract translation: 本发明的方面包括用于处理一批基底的方法和装置。 在一个实施例中，压缩衬底舟被配置成减少间歇处理室中的泵送体积。 压缩的基板舟皿包括固定的基板船和可移动的基板船，每个可以独立地加载/卸载。 可移动衬底舟皿和固定衬底舟皿可以彼此交错，使得衬底之间的距离减小。 在另一个实施例中，具有可移除衬底保持器的衬底舟皿构造成提供感受器而不会显着增加泵送容积。 可移除的基板保持器可以与基座一起装载/卸载离开基板舟皿。 可拆卸衬底保持器与衬底舟皿接合，使得其上的衬底与感受器交错。 本发明的实施例减少了泵送量并增加了生产量，因此在批量处理期间降低了所有权成本。

公开(公告)号：US06818094B2

公开(公告)日：2004-11-16

申请号：US10354790

申请日：2003-01-29

Applicant: Joseph Yudovsky

Inventor： Joseph Yudovsky

IPC: H01L21306

CPC classification number: C23C16/45544

Abstract: A gas valve for pulsing a gas comprises a housing assembly having at least one inlet port, an outlet port, and a selector plate mounted within the housing assembly and comprising at least one timing slot, wherein reciprocation motion of the selector plate periodically couples at least one inlet port to the outlet port through the timing slot.

Abstract translation: 用于脉冲气体的气阀包括壳体组件，其具有安装在壳体组件内的至少一个入口端口，出口端口和选择器板，并且包括至少一个定时槽，其中选择器板的往复运动至少周期性地耦合 通过定时槽到出口的一个入口端口。

公开(公告)号：US06767176B2

公开(公告)日：2004-07-27

申请号：US09895441

申请日：2001-06-29

Applicant: Joseph Yudovsky ,  Salvador P. Umotoy

Inventor： Joseph Yudovsky ,  Salvador P. Umotoy

IPC: B66F1100

CPC classification number: H01L21/67748 ,  H01L21/68742 ,  Y10S414/135

Abstract: A set of lift pins defines a storage location for a substrate in a substrate processing chamber. Each lift pin has an actuating mechanism including a translating mechanism that translates vertical actuation into horizontal motion. The actuating mechanism may include a base, a mechanism adapted to raise and lower the base, and a lever pivotally mounted on the base. The lift pin may be fixedly mounted on the lever. A stop may be adjacent the base and adapted to engage the lever to pivot the lever as the base is lowered.

Abstract translation: 一组提升销限定了衬底处理室中的衬底的存储位置。 每个提升销具有致动机构，其包括将垂直致动转换成水平运动的平移机构。 致动机构可以包括基座，适于升高和降低基座的机构，以及枢转地安装在基座上的杠杆。 提升销可以固定地安装在杠杆上。 止挡件可以邻近基座并且适于接合杠杆以在基座降低时枢转杠杆。

公开(公告)号：US06521292B1

公开(公告)日：2003-02-18

申请号：US09632645

申请日：2000-08-04

Applicant: Joseph Yudovsky ,  Salvador Umotoy ,  Thomas Madar

Inventor： Joseph Yudovsky ,  Salvador Umotoy ,  Thomas Madar

IPC: C23C1652

CPC classification number: C23C16/45521 ,  C23C16/455 ,  C23C16/4585 ,  H01L21/68721 ,  H01L21/68735

Abstract: The present invention provides exemplary apparatus and methods for processing substrates and for ensuring purge gases reach the substrate edge, including edges of JMF type wafers, to help prevent unwanted deposition thereon. One embodiment provides an apparatus for processing substrates which includes a chamber and a substrate support (13) disposed in the chamber. An edge ring (15) is disposed on the substrate support. The edge ring has a lip portion (30) which at least partially overhangs an upper surface (36) of the substrate support to define a gap (29) between the lip portion and the upper surface. In this manner, the edge ring is designed to form a gap which properly directs purge gases to edges of the substrate, including JMF type substrates.

Abstract translation: 本发明提供了用于处理基板并用于确保吹扫气体到达基板边缘（包括JMF型晶片的边缘）的示例性装置和方法，以帮助防止其上不希望的沉积。 一个实施例提供了一种用于处理衬底的设备，其包括设置在腔室中的室和衬底支撑件（13）。 边缘环（15）设置在基板支撑件上。 边缘环具有唇部（30），其至少部分地悬垂在基底支撑件的上表面（36）上，以在唇部和上表面之间限定间隙（29）。 以这种方式，边缘环被设计成形成适当地将吹扫气体引导到衬底边缘的间隙，包括JMF型衬底。

公开(公告)号：US06374508B1

公开(公告)日：2002-04-23

申请号：US09507571

申请日：2000-02-18

Applicant: Joseph Yudovsky ,  Kenneth Tsai ,  Ilya Perlov ,  Eugene Gantvarg

Inventor： Joseph Yudovsky ,  Kenneth Tsai ,  Ilya Perlov ,  Eugene Gantvarg

IPC: B65G4907

CPC classification number: C23C16/4583 ,  H01L21/68 ,  Y10S269/903 ,  Y10S414/135

Abstract: A method and arrangement for lifting lowering and centering a substrate on a surface employs lift pins have conical tips. A capture range is provided by the conical tips to capture and center misaligned wafers. One or more of the pins are inclined in certain embodiments to enhance the alignment capability of the lift pins. The inclined lift pins, when retracting into a support member at an angle, move a supported substrate horizontally into proper alignment.

Abstract translation: 用于提升在基体表面上降低定心的方法和装置采用提升销具有圆锥形尖端。 捕获范围由锥形尖端提供，以捕获和对准未对准的晶片。 一些或多个销在某些实施例中倾斜以增强提升销的对准能力。 倾斜的提升销在以一定角度收回到支撑构件中时，将支撑的基板水平地移动到适当的对准位置。