Apparatus and method for reducing pollutants in effluent gas flow
utilizing an ionizing and resonance means
    71.
    发明授权
    Apparatus and method for reducing pollutants in effluent gas flow utilizing an ionizing and resonance means 失效
    利用电离和共振手段减少废气流中污染物的装置和方法

    公开(公告)号:US5366701A

    公开(公告)日:1994-11-22

    申请号:US786261

    申请日:1991-11-01

    摘要: The present invention relates generally to apparatus and methods used in chemically reducing pollutants in effluent gas flow. More particularly, the present invention relates to ionization of effluent gas from an effluent gas source by passage of the effluent gas through a resonance field, and potentialization and purification of the effluent gas by passage of the effluent gas through a continuous electrical arc. Preferably, the resonance field and the continuous electrical arc are both generated by an alternating current. The result of using the apparatus and method of the present invention is a release of stabilized air particles without a high consumption of energy, and without producing waste products requiring subsequent collection.

    摘要翻译: 本发明一般涉及用于化学还原废气流中的污染物的设备和方法。 更具体地说,本发明涉及通过使流出气体通过共振场,从流出气体源排出的废气,以及通过流出气体通过连续电弧而使废气气化和净化。 优选地,谐振场和连续电弧都由交流电产生。 使用本发明的装置和方法的结果是在没有高能量消耗的情况下释放稳定的空气颗粒,并且不产生需要后续收集的废物。

    Bulk plasma generation
    72.
    发明授权
    Bulk plasma generation 失效
    散装等离子体产生

    公开(公告)号:US5051659A

    公开(公告)日:1991-09-24

    申请号:US647903

    申请日:1991-01-30

    IPC分类号: H05H1/02 H05H1/24

    CPC分类号: H05H1/02 H05H1/24

    摘要: Annular arrangements of thermionic filaments adjacent opposite axial ends a chamber within which argon gas at low presure is confined, generate steady state plasma with uniformity by low energy emission of gas ionizing electrons from the filaments. The ionizing electrons and plasma generated are axially confined between grids at the axial ends of the chamber and radially confined by a low intensity magnetic field generated by an external magnetic coil.

    摘要翻译: 邻近腔室的相对轴向端部的环状排列,其中低压下的氩气被限制,通过从灯丝离子化电子的低能量发射产生均匀的稳态等离子体。 所产生的电离电子和等离子体被轴向地限制在室的轴向端部的栅格之间,并由外部电磁线圈产生的低强度磁场径向限制。

    Gas vortex with MHD-drive
    73.
    发明授权
    Gas vortex with MHD-drive 失效
    气体涡旋与MHD驱动

    公开(公告)号:US4156832A

    公开(公告)日:1979-05-29

    申请号:US772239

    申请日:1977-02-25

    摘要: Apparatus wherein a partially ionized mass of gas is enclosed by a rotationally symmetric, axially elongate housing and set in rotation by a force which arises as a result of a substantially axial magnetic field constant in time and an electric current having a non-zero vector component in the radial direction, whereby positively charged ions originating from a centralized axial gas discharge arc region and moving at a high speed of rotation set the whole mass of gas in rotation by pulse transfer, said housing being lined on the inside with annular wall electrodes segmented in non-azimuthal direction and arranged against each other; the inside wall of said housing at an extremity thereof curving toward the center axis and approaching a centrally mounted electrode of opposite polarity, the wall electrodes being connected with variable resistors which are adjusted so that the voltage applied to the wall electrodes increases blockwise from a minimum value at a chosen point on the axis of the housing to the grid-or anode voltage of the said axial gas discharge arc region, whereby the wall electrode which is closest to the central electrode exhibits with respect thereto the smallest potential difference of all the wall electrodes, in an extreme case the potential difference being zero.

    摘要翻译: 装置,其中部分电离质量的气体由旋转对称的轴向细长壳体包围,并且由于在时间上基本上轴向磁场恒定而产生的力而旋转,并且具有非零矢量分量 在径向上,由于来自集中式轴向气体放电弧区域的带正电荷的离子并以高转速运动,通过脉冲传递将整个质量的气体旋转旋转,所述壳体内衬有环形壁电极分段 在非方位角方向上并排配置; 所述壳体的内壁在其末端向中心轴线弯曲并且接近相反极性的中心安装的电极,所述壁电极与可调电阻器连接,所述可变电阻器被调节为使得施加到所述壁电极的电压从最小 在壳体的轴上的选定点处与所述轴向气体放电弧区域的栅极或阳极电压的值,由此最靠近中心电极的壁电极相对于所有壁的最小电位差 电极,在极端情况下,电位差为零。

    Ion plasma electron gun
    74.
    发明授权
    Ion plasma electron gun 失效
    离子等离子体电子枪

    公开(公告)号:US3970892A

    公开(公告)日:1976-07-20

    申请号:US578551

    申请日:1975-05-19

    CPC分类号: H05H1/24 H01J3/021 H01J33/00

    摘要: In the disclosed electron gun positive ions generated by a hollow cathode plasma discharge in a first chamber are accelerated through control and shield grids into a second chamber containing a high voltage cold cathode. These positive ions bombard a surface of the cathode causing the cathode to emit secondary electrons which form an electron beam having a distribution adjacent to the cathode emissive surface substantially the same as the distribution of the ion beam impinging upon the cathode. After passing through the grids and the plasma discharge chamber, the electron beam exits from the electron gun via a foil window. Control of the generated electron beam is achieved by applying a relatively low control voltage between the control grid and the electron gun housing (which resides at ground potential) to control the density of the positive ions bombarding the cathode.

    摘要翻译: 在所公开的电子枪中,通过第一室中的空心阴极等离子体放电产生的正离子通过控制和屏蔽栅加速到包含高压冷阴极的第二室中。 这些正离子轰击阴极的表面,导致阴极发射二次电子,其形成具有与阴极发射表面相邻的分布的电子束,其基本上与入射到阴极上的离子束的分布相同。 通过栅格和等离子体放电室后,电子束通过箔窗从电子枪射出。 通过在控制栅极和电子枪壳体之间施加相对较低的控制电压(位于地电位)来控制所产生的电子束的控制,以控制轰击阴极的正离子的密度。

    Handheld plasma device process
    75.
    发明授权

    公开(公告)号:US12120809B1

    公开(公告)日:2024-10-15

    申请号:US17066381

    申请日:2020-10-08

    IPC分类号: H05H1/46 B23K10/00 H05H1/24

    摘要: A method for using a handheld plasma tool for controlled application of low temperature atmospheric pressure plasma to material surfaces, e.g. to enhance bonding and or cleaning is disclosed. The handheld plasma tool can include a hand grip, on/off trigger, display, indicator lights, indexing pin, marking device, cable connections for gas supply and electrical power, and a plasma head for generating at least one reactive gas species at a low temperature. The handheld plasma tool can employ a rotatable clamp for treating backside surfaces. The handheld plasma tool can include motorized wheels to scan over a large area at a controlled speed. Other optional nozzles can also be employed for specialized applications.

    Plasma treatment device
    79.
    发明授权

    公开(公告)号:US11684406B2

    公开(公告)日:2023-06-27

    申请号:US16703174

    申请日:2019-12-04

    发明人: Matthias Zenker

    摘要: The plasma sensor monitors parameters characterizing the condition of the plasma during the treatment phase and/or the change thereof in order to recognize a prefiguring or already occurred interruption of the plasma in this manner and to avoid this interruption and, in the ideal case, avoid this by already changing the voltage form previously. The mentioned mechanisms can be used by the control device (22) also during a pulse packet. The length of each pulse packet is adapted at each change of the voltage form according to their characteristics in order to guarantee a constant average power.