Method For Forming Silicon Film, Method For Forming PN Junction And PN Junction Formed Using The Same
    43.
    发明申请
    Method For Forming Silicon Film, Method For Forming PN Junction And PN Junction Formed Using The Same 审中-公开
    用于形成硅膜的方法,使用其形成PN结和PN结的方法

    公开(公告)号:US20130043567A1

    公开(公告)日:2013-02-21

    申请号:US13658132

    申请日:2012-10-23

    Abstract: A method for forming a silicon film may be performed using a microheater including a substrate and a metal pattern spaced apart from the substrate. The silicon film may be formed on the metal pattern by applying a voltage to the metal pattern of the microheater to heat the metal pattern and by exposing the microheater to a source gas containing silicon. The silicon film may be made of polycrystalline silicon. A method for forming a pn junction may be performed using a microheater including a substrate, a conductive layer on the substrate, and a metal pattern spaced apart from the substrate. The pn junction may be formed between the metal pattern and the conductive layer by applying a voltage to the metal pattern of the microheater to heat the metal pattern. The pn junction may be made of polycrystalline silicon.

    Abstract translation: 可以使用包括基板的微加热器和与基板间隔开的金属图案来进行形成硅膜的方法。 可以通过向微加热器的金属图案施加电压来加热金属图案并且通过将微加热器暴露于含硅的源气体来形成硅膜。 硅膜可以由多晶硅制成。 用于形成pn结的方法可以使用包括衬底的微加热器,衬底上的导电层和与衬底间隔开的金属图案来执行。 通过向微加热器的金属图案施加电压以加热金属图案,可以在金属图案和导电层之间形成pn结。 pn结可以由多晶硅制成。

    NITRIDE-BASED SEMICONDUCTOR LIGHT-EMITTING DEVICE

    公开(公告)号:US20240234629A1

    公开(公告)日:2024-07-11

    申请号:US18534264

    申请日:2023-12-08

    CPC classification number: H01L33/12 H01L33/06 H01L33/20 H01L33/32

    Abstract: A nitride-based semiconductor light-emitting device, including a first semiconductor layer, wherein the first semiconductor layer is nitride-based and has a first conductivity type; a light-emitting layer provided on the first semiconductor layer, wherein the light-emitting layer may include a nitride-based semiconductor including Indium (In); a second semiconductor layer provided on the light-emitting layer, wherein the second semiconductor layer is nitride-based and has a second conductivity type; and a strain relaxation layer provided between the first semiconductor layer and the light-emitting layer, and including an AlGaN layer having a protrusion whose horizontal cross-section area decreases as the protrusion extends in a vertical direction from the second semiconductor layer to the first semiconductor layer.

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