公开(公告)号：US20160381776A1

公开(公告)日：2016-12-29

申请号：US15187590

申请日：2016-06-20

Applicant: KLA-Tencor Corporation

Inventor： Matthew Derstine ,  Ilya Bezel ,  Anatoly Shchemelinin ,  Eugene Shifrin

IPC: H05H1/24

CPC classification number: H05G2/008

Abstract: A system for generating laser sustained broadband light includes a pump source configured to generate a pumping beam, a gas containment structure for containing a gas and a multi-pass optical assembly. The multi-pass optical assembly includes one or more optical elements configured to perform a plurality of passes of the pumping beam through a portion of the gas to sustain a broadband-light-emitting plasma. The one or more optical elements are arranged to collect an unabsorbed portion of the pumping beam transmitted through the plasma and direct the collected unabsorbed portion of the pumping beam back into the portion of the gas.

Abstract translation: 用于产生激光持续宽带光的系统包括被配置为产生泵浦光束的泵浦源，用于容纳气体的气体容纳结构和多遍光学组件。 多遍光学组件包括一个或多个光学元件，其被配置为执行泵浦光束通过气体的一部分的多次通过以维持宽带发光等离子体。 一个或多个光学元件被布置成收集透射通过等离子体的泵送光束的未吸收部分，并将所收集的未吸收的泵送光束部分引导回到气体的该部分中。

公开(公告)号：US20150324964A1

公开(公告)日：2015-11-12

申请号：US14707573

申请日：2015-05-08

Applicant: KLA-Tencor Corporation

Inventor： Eugene Shifrin ,  Chetana Bhaskar ,  Ashok V. Kulkarni ,  Chien-Huei (Adam) Chen ,  Kris Bhaskar ,  Brian Duffy

IPC: G06T7/00

CPC classification number: G06T7/001 ,  G06T2200/28 ,  G06T2207/30148

Abstract: Systems and methods for generating information for use in a wafer inspection process are provided. One method includes acquiring output of an inspection system for die(s) located on wafer(s), combining the output for the die(s) based on within die positions of the output, determining, on a within die position basis, a statistical property of variation in values of characteristic(s) of the combined output, and assigning the within die positions to different groups based on the statistical properties determined for the within die positions. The method also includes storing information for the within die positions and the different groups to which the within die positions are assigned in a storage medium that is accessible to the inspection system for performing the wafer inspection process, which includes applying defect detection parameter(s) to additional output of the inspection system generated for a wafer based on the information thereby detecting defects on the wafer.

Abstract translation: 提供了用于生成用于晶片检查过程的信息的系统和方法。 一种方法包括获取位于晶片上的模具的检查系统的输出，基于输出的管芯位置组合用于管芯的输出，在内部管芯位置的基础上确定统计学 基于针对模具位置确定的统计特性，将组合输出的特性值的变化的属性以及将模具位置分配给不同的组。 该方法还包括在用于执行晶片检查过程的检查系统可访问的存储介质中存储用于管芯位置和内部管芯位置分配的不同组的信息，其包括应用缺陷检测参数， 基于该信息为晶片生成的检查系统的附加输出，从而检测晶片上的缺陷。

公开(公告)号：US20150049778A1

公开(公告)日：2015-02-19

申请号：US14459095

申请日：2014-08-13

Applicant: KLA-Tencor Corporation

Inventor： Anatoly Shchemelinin ,  Ilya Bezel ,  Matthew Panzer ,  Eugene Shifrin

IPC: H01S3/097

CPC classification number: G02B27/1006

Abstract: A system for separating plasma pumping light and collected broadband light includes a pump source configured to generate pumping illumination including at least a first wavelength, a gas containment element for containing a volume of gas, a collector configured to focus the pumping illumination from the pumping source into the volume of gas to generate a plasma within the volume of gas, wherein the plasma emits broadband radiation including at least a second wavelength and an illumination separation prism element positioned between a reflective surface of the collector and the pump source and arranged to spatially separate the pumping illumination including the first wavelength and the emitted broadband radiation including at least a second wavelength emitted from the plasma.

Abstract translation: 用于分离等离子体泵浦光和收集的宽带光的系统包括被配置为产生包括至少第一波长的泵浦照明的泵浦源，用于容纳一定体积气体的气体容纳元件，被配置为将来自泵浦源的泵浦照明 进入气体体积以在气体体积内产生等离子体，其中等离子体发射包括至少第二波长的宽带辐射和位于收集器的反射表面和泵浦源之间的照明分离棱镜元件，并布置成在空间上分离 所述泵浦照明包括第一波长和发射的宽带辐射，其包括从等离子体发射的至少第二波长。