Display substrate, display apparatus, method of fabricating display substrate

    公开(公告)号:US11088226B2

    公开(公告)日:2021-08-10

    申请号:US16066177

    申请日:2017-11-27

    Abstract: The present application discloses a display substrate having a base substrate and a pixel definition layer for defining a plurality of subpixel regions on the base substrate. The pixel definition layer has a first side and a second side opposite to each other, the second side being on a side of the first side distal to the base substrate. The pixel definition layer has a first cross-section along a plane substantially parallel to the base substrate, the first cross-section being between the first side and the second side. An orthographic projection of the first cross-section on the base substrate substantially covers orthographic projections of the first side and the second side on the base substrate.

    ARRAY SUBSTRATE AND METHOD OF MANUFACTURING THE SAME, DISPLAY PANEL AND DISPLAY DEVICE

    公开(公告)号:US20210223638A1

    公开(公告)日:2021-07-22

    申请号:US16098811

    申请日:2018-01-17

    Abstract: An array substrate and a manufacturing method thereof, a display panel and a display device are provided. The array substrate includes a plurality of pixel units, at least some of which respectively having a reflective region provided with a reflective layer in a concave-convex shape, wherein a first insulating layer is disposed on a light reflecting side of the reflective layer, and a surface of the first insulating layer adjacent to the reflective layer is in a concave-convex shape conforming to the concave-convex shape of the reflective layer, and a surface of the first insulating layer away from the reflective layer is a planar surface; the at least some of the pixel units further respectively comprise a first electrode and a second electrode which are oppositely disposed in different layers and are spaced apart from each other, and the first electrode is disposed on a side of the first insulating layer away from the reflective layer.

    Method of producing array substrate, array substrate, and display apparatus

    公开(公告)号:US11037959B2

    公开(公告)日:2021-06-15

    申请号:US16074842

    申请日:2017-10-31

    Inventor: Kui Gong

    Abstract: Provided is a method of producing an array substrate. This method of producing an array substrate has following steps: forming a passivation layer on a base substrate; forming a photoresist layer on the passivation layer, and performing a patterning process on the photoresist layer to form a photoresist mask having an opening pattern; introducing an etching resistant layer precursor material to the passivation layer by ion injection through the opening pattern; generating plasma by using an etching gas, etching the passivation layer by using the plasma through the opening pattern to form a via hole penetrating the passivation layer; and peeling the photoresist mask. Also provided are an array substrate and a display apparatus.

    Array substrate and manufacturing method therefor, display panel, display device

    公开(公告)号:US10811446B2

    公开(公告)日:2020-10-20

    申请号:US16317644

    申请日:2018-05-10

    Abstract: Disclosed are an array substrate and a manufacturing method therefor, a display panel and a display device, which are used for enabling a viewer to see a uniform reflective effect at various viewing angles, improving the display effect. The array substrate manufacturing method comprises: sequentially forming, on a passivation layer, a reflective layer and a transparent conductive layer, the reflective layer being electrically connected, by means of a via hole penetrating through the passivation layer, to a source electrode or a drain electrode of the thin film transistor, and the transparent conductive layer comprising several metal ions; performing reduction process on the transparent conductive layer, so that the metal ions are reduced, and a metal particle layer is formed; and performing patterning process on the transparent conductive layer and the reflective layer on which the steps above are completed, so as to form a pixel electrode.

    Manufacturing method of array substrate, array substrate and display apparatus

    公开(公告)号:US10551695B2

    公开(公告)日:2020-02-04

    申请号:US15866020

    申请日:2018-01-09

    Abstract: The embodiments of the present disclosure provide a method of manufacturing an array substrate, an array substrate and a display apparatus. A method of manufacturing an array substrate, comprising: providing a substrate; forming, on the substrate, a source electrode, a drain electrode and a passivation layer, wherein a via reaching the source electrode or the drain electrode is formed in the passivation layer by a patterning process; forming a carbon film layer on the passivation layer; forming a photoresist layer on the carbon film layer; patterning the photoresist layer to form a first region and a second region, wherein the first region exposes a portion of the carbon film layer; using the photoresist layer as a mask, modifying the portion of the carbon film layer exposed from the first region to change the electrical conductivity of the portion of the carbon film layer; and removing the photoresist layer.

    Display panel, production method of the same, and display apparatus

    公开(公告)号:US10325935B2

    公开(公告)日:2019-06-18

    申请号:US16034429

    申请日:2018-07-13

    Inventor: Dezhi Xu Kui Gong

    Abstract: This disclosure discloses a display panel, a production method thereof, and a display apparatus. This method comprises: forming a pattern of a first metal layer on a base substrate and a pattern of a metal oxide conductive layer being electrically connected to the first metal layer by at least one through hole at a side of the first metal layer away from the base substrate; forming a reductive metal compound layer on a surface of the first metal layer at a side away from the base substrate before forming the pattern of the metal oxide conductive layer; treating the reductive metal compound layer and the metal oxide conductive layer after forming the pattern of the metal oxide conductive layer so that the reductive metal compound layer is oxidized into a second metal layer and metal particles are produced at the surface of the metal oxide conductive layer.

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