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公开(公告)号:US11088226B2
公开(公告)日:2021-08-10
申请号:US16066177
申请日:2017-11-27
Inventor: Kui Gong , Xianxue Duan , Hui An
Abstract: The present application discloses a display substrate having a base substrate and a pixel definition layer for defining a plurality of subpixel regions on the base substrate. The pixel definition layer has a first side and a second side opposite to each other, the second side being on a side of the first side distal to the base substrate. The pixel definition layer has a first cross-section along a plane substantially parallel to the base substrate, the first cross-section being between the first side and the second side. An orthographic projection of the first cross-section on the base substrate substantially covers orthographic projections of the first side and the second side on the base substrate.
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公开(公告)号:US20210223638A1
公开(公告)日:2021-07-22
申请号:US16098811
申请日:2018-01-17
Inventor: Kui Gong , Xianxue Duan , Dezhi Xu
IPC: G02F1/1343 , G02F1/1335
Abstract: An array substrate and a manufacturing method thereof, a display panel and a display device are provided. The array substrate includes a plurality of pixel units, at least some of which respectively having a reflective region provided with a reflective layer in a concave-convex shape, wherein a first insulating layer is disposed on a light reflecting side of the reflective layer, and a surface of the first insulating layer adjacent to the reflective layer is in a concave-convex shape conforming to the concave-convex shape of the reflective layer, and a surface of the first insulating layer away from the reflective layer is a planar surface; the at least some of the pixel units further respectively comprise a first electrode and a second electrode which are oppositely disposed in different layers and are spaced apart from each other, and the first electrode is disposed on a side of the first insulating layer away from the reflective layer.
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公开(公告)号:US11037959B2
公开(公告)日:2021-06-15
申请号:US16074842
申请日:2017-10-31
Inventor: Kui Gong
IPC: H01L27/12 , H01L21/02 , H01L21/311 , H01L21/3115 , H01L21/768
Abstract: Provided is a method of producing an array substrate. This method of producing an array substrate has following steps: forming a passivation layer on a base substrate; forming a photoresist layer on the passivation layer, and performing a patterning process on the photoresist layer to form a photoresist mask having an opening pattern; introducing an etching resistant layer precursor material to the passivation layer by ion injection through the opening pattern; generating plasma by using an etching gas, etching the passivation layer by using the plasma through the opening pattern to form a via hole penetrating the passivation layer; and peeling the photoresist mask. Also provided are an array substrate and a display apparatus.
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公开(公告)号:US10811446B2
公开(公告)日:2020-10-20
申请号:US16317644
申请日:2018-05-10
Inventor: Kui Gong , Xianxue Duan , Myoung Kee Baek
IPC: H01L27/12 , G02F1/1362
Abstract: Disclosed are an array substrate and a manufacturing method therefor, a display panel and a display device, which are used for enabling a viewer to see a uniform reflective effect at various viewing angles, improving the display effect. The array substrate manufacturing method comprises: sequentially forming, on a passivation layer, a reflective layer and a transparent conductive layer, the reflective layer being electrically connected, by means of a via hole penetrating through the passivation layer, to a source electrode or a drain electrode of the thin film transistor, and the transparent conductive layer comprising several metal ions; performing reduction process on the transparent conductive layer, so that the metal ions are reduced, and a metal particle layer is formed; and performing patterning process on the transparent conductive layer and the reflective layer on which the steps above are completed, so as to form a pixel electrode.
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公开(公告)号:US10551695B2
公开(公告)日:2020-02-04
申请号:US15866020
申请日:2018-01-09
Inventor: Kui Gong , Xianxue Duan
IPC: G02F1/1343 , G02F1/1362 , G02F1/1333 , H01L29/786 , G02F1/1368
Abstract: The embodiments of the present disclosure provide a method of manufacturing an array substrate, an array substrate and a display apparatus. A method of manufacturing an array substrate, comprising: providing a substrate; forming, on the substrate, a source electrode, a drain electrode and a passivation layer, wherein a via reaching the source electrode or the drain electrode is formed in the passivation layer by a patterning process; forming a carbon film layer on the passivation layer; forming a photoresist layer on the carbon film layer; patterning the photoresist layer to form a first region and a second region, wherein the first region exposes a portion of the carbon film layer; using the photoresist layer as a mask, modifying the portion of the carbon film layer exposed from the first region to change the electrical conductivity of the portion of the carbon film layer; and removing the photoresist layer.
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公开(公告)号:US10325935B2
公开(公告)日:2019-06-18
申请号:US16034429
申请日:2018-07-13
Abstract: This disclosure discloses a display panel, a production method thereof, and a display apparatus. This method comprises: forming a pattern of a first metal layer on a base substrate and a pattern of a metal oxide conductive layer being electrically connected to the first metal layer by at least one through hole at a side of the first metal layer away from the base substrate; forming a reductive metal compound layer on a surface of the first metal layer at a side away from the base substrate before forming the pattern of the metal oxide conductive layer; treating the reductive metal compound layer and the metal oxide conductive layer after forming the pattern of the metal oxide conductive layer so that the reductive metal compound layer is oxidized into a second metal layer and metal particles are produced at the surface of the metal oxide conductive layer.
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公开(公告)号:US20190097166A1
公开(公告)日:2019-03-28
申请号:US16053424
申请日:2018-08-02
Inventor: Kui Gong , Xianxue Duan , Jilong Li , Haifeng Cui
CPC classification number: H01L51/5209 , H01L51/0022 , H01L51/5218 , H01L51/5271 , H01L51/56 , H01L2251/301 , H01L2251/305 , H01L2251/558
Abstract: The present disclosure provides an organic light-emitting diode and a method for manufacturing the same, a display substrate and a method for manufacturing the same, and a display device. The organic light-emitting diode comprises a first electrode, a second electrode, and an organic light-emitting layer arranged between the first electrode and the second electrode, in which the second electrode is arranged close to the light-emitting side of the organic light-emitting diode, the first electrode includes a reflective conductive layer, and a surface of the reflective conductive layer close to the second electrode has an uneven structure.
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公开(公告)号:US20190074305A1
公开(公告)日:2019-03-07
申请号:US15762292
申请日:2017-09-08
Inventor: Kui Gong , Xianxue Duan
IPC: H01L27/12 , H01L21/768 , H01L21/321 , H01L21/027 , H01L29/16 , H01L29/786 , H01L29/66
Abstract: A manufacturing method of an array substrate, an array substrate and a display apparatus are provided. The manufacturing method includes: providing a base substrate; sequentially forming an active layer and a first insulating layer that covers the active layer on the base substrate; performing one patterning process on the first insulating layer, so as to form a first through hole and a second through hole that expose the active layer in the first insulating layer, and form a first recess at a surface of the first insulating layer; forming a conductive layer on the patterned first insulating layer, with the conductive layer being filled in the first through hole, the second through hole and the first recess; conducting a grinding process to form a source electrode, a drain electrode and a pixel electrode are formed respectively.
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49.
公开(公告)号:US10199236B2
公开(公告)日:2019-02-05
申请号:US15843796
申请日:2017-12-15
Inventor: Dezhi Xu , Xianxue Duan , Kui Gong
IPC: H01L21/467 , H01L29/66 , H01L21/308 , H01L29/786 , H01L27/32 , H01L27/12
Abstract: A thin film transistor, a manufacturing method thereof, and a method for manufacturing an array substrate are provided. The method for manufacturing the thin film transistor includes: forming an active layer film on a base; and forming a source electrode and a drain electrode of the thin film transistor using a conductive photoresist.
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