Abstract:
An electrowetting display device comprises a first support plate comprising a first electrode and a second support plate. A seal connects the first support plate to the second support plate. A first fluid and a second fluid, immiscible with the first fluid, are located between the first and second support plates. A second electrode is in electrical contact with the second fluid. An electrical connector connects the first electrode to the second electrode. A barrier structure at least partly surrounds the electrical connector. The electrical connector and the barrier structure are separated from the first fluid and the second fluid by the seal.
Abstract:
A display device includes a first support plate and an opposing second support plate. A pixel region is positioned between the first support plate and the second support plate. A thin film transistor (TFT) structure is formed on the first support plate and associated with the pixel region. The TFT structure includes a source and drain electrode layer. A reflective layer is formed or disposed over the source and drain electrode layer. The reflective layer includes a pixel electrode within the pixel region. A via is between the source and drain electrode layer and the reflective layer to electrically couple the pixel electrode to the source and drain electrode layer. An organic layer is formed or disposed over the via. The organic layer includes an elevated surface over the via.
Abstract:
A display device includes a first support plate and a pixel region over the first support plate. A thin film transistor (TFT) structure is disposed over the first support plate and associated with the pixel region. The TFT structure includes a first metal layer over the first support plate. The first metal layer includes a gate. A silicon layer is disposed over the gate. A second metal layer is disposed over the silicon layer. The second metal layer includes a source and a drain covering a first portion of the silicon layer. An amorphous silicon layer is disposed over at least a portion of the second metal layer and a second portion of the silicon layer.
Abstract:
The subject matter disclosed herein relates to an electrowetting display comprising: a transparent substrate including glass spacers surrounded by recessed regions corresponding to pixel regions, a layer of transparent conductive material on the glass spacers, color filter material in the recessed regions, and a transparent support plate covering the recessed regions and the glass spacers, wherein the transparent support plate includes an electrowetting oil.
Abstract:
A method for fabricating an electrowetting display may include disposing an etching barrier on a substrate to delineate a first region and a second region of the substrate, the etching barrier covering the second region of the substrate; etching the first region of the substrate to form an etched first region of the substrate, wherein at least a portion of the second region of the substrate is a protrusion formed in response to the etching of the first region; removing the etching barrier; disposing a black matrix on the second region of the substrate; and forming a spacer over the black matrix disposed on the second region of the substrate.
Abstract:
The subject matter disclosed herein relates to an electrowetting display comprising: a transparent substrate including glass spacers surrounded by recessed regions corresponding to pixel regions, a layer of transparent conductive material on the glass spacers, color filter material in the recessed regions, and a transparent support plate covering the recessed regions and the glass spacers, wherein the transparent support plate includes an electrowetting oil.