公开(公告)号：US11011343B2

公开(公告)日：2021-05-18

申请号：US16542731

申请日：2019-08-16

Applicant: APPLIED Materials, Inc.

Inventor： Alexandre Likhanskii ,  Shengwu Chang ,  Frank Sinclair ,  Antonella Cucchetti ,  Eric D Hermanson ,  Christopher Campbell

IPC: H01J37/12 ,  H01J37/317 ,  H01J37/05

Abstract: Provided herein are approaches for increasing operational range of an electrostatic lens. An electrostatic lens of an ion implantation system may receive an ion beam from an ion source, the electrostatic lens including a first plurality of conductive beam optics disposed along one side of an ion beam line and a second plurality of conductive beam optics disposed along a second side of the ion beam line. The ion implantation system may further include a power supply in communication with the electrostatic lens, the power supply operable to supply a voltage and a current to at least one of the first and second plurality of conductive beam optics, wherein the voltage and the current deflects the ion beam at a beam deflection angle, and wherein the ion beam is accelerated and then decelerated within the electrostatic lens.

公开(公告)号：US20210066023A1

公开(公告)日：2021-03-04

申请号：US16551972

申请日：2019-08-27

Applicant: Applied Materials, Inc.

Inventor： Alexandre Likhanskii

IPC: H01J37/16 ,  H01J37/305 ,  H01J37/20

Abstract: An apparatus for directional processing is disclosed. The apparatus includes a workpiece support and an ion source, having a plurality of walls. An extraction aperture is disposed on at least one of the plurality of walls. In certain embodiments, the plurality of walls defines a hollow region. The hollow region is located above the portion of the workpiece that is being processed, allowing the etching byproducts can be evacuated without depositing on the ion source. The shape of the hollow region may be modified to further reduce the amount of deposition on the hollow ion source. Additionally, a pump may be disposed within or above the hollow region to facilitate the removal of the etching byproducts. In other embodiments, the extraction aperture of the ion source may be disposed at a corner of the plasma chamber.

公开(公告)号：US10886098B2

公开(公告)日：2021-01-05

申请号：US16197251

申请日：2018-11-20

Applicant: APPLIED Materials, Inc.

Inventor： Alexandre Likhanskii ,  Frank Sinclair ,  Shengwu Chang ,  Eric D. Hermanson ,  Nevin H. Clay

IPC: H01J37/05 ,  H01J37/12 ,  H01J37/08 ,  H01J37/147 ,  H01J37/317

Abstract: An apparatus may include a main chamber, an entrance tunnel, having an entrance axis extending into the main chamber, and an exit tunnel, connected to the main chamber and defining an exit axis, wherein the entrance tunnel and the exit tunnel define a beam bend of less than 25 degrees therebetween. The apparatus may include an electrode assembly, disposed in the main chamber, on a lower side of the exit tunnel; and a catch assembly, disposed within the main chamber, in a line of sight from an exterior aperture of the exit tunnel.

公开(公告)号：US10790116B2

公开(公告)日：2020-09-29

申请号：US16197238

申请日：2018-11-20

Applicant: APPLIED Materials, Inc.

Inventor： Alexandre Likhanskii ,  Frank Sinclair ,  Shengwu Chang

IPC: H01J37/317 ,  H01J37/12 ,  H01J37/08

Abstract: An apparatus may include a main chamber, the main chamber comprising a plurality of electrodes; an entrance tunnel, the entrance tunnel having an entrance axis extending into the main chamber along a first direction; and an exit tunnel, connected to the main chamber and defining an exit axis, wherein the entrance axis and the exit axis define a beam bend of at least 30 degrees therebetween.

公开(公告)号：US10665415B1

公开(公告)日：2020-05-26

申请号：US16182220

申请日：2018-11-06

Applicant: APPLIED Materials, Inc.

Inventor： Alexandre Likhanskii ,  Frank Sinclair ,  Shengwu Chang

IPC: H01J37/05 ,  H01J37/317

Abstract: An apparatus and method are provided. In one embodiment. an apparatus may include a main chamber, where the main chamber includes an electrode assembly. The electrode assembly may include a plurality of electrodes arranged between a chamber entrance and a chamber exit of the main chamber. The apparatus may include a beam tunnel, connected to the chamber entrance, configured to conduct an ion beam to the main chamber; and an electrostatic tuner, disposed in the beam tunnel, the electrostatic tuner comprising at least one tuner electrode, independently coupled to a tuner voltage assembly.

公开(公告)号：US20200144017A1

公开(公告)日：2020-05-07

申请号：US16182220

申请日：2018-11-06

Applicant: APPLIED Materials, Inc.

Inventor： Alexandre Likhanskii ,  Frank Sinclair ,  Shengwu Chang

IPC: H01J37/05 ,  H01J37/317

Abstract: An apparatus and method are provided. In one embodiment. an apparatus may include a main chamber, where the main chamber includes an electrode assembly. The electrode assembly may include a plurality of electrodes arranged between a chamber entrance and a chamber exit of the main chamber. The apparatus may include a beam tunnel, connected to the chamber entrance, configured to conduct an ion beam to the main chamber; and an electrostatic tuner, disposed in the beam tunnel, the electrostatic tuner comprising at least one tuner electrode, independently coupled to a tuner voltage assembly.