公开(公告)号：US11447674B2

公开(公告)日：2022-09-20

申请号：US16614151

申请日：2018-05-17

申请人： MEXICHEM FLUOR S.A. DE C.V.

发明人： Robert Low

IPC分类号： C09K5/04 ,  A62D1/00 ,  B01D11/02 ,  B01D11/04 ,  C11D7/50 ,  G06Q50/26

摘要： A composition comprising: (i) 1,1-difluoroethene (vinylidene fluoride, R-1132a); (ii) carbon dioxide (CO2, R-744); (iii) pentafluoroethane (R-125); and (iv) one or more of trifluoromethane (R-23) and hexafluoroethane (R-116).

公开(公告)号：US11440862B2

公开(公告)日：2022-09-13

申请号：US17020652

申请日：2020-09-14

申请人： AGC Inc.

发明人： Masahiko Nakamura ,  Hiroaki Mitsuoka ,  Mari Ichinokawa ,  Atsushi Fujimori ,  Hidekazu Okamoto

IPC分类号： C07C21/18 ,  C09D201/00 ,  C09K5/04 ,  C11D7/50 ,  C11D11/00 ,  C08B3/08 ,  C09D7/20 ,  C07C21/22 ,  C09K5/10 ,  C11D3/43 ,  C07C19/10 ,  C08K5/02

摘要： There are provided a solvent composition which is excellent in solubility of various organic substances and excellent in detergency and a drying property, and has no adverse effect on a global environment and is excellent in stability; a cleaning method using the solvent composition; a method of forming a coating film; a heat transfer fluid including the solvent composition; and a heat cycle system using the heat transfer fluid. A solvent composition including 1-chloro-2,3,3-trifluoro-1-propene and 1-chloro-3,3-difluoro-1-propyne, a cleaning method of bringing the solvent composition and an article into contact with each other, a method of dissolving a nonvolatile organic compound in the solvent composition to produce a coating film-forming composition and evaporating the solvent composition after applying the coating film-forming composition on an article to be coated, to form a coating film, a heat transfer fluid including the solvent composition, and a heat cycle system using the heat transfer fluid.

公开(公告)号：US20220259525A1

公开(公告)日：2022-08-18

申请号：US17533427

申请日：2021-11-23

申请人： SAFECHEM Europe GmbH

发明人： Christian Rösener

IPC分类号： C11D11/04 ,  C11D7/26 ,  C11D7/50 ,  B01J13/08 ,  C11D11/00

摘要： A process for processing an alcohol-containing solvent is described. The process according to the invention is used in particular for the treatment of alcohol-containing solvents which are used, for example, for cleaning metal parts. Further subject matter of the present invention are compositions which are suitable for the aforementioned intended use, as well as the use of certain compositions for the purification of alcohol-containing solvents.

公开(公告)号：US20220243150A1

公开(公告)日：2022-08-04

申请号：US17596199

申请日：2020-06-15

申请人： Versum Materials US, LLC

发明人： LILI WANG ,  AIPING WU ,  LAISHENG SUN ,  YI-CHIA LEE ,  YUANMEI CAO

IPC分类号： C11D11/00 ,  G03F7/42 ,  H01L21/02 ,  C11D7/32 ,  C11D7/26 ,  C11D7/50

摘要： Compositions and methods useful for removing residue and photoresist from a semiconductor substrate comprising: from about 5 to about 60% by wt. of water; from about 10 to about 90% by wt. of a water-miscible organic solvent; from about 5 to about 90% by wt. of at least one alkanolamine; from about 0.05 to about 20% by wt. of at least one polyfunctional organic acid; and from about 0.1 to about 10% by wt. of at least one phenol-type corrosion inhibitor, wherein the composition is substantially free of hydroxylamine.

公开(公告)号：US11384319B2

公开(公告)日：2022-07-12

申请号：US16634642

申请日：2018-08-03

申请人： THREEBOND CO., LTD.

发明人： Hiroaki Ito

IPC分类号： C09K3/30 ,  C11D7/50 ,  C11D11/00 ,  C11D17/00 ,  C23G5/028

摘要： A cleaner composition, a cleaning aerosol, and a method for cleaning a contaminated part, in which the contaminated part, particularly a part around an automobile brake or the like, can be cleaned easily, safely, and with high efficiency and minimal environmental impact. A cleaner composition can include a component (A); cis-1-chloro-3,3,3-trifluoropropene (HCFO-1233zdZ) as a cleaning agent; and a component (B); carbon dioxide as a propellant; wherein a content of the component (B) contains 1.6 to 10 parts by mass with respect to 100 parts by mass of the component (A).

公开(公告)号：US20220203149A1

公开(公告)日：2022-06-30

申请号：US17698447

申请日：2022-03-18

申请人： THE CHEMOURS COMPANY FC, LLC

发明人： MARK L. ROBIN ,  KONSTANTINOS KONTOMARIS

IPC分类号： A62D1/00 ,  C08J9/14 ,  C09K5/04 ,  C09K3/30 ,  C10M105/52 ,  C10M105/04 ,  A01N29/00 ,  C11D7/50 ,  H01B3/56 ,  H05F3/04 ,  B01D11/02 ,  A62D1/02 ,  C09K5/00 ,  H01B3/24

摘要： Disclosed is a mixture comprising the compound trans-1,1,1,4,4,4-hexafluoro-2-butene and at least one additional compound selected from the group consisting of HFOs, HFCs, HFEs, CFCs, CO2, olefins, organic acids, alcohols, hydrocarbons, ethers, aldehydes, ketones, and others such as methyl formate, formic acid, trans-1,2 dichloroethylene, carbon dioxide, cis-HFO-1234ze+HFO-1225yez, mixtures of these plus water; mixtures of these plus CO2; mixtures of these trans 1,2-dichloroethylene (DCE); mixtures of these plus methyl formate; mixtures with cis-HFO-1234ze+CO2, mixtures with cis-HFO-1234ze+HFO-1225yez+CO2, and mixtures with cis-HFO-1234ze+HFC-245fa. Also disclosed are methods of using and products of using the above compositions as blowing agents, solvents, heat transfer compositions, aerosol propellant compositions, fire extinguishing and suppressant compositions.

公开(公告)号：US11359169B2

公开(公告)日：2022-06-14

申请号：US17582077

申请日：2022-01-24

申请人： Fujifilm Electronic Materials U.S.A., Inc.

发明人： Tomonori Takahashi ,  Bing Du ,  William A. Wojtczak ,  Thomas Dory ,  Emil A. Kneer

IPC分类号： C11D7/50 ,  C11D11/00 ,  C11D7/32 ,  C11D3/00 ,  H01L21/02 ,  H01L21/311 ,  H01L21/027

摘要： This disclosure relates to a cleaning composition that contains 1) at least one redox agent; 2) at least one first chelating agent, the first chelating agent being a polyaminopolycarboxylic acid; 3) at least one metal corrosion inhibitor, the metal corrosion inhibitor being a substituted or unsubstituted benzotriazole; 4) at least one pH adjusting agent, the pH adjusting agent being a base free of a metal ion; and 5) water. This disclosure also relates to a method of using the above composition for cleaning a semiconductor substrate.

公开(公告)号：US11326078B2

公开(公告)日：2022-05-10

申请号：US16497840

申请日：2018-04-02

申请人： THE UNIVERSITY OF MASSACHUSETTS

发明人： Christopher Hansen ,  Gregory Morose ,  Catherine P. Barry

IPC分类号： C11D7/50 ,  C09J11/06 ,  C09J111/00 ,  C09J125/10

摘要： In an embodiment a solvent composition can comprise, based on the total volume of the solvent composition, 10 to 95 volume percent of a first solvent, wherein the first solvent has Hansen solubility parameters of: 15 MPa0.5≤δD≤17 MPa0.5, 4≤δP≤10.5 MPa0.5, and 7≤δH≤10 MPa0.5; 5 to 95 volume percent of a second solvent, wherein the second solvent has Hansen solubility parameters of: 16 MPa0.5≤δD≤17.5 MPa0.5, 0≤δP≤3 MPa0.5, and 0≤δH≤3 MPa0.5; and 0 to 85 volume percent parachlorobenzotrifluoride; wherein the amounts of the first solvent, the second solvent, and parachlorobenzotrifluoride sum to at least 85 volume percent. The first solvent can comprise methyl acetate, acetone, dimethyl carbonate, ethyl acetate, n-butylamine, propyl acetate, tetrahydrofuran, or a combination thereof. The second solvent can comprise cyclohexene, cyclohexane, cyclopentane, methylcyclohexane, or a combination thereof. The solvent compositions are particularly useful in an adhesive composition. An adhesive composition includes the solvent composition, a rubber, and a tackifying resin. A method of bonding two surfaces is also described.

公开(公告)号：US20220135913A1

公开(公告)日：2022-05-05

申请号：US17430978

申请日：2020-02-14

申请人： NISSAN CHEMICAL CORPORATION

发明人： Hiroshi OGINO ,  Tetsuya SHINJO ,  Ryo KARASAWA ,  Takahisa OKUNO

IPC分类号： C11D11/00 ,  C11D7/50 ,  C11D7/32 ,  C11D7/26 ,  H01L21/02

摘要： A cleaning agent composition for use in removal of a polysiloxane adhesive remaining on a substrate containing a tetrahydrocarbylammonium fluoride and an organic solvent, wherein the organic solvent contains a lactam compound represented by formula (1) and a ring-structure-having ether compound including at least one species selected from among a cyclic ether compound, a cycloalkyl (chain alkyl) ether compound, a cycloalkyl (branched alkyl) ether compound, and a di(cycloalkyl) ether compound. (in formula (1), R101 represents a C1 to C6 alkyl group; and R102 represents a C1 to C6 alkylene group.)

公开(公告)号：US20220106542A1

公开(公告)日：2022-04-07

申请号：US17492257

申请日：2021-10-01

申请人： Entegris, Inc.

发明人： Daniela WHITE ,  YoungMin KIM ,  Michael L. WHITE

IPC分类号： C11D11/00 ,  C11D7/32 ,  C11D7/26 ,  C11D7/34 ,  C11D7/50 ,  H01L21/02

摘要： In general, the invention provides high pH cleaning compositions for dielectric surfaces such as PETEOS, SiO2, thermal oxide, silicon nitride, silicon, etc. The compositions of the invention afford superior surface wetting, dispersion of particles and organic residues, and prevents redeposition and re-agglomeration of the dispersed residue during cleaning to afford superior cleaning and low defectivity.