SUBSTRATE AND METHOD FOR MANUFACTURING THE SAME, DISPLAY PANEL, AND DISPLAY APPARATUS

    公开(公告)号:US20210183897A1

    公开(公告)日:2021-06-17

    申请号:US17020133

    申请日:2020-09-14

    Abstract: A substrate includes a driving backplane, a plurality of first connecting lines and a plurality of second connecting lines. The driving backplane includes a base substrate, at least one first lead group and at least one second lead group. Each first lead group includes a plurality of first leads, and each second lead group includes a plurality of second leads. A first lead group and a corresponding second lead group is disposed in a peripheral region. The plurality of first connecting lines are disposed on at least one side face of the driving backplane, each first connecting line is electrically connected to at least one first lead. The plurality of second connecting lines are disposed on the at least one side face of the driving backplane, each second connecting line is electrically connected to at least one second lead, and is in contact with a corresponding first connecting line.

    EXPOSURE DEVICE AND EXPOSURE METHOD THEREOF
    34.
    发明申请

    公开(公告)号:US20190049854A1

    公开(公告)日:2019-02-14

    申请号:US15920952

    申请日:2018-03-14

    Abstract: Disclosed are an exposure device and an exposure method thereof. The exposure device includes a stage for placing thereon a substrate to be exposed, a mask arranged above the stage and comprising periodical patterns, an exposure light source arranged above the stage and configured to transmit light at a preset wavelength, and a transparent body configured to move horizontally in a preset direction in an exposure area between the mask and the stage while the exposure light source is exposing in operation. The transparent body is so structured that there is a change in light journey of greater than 2p2/λ at each exposure position in the exposure area while an exposure light source is exposing in operation, where p represents a space between periodical patterns in the mask, and λ represents a preset wavelength of light emitted by the exposure light source.

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