Display substrate and manufacturing method thereof, display apparatus

    公开(公告)号:US11018166B2

    公开(公告)日:2021-05-25

    申请号:US15521408

    申请日:2016-02-16

    Abstract: The present disclosure provides a display substrate and a manufacturing method thereof, and a display apparatus, the manufacturing method comprises: forming a base; forming a thin film transistor on the base, the thin film transistor comprises a gate, a source, a drain and an active layer, a first insulating layer is formed on the base, and a second insulating layer is formed between the gate and the active layer, the active layer is formed in the first insulating layer; forming a third insulating layer above the thin film transistor; forming a pixel electrode above the third insulating layer; forming a fourth insulating layer above the pixel electrode, a material of at least one of the base, the first insulating layer, the second insulating layer, the third insulating layer and the fourth insulating layer includes an organic material, and a material of at least one of them includes an inorganic material.

    Display substrate and manufacturing method thereof, and display device

    公开(公告)号:US10727451B2

    公开(公告)日:2020-07-28

    申请号:US16426468

    申请日:2019-05-30

    Abstract: A display substrate and a manufacturing method thereof, and a display device are provided. The manufacturing method of the display substrate includes: forming light emitting units of at least two colors on a base substrate, which includes: forming a first electrode, a light emitting layer and a second electrode on the base substrate. An electrode sub-layer and a transparent structure are formed on the base substrate to form the first electrode. A first transparent conductive layer, a transparent etching barrier layer and a second transparent conductive layer are formed on a side of the electrode sub-layer away from the base substrate to form the transparent structure of the first color light emitting unit. An etching rate of the first transparent conductive layer and an etching rate of the second transparent conductive layer are substantially identical, and thicknesses of transparent structures in different light emitting units are different.

    OLED device and a method of preparing the same

    公开(公告)号:US10707286B2

    公开(公告)日:2020-07-07

    申请号:US16417031

    申请日:2019-05-20

    Abstract: An OLED device and a method of preparing the same are provided, the OLED device including: a substrate; a first source electrode on the substrate, the first source electrode having a first side surface; a first insulating layer on the first source electrode, the first insulating layer having a second side surface intersecting with an upper surface of the first source electrode and the first side surface of the first source electrode, with at least one of an angle between the first side surface and the upper surface of the substrate and an angle between the second side surface and the upper surface of the substrate being an acute angle; an active layer on the substrate, the active layer covering the first side surface and the second side surface; a gate insulating layer on the active layer; an anode on the gate insulating layer; a light emitting functional layer on the anode; and a cathode on the light emitting functional layer, the cathode including a first drain region covering the first insulating layer and being in contact with the active layer.

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