公开(公告)号：US20230418168A1

公开(公告)日：2023-12-28

申请号：US18036788

申请日：2021-11-01

Applicant: ASML Netherlands B.V.

Inventor： Simon Reinald HUISMAN ,  Sebastianus Adrianus GOORDEN

IPC: G03F7/00 ,  G03F9/00

CPC classification number: G03F7/70633 ,  G03F9/7046 ,  G03F9/7088 ,  G03F9/7019

Abstract: Disclosed is a metrology system comprising: a pre-alignment metrology tool operable to measure a plurality of targets on a substrate to obtain measurement data; and a processing unit. The processing unit is operable to: process said measurement data to determine for each target at least one position distribution which describes variation of said position value over at least part of said target; and determine a measurement correction from said at least one position distribution which corrects for within-target variation in each of said targets, said measurement correction for correcting measurements performed by an alignment sensor.

公开(公告)号：US20230229094A1

公开(公告)日：2023-07-20

申请号：US18151334

申请日：2023-01-06

Applicant: ASML Netherlands B.V.

Inventor： Simon Reinald HUISMAN ,  Arjan Johannes Anton BEUKMAN ,  Arie Jeffrey DEN BOEF ,  Sebastianus Adrianus GOORDEN ,  Nitish KUMAR ,  Jin LIAN ,  Zili ZHOU

IPC: G03F9/00 ,  G02B27/28 ,  G02B26/08 ,  G03F7/20

CPC classification number: G03F9/7065 ,  G02B26/0833 ,  G02B27/283 ,  G03F7/70575 ,  G03F7/70616

Abstract: Disclosed is an illumination arrangement for spectrally shaping a broadband illumination beam to obtain a spectrally shaped illumination beam. The illumination arrangement comprises a beam dispersing element for dispersing the broadband illumination beam and a spatial light modulator for spatially modulating the broadband illumination beam subsequent to being dispersed. The illumination arrangement further comprises at least one of a beam expanding element for expanding said broadband illumination beam in at least one direction, located between an input of the illumination arrangement and the spatial light modulator; and a lens array, each lens of which for directing a respective wavelength band of the broadband illumination beam subsequent to being dispersed onto a respective region of the spatial light modulator.

公开(公告)号：US20200103772A1

公开(公告)日：2020-04-02

申请号：US16611500

申请日：2018-03-06

Applicant: ASML Netherlands B.V.

Inventor： Sebastianus Adrianus GOORDEN ,  Simon Reinald HUISMAN ,  Duygu AKBULUT ,  Alessandro POLO ,  Simon Gijsbert Josephus MATHIJSSEN

IPC: G03F9/00 ,  G03F7/20 ,  G01B11/27

Abstract: Disclosed is a metrology sensor apparatus and associated method. The metrology sensor apparatus comprises an illumination system operable to illuminate a metrology mark on a substrate with illumination radiation having a first polarization state and an optical collection system configured to collect scattered radiation, following scattering of the illumination radiation by the metrology mark. The metrology mark comprises a main structure and changes, relative to the first polarization state, at least one of a polarization state of a first portion of the scattered radiation predominately resultant from scattering by the main structure and a polarization state of a second portion of radiation predominately resultant from scattering by one or more features other than the main structure, such that the polarization state of the first portion of the scattered radiation is different to the polarization state of the second portion of the scattered radiation. The metrology sensor apparatus further comprises an optical filtering system which filters out the second portion of the scattered radiation based on its polarization state.

公开(公告)号：US20190212658A1

公开(公告)日：2019-07-11

申请号：US16325471

申请日：2017-06-30

Applicant: ASML NETHERLANDS B.V.

Inventor： Simon Reinald HUISMAN ,  Simon Gijsbert Josephus MATHIJSSEN ,  Sebastianus Adrianus GOORDEN ,  Duygu AKBULUT ,  Alessandro POLO

IPC: G03F7/20 ,  G03F9/00

Abstract: An alignment sensor for a lithographic apparatus has an optical system configured to deliver, collect and process radiation selectively in a first waveband (e.g. 500-900 nm) and/or in a second waveband (e.g. 1500-2500 nm). The radiation of the first and second wavebands share a common optical path in at least some portion of the optical system, while the radiation of the first waveband is processed by a first processing sub-system and the radiation of the second waveband is processed by a second processing sub-system. The processing subsystems in one example include self-referencing interferometers. The radiation of the second waveband allows marks to be measured through an opaque layer. Optical coatings and other components of each processing sub-system can be tailored to the respective waveband, without completely duplicating the optical system.

公开(公告)号：US20190086201A1

公开(公告)日：2019-03-21

申请号：US16121780

申请日：2018-09-05

Applicant: ASML Netherlands B.V.

Inventor： Arie Jeffrey DEN BOEF ,  Simon Reinald HUISMAN

IPC: G01B11/27

Abstract: A method of determining a parameter of a patterning process applied to an object comprising two features (for example an overlay of the two features) comprises: irradiating the two features of the object with a radiation beam and receiving at least a portion of the radiation beam scattered from the two features of the object. The at least a portion of the radiation beam comprises: a first portion comprising at least one diffraction order and a second portion comprising at least one diffraction order that is different to a diffraction order of the first portion. The method further comprises moderating a phase difference between the first and second portions and combining the first and second portions such that they interfere to produce a time dependent intensity signal. The method further comprises determining the parameter of the patterning process from a contrast of the time dependent intensity signal.