公开(公告)号：US20210310125A1

公开(公告)日：2021-10-07

申请号：US17352011

申请日：2021-06-18

申请人： ASM IP Holding B.V.

发明人： Mingyang Ma ,  Junwei Su ,  Alexandros Demos ,  Xing Lin ,  Sam Kim ,  Gregory Michael Bartlett

IPC分类号： C23C16/52 ,  C23C16/455 ,  B01J4/00 ,  C23C16/44 ,  H01J37/32

摘要： A gas injection system, a reactor system including the gas injection system, and methods of using the gas injection system and reactor system are disclosed. The gas injection system can be used in gas-phase reactor systems to independently monitor and control gas flow rates in a plurality of channels of a gas injection system coupled to a reaction chamber.

公开(公告)号：US11053591B2

公开(公告)日：2021-07-06

申请号：US16055532

申请日：2018-08-06

申请人： ASM IP Holding B.V.

发明人： Mingyang Ma ,  Junwei Su ,  Alexandros Demos ,  Xing Lin ,  Sam Kim ,  Gregory Michael Bartlett

IPC分类号： H01J37/32 ,  C23C16/52 ,  C23C16/455 ,  B01J4/00 ,  C23C16/44

摘要： A gas injection system, a reactor system including the gas injection system, and methods of using the gas injection system and reactor system are disclosed. The gas injection system can be used in gas-phase reactor systems to independently monitor and control gas flow rates in a plurality of channels of a gas injection system coupled to a reaction chamber.

公开(公告)号：US20190019670A1

公开(公告)日：2019-01-17

申请号：US16000109

申请日：2018-06-05

申请人： ASM IP Holding B.V.

发明人： Xing Lin ,  Peipei Gao ,  Fei Wang ,  John Tolle ,  Bubesh Babu Jotheeswaran ,  Vish Ramanathan ,  Eric Hill

IPC分类号： H01L21/02 ,  H01L21/67 ,  B08B5/00 ,  B08B7/00

摘要： A system and method for removing both carbon-based contaminants and oxygen-based contaminants from a semiconductor substrate within a single process chamber is disclosed. The invention may comprise utilization of remote plasma units and multiple gas sources to perform the process within the single process chamber.