公开(公告)号：US12043899B2

公开(公告)日：2024-07-23

申请号：US17840960

申请日：2022-06-15

Applicant: ASM IP Holding B.V.

Inventor： Hyeongeu Kim ,  Tom Kirschenheiter ,  Eric Hill ,  Mark Hawkins ,  Loren Jacobs

IPC: C23C16/52 ,  C23C16/24 ,  C23C16/44 ,  C23C16/458

CPC classification number: C23C16/52 ,  C23C16/24 ,  C23C16/4401 ,  C23C16/4411 ,  C23C16/4586

Abstract: A system and method for depositing a film within a reaction chamber are disclosed. An exemplary system includes a temperature measurement device, such as a pyrometer, to measure an exterior wall surface of the reaction chamber. A temperature of the exterior wall surface can be controlled to mitigate cleaning or etching of an interior wall surface of the reaction chamber.

公开(公告)号：US20230163019A1

公开(公告)日：2023-05-25

申请号：US18100660

申请日：2023-01-24

Applicant: ASM IP Holding B.V.

Inventor： Eric Hill ,  John DiSanto

IPC: H01L21/687 ,  H01L21/67 ,  C23C16/458 ,  C30B25/08 ,  C30B25/12

CPC classification number: H01L21/68742 ,  H01L21/67069 ,  H01L21/67028 ,  C23C16/4586 ,  C23C16/4584 ,  C30B25/08 ,  H01L21/67248 ,  C30B25/12 ,  H01L21/68792 ,  C23C16/4581 ,  H01L21/68757 ,  H01L21/67126

Abstract: A substrate support assembly suitable for use in a reactor including a common processing and substrate transfer region is disclosed. The substrate support assembly includes a susceptor and one or more lift pins that can be used to lower a substrate onto a surface of the susceptor and raise the substrate from the surface, to allow transfer of the substrate from the processing region, without raising or lowering the susceptor.

公开(公告)号：US11587821B2

公开(公告)日：2023-02-21

申请号：US16944271

申请日：2020-07-31

Applicant: ASM IP Holding B.V.

Inventor： Eric Hill ,  John DiSanto

IPC: H01L21/67 ,  C30B25/08 ,  H01L21/687 ,  C23C16/458 ,  C30B25/12

Abstract: A substrate support assembly suitable for use in a reactor including a common processing and substrate transfer region is disclosed. The substrate support assembly includes a susceptor and one or more lift pins that can be used to lower a substrate onto a surface of the susceptor and raise the substrate from the surface, to allow transfer of the substrate from the processing region, without raising or lowering the susceptor.

公开(公告)号：US11018047B2

公开(公告)日：2021-05-25

申请号：US16205899

申请日：2018-11-30

Applicant: ASM IP Holding B.V.

Inventor： Uday Kiran Rokkam ,  Eric Hill

IPC: H01L21/687

Abstract: A lift pin and a substrate support assembly and reactor including the lift pin are disclosed. The lift pin includes first section comprising a material having a first transparency and a second section comprising a material having a second transparency. The lift pin can provide improved temperature uniformity across substrate support assembly including the lift pin during substrate processing.

公开(公告)号：US10770336B2

公开(公告)日：2020-09-08

申请号：US15672096

申请日：2017-08-08

Applicant: ASM IP Holding B.V.

Inventor： Eric Hill ,  John DiSanto

IPC: H01L21/687 ,  H01L21/67 ,  C23C16/458 ,  C30B25/08 ,  C30B25/12

Abstract: A substrate support assembly suitable for use in a reactor including a common processing and substrate transfer region is disclosed. The substrate support assembly includes a susceptor and one or more lift pins that can be used to lower a substrate onto a surface of the susceptor and raise the substrate from the surface, to allow transfer of the substrate from the processing region, without raising or lowering the susceptor.

公开(公告)号：US20150267295A1

公开(公告)日：2015-09-24

申请号：US14219879

申请日：2014-03-19

Applicant: ASM IP Holding B.V.

Inventor： Eric Hill ,  John Tolle ,  Matthew Goodman

IPC: C23C16/458 ,  C23C16/455 ,  H05B6/10

CPC classification number: C23C16/4581 ,  C23C16/45504 ,  H05B6/105

Abstract: A substrate tray, a susceptor assembly including a substrate tray, and a reactor including a substrate tray and/or susceptor assembly are disclosed. The substrate tray is configured to retain a substrate during processing and can be formed of a substantially non-reactive material. The substrate tray can be received by a susceptor, formed of another material, to form the susceptor assembly.

Abstract translation: 公开了一种基板托盘，包括基板托盘的基座组件和包括基板托盘和/或基座组件的反应器。 衬底托盘被配置为在加工过程中保持衬底并且可以由基本上不反应的材料形成。 衬底托盘可以由由另一种材料形成的基座接收，以形成基座组件。

公开(公告)号：US11053585B2

公开(公告)日：2021-07-06

申请号：US16695274

申请日：2019-11-26

Applicant: ASM IP HOLDING B.V.

Inventor： John Tolle ,  Eric Hill

IPC: C23C16/44 ,  H05B3/26 ,  C23C16/46 ,  C23C16/458 ,  H05B6/10 ,  C23C14/02 ,  C23C14/50 ,  C23C16/02

Abstract: A reactor system and related methods are provided which may include a heating element in a wafer tray. The heating element may be used to heat the wafer tray and a substrate or wafer seated on the wafer tray within a reaction chamber assembly, and may be used to cause sublimation of a native oxide of the wafer.

公开(公告)号：US11015245B2

公开(公告)日：2021-05-25

申请号：US14219839

申请日：2014-03-19

Applicant: ASM IP Holding B.V.

Inventor： Eric Hill ,  Shawn Thomas

IPC: C23C16/52 ,  C23C16/44 ,  H01J37/32 ,  H01L21/67 ,  C23C16/455

Abstract: An improved exhaust system for a gas-phase reactor and a reactor and system including the exhaust system are disclosed. The exhaust system includes a channel fluidly coupled to an exhaust plenum. The improved exhaust system allows operation of a gas-phase reactor with desired flow characteristics while taking up relatively little space within a reaction chamber.

公开(公告)号：US10787741B2

公开(公告)日：2020-09-29

申请号：US15860564

申请日：2018-01-02

Applicant: ASM IP Holding B.V.

Inventor： John Tolle ,  Eric Hill ,  Jereld Lee Winkler

IPC: C23C16/46 ,  C23C16/50 ,  C23C16/52 ,  H01J37/32 ,  C23C16/452

Abstract: A system and method for providing intermediate reactive species to a reaction chamber are disclosed. The system includes an intermediate reactive species formation chamber fluidly coupled to the reaction chamber to provide intermediate reactive species to the reaction chamber. A pressure control device can be used to control an operating pressure of the intermediate reactive species formation chamber, and a heater can be used to heat the intermediate reactive species formation chamber to a desired temperature.

公开(公告)号：US10519541B2

公开(公告)日：2019-12-31

申请号：US16029130

申请日：2018-07-06

Applicant: ASM IP HOLDING B.V.

Inventor： John Tolle ,  Eric Hill

IPC: C23C16/44 ,  C23C16/458 ,  C23C16/02 ,  C23C14/50 ,  C23C16/46 ,  H05B6/10 ,  C23C14/02

Abstract: A reactor system and related methods are provided which may include a heating element in a wafer tray. The heating element may be used to heat the wafer tray and a substrate or wafer seated on the wafer tray within a reaction chamber assembly, and may be used to cause sublimation of a native oxide of the wafer.