公开(公告)号：US11596051B2

公开(公告)日：2023-02-28

申请号：US17108747

申请日：2020-12-01

Applicant: Applied Materials, Inc.

Inventor： Costel Biloiu ,  Charles T. Carlson ,  Frank Sinclair ,  Paul J. Murphy ,  David T. Blahnik

IPC: H05H7/22 ,  H01J37/317

Abstract: An apparatus may include a drift tube assembly, arranged to transmit an ion beam. The drift tube assembly may include a first ground electrode; an RF drift tube assembly, disposed downstream of the first ground electrode; and a second ground electrode, disposed downstream of the RF drift tube assembly. The RF drift tube assembly may define a triple gap configuration. The apparatus may include a resonator, where the resonator comprises a toroidal coil, having a first end, connected to a first RF drift tube of the RF drift tube assembly, and a second end, connected to a second RF drift tube of the RF drift tube assembly.

公开(公告)号：US11476087B2

公开(公告)日：2022-10-18

申请号：US16984053

申请日：2020-08-03

Applicant: Applied Materials, Inc.

Inventor： Frank Sinclair

IPC: H01J37/317 ,  H01J37/32

Abstract: An ion implantation system, including an ion source and extraction system, arranged to generate an ion beam at a first energy, and a linear accelerator, disposed downstream of the ion source, the linear accelerator arranged to receive the ion beam as a bunched ion beam accelerate the ion beam to a second energy, greater than the first energy. The linear accelerator may include a plurality of acceleration stages, wherein a given acceleration stage of the plurality of acceleration stages comprises: a drift tube assembly, arranged to conduct the ion beam; a resonator, electrically coupled to the drift tube assembly; and an RF power assembly, coupled to the resonator, and arranged to output an RF signal to the resonator. As such, the given acceleration stage does not include a quadrupole element.

公开(公告)号：US20220148843A1

公开(公告)日：2022-05-12

申请号：US17092250

申请日：2020-11-07

Applicant: Applied Materials, Inc.

Inventor： Costel Biloiu ,  Jay R. Wallace ,  Kevin M. Daniels ,  Frank Sinclair ,  Christopher Campbell

IPC: H01J37/08 ,  H01J37/32

Abstract: An extraction plate for an ion beam system. The extraction plate may include an insulator body that includes a peripheral portion, to connect to a first side of a plasma chamber, and further includes a central portion, defining a concave shape. As such, an extraction aperture may be arranged along a first surface of the central portion, where the first surface is oriented at a high angle with respect to the first side. The extraction plate may further include a patterned electrode, comprising a first portion and a second portion, affixed to an outer side of the insulator body, facing away from the plasma chamber, wherein the first portion is separated from the second portion by an insulating gap.

公开(公告)号：US11232925B2

公开(公告)日：2022-01-25

申请号：US16735053

申请日：2020-01-06

Applicant: Applied Materials, Inc.

Inventor： Shengwu Chang ,  Frank Sinclair ,  Michael St. Peter

IPC: H01J7/24 ,  H05B31/26 ,  H01J27/20

Abstract: An IHC ion source that employs a negatively biased cathode and one or more side electrodes is disclosed. The one or more side electrodes are left electrically unconnected in certain embodiments and are grounded in other embodiments. The floating side electrodes may be beneficial in the formation of certain species. In certain embodiments, a relay is used to allow the side electrodes to be easily switched between these two modes. By changing the configuration of the side electrodes, beam current can be optimized for different species. For example, certain species, such as arsenic, may be optimized when the side electrodes are at the same voltage as the chamber. Other species, such as boron, may be optimized when the side electrodes are left floating relative to the chamber. In certain embodiments, a controller is in communication with the relay so as to control which mode is used, based on the desired feed gas.

公开(公告)号：US20210090845A1

公开(公告)日：2021-03-25

申请号：US16575969

申请日：2019-09-19

Applicant: APPLIED Materials, Inc.

Inventor： Robert C. Lindberg ,  Alexandre Likhanskii ,  Wayne LeBlanc ,  Frank Sinclair ,  Svetlana Radovanov

IPC: H01J37/12 ,  H01J37/147 ,  H01J37/24 ,  H01J37/317

Abstract: Provided herein are approaches for controlling an ion beam using an electrostatic filter with curved electrodes. In some embodiments, a system may include an electrostatic filter receiving an ion beam, the filter including first and second electrodes disposed opposite sides of an ion beam line, each of the first and second electrodes having a central region between first and second ends, wherein a distance between a first outer surface of the first electrode and a second outer surface of the second electrode varies along an electrode length axis extending between the first and second ends. The system may further include a power supply in communication with the electrostatic filter, the power supply operable to supply a voltage and a current to the first and second electrodes, wherein the variable distance between the first and second outer surfaces causes the ion beam to converge or diverge.

公开(公告)号：US20210066017A1

公开(公告)日：2021-03-04

申请号：US16735053

申请日：2020-01-06

Applicant: Applied Materials, Inc.

Inventor： Shengwu Chang ,  Frank Sinclair ,  Michael St. Peter

IPC: H01J27/20

Abstract: An IHC ion source that employs a negatively biased cathode and one or more side electrodes is disclosed. The one or more side electrodes are left electrically unconnected in certain embodiments and are grounded in other embodiments. The floating side electrodes may be beneficial in the formation of certain species. In certain embodiments, a relay is used to allow the side electrodes to be easily switched between these two modes. By changing the configuration of the side electrodes, beam current can be optimized for different species. For example, certain species, such as arsenic, may be optimized when the side electrodes are at the same voltage as the chamber. Other species, such as boron, may be optimized when the side electrodes are left floating relative to the chamber. In certain embodiments, a controller is in communication with the relay so as to control which mode is used, based on the desired feed gas.

公开(公告)号：US20210035779A1

公开(公告)日：2021-02-04

申请号：US16524646

申请日：2019-07-29

Applicant: APPLIED Materials, Inc.

Inventor： Costel Biloiu ,  Appu Naveen Thomas ,  Tyler Rockwell ,  Frank Sinclair ,  Christopher Campbell

IPC: H01J37/32 ,  H01J37/08

Abstract: An ion beam processing apparatus may include a plasma chamber, and a plasma plate, disposed alongside the plasma chamber, where the plasma plate defines a first extraction aperture. The apparatus may include a beam blocker, disposed within the plasma chamber and facing the extraction aperture. The apparatus may further include a non-planar electrode, disposed adjacent the beam blocker and outside of the plasma chamber; and an extraction plate, disposed outside the plasma plate, and defining a second extraction aperture, aligned with the first extraction aperture.

公开(公告)号：US10804068B2

公开(公告)日：2020-10-13

申请号：US16197242

申请日：2018-11-20

Applicant: APPLIED Materials, Inc.

Inventor： Alexandre Likhanskii ,  Frank Sinclair ,  Shengwu Chang

IPC: H01J37/05 ,  H01J37/147 ,  H01J37/317

Abstract: An apparatus is provided. The apparatus may include a main chamber; an entrance tunnel having a propagation axis extending into the main chamber along a first direction; an exit tunnel, connected to the main chamber and defining an exit direction. The entrance tunnel and the exit tunnel may define a beam bend of at least 30 degrees therebetween. The apparatus may include an electrode assembly, disposed in the main chamber, and defining a beam path between the entrance tunnel and the exit aperture, wherein the electrode assembly comprises a lower electrode, disposed on a first side of the beam path, and a plurality of electrodes, disposed on a second side of the beam path, the plurality of electrodes comprising at least five electrodes.

公开(公告)号：US20200161076A1

公开(公告)日：2020-05-21

申请号：US16197242

申请日：2018-11-20

Applicant: APPLIED Materials, Inc.

Inventor： Alexandre Likhanskii ,  Frank Sinclair ,  Shengwu Chang

IPC: H01J37/05 ,  H01J37/147 ,  H01J37/317

Abstract: An apparatus is provided. The apparatus may include a main chamber; an entrance tunnel having a propagation axis extending into the main chamber along a first direction; an exit tunnel, connected to the main chamber and defining an exit direction. The entrance tunnel and the exit tunnel may define a beam bend of at least 30 degrees therebetween. The apparatus may include an electrode assembly, disposed in the main chamber, and defining a beam path between the entrance tunnel and the exit aperture, wherein the electrode assembly comprises a lower electrode, disposed on a first side of the beam path, and a plurality of electrodes, disposed on a second side of the beam path, the plurality of electrodes comprising at least five electrodes.

公开(公告)号：US12279359B2

公开(公告)日：2025-04-15

申请号：US18431579

申请日：2024-02-02

Applicant: Applied Materials, Inc.

Inventor： David T. Blahnik ,  Charles T. Carlson ,  Robert B. Vopat ,  Frank Sinclair ,  Paul J. Murphy ,  Krag R. Senior

IPC: H05H7/22

Abstract: Embodiments herein are directed to a linear accelerator assembly for an ion implanter. In some embodiments, a LINAC may include a coil resonator and a plurality of drift tubes coupled to the coil resonator by a set of flexible leads.