公开(公告)号：US06699635B1

公开(公告)日：2004-03-02

申请号：US09471007

申请日：1999-12-23

申请人： Kunihiko Kodama ,  Kenichiro Sato ,  Toshiaki Aoai ,  Yasumasa Kawabe

发明人： Kunihiko Kodama ,  Kenichiro Sato ,  Toshiaki Aoai ,  Yasumasa Kawabe

IPC分类号： G03F7004

CPC分类号： G03F7/0048 ,  G03F7/0397 ,  Y10S430/106

摘要： A positive photosensitive composition suitable for resist pattern formation under exposure to far ultraviolet light of wavelengths of 250 nm or shorter, particularly 220 nm or shorther, comprising: (A) a resin comprising constitutional repeating units wherein particular ring structures are present and having groups capable of decomposing under the action of an acid to cause an increase of the solubility in an alkali developer, (B) a photo-acid generator capable of generating an acid upon irradiation with actinic rays or radiation, and (C) a fluorine-containing surfactant, a silicon-containing surfactant or a mixture thereof.

摘要翻译： 适合于在暴露于波长为250nm或更短，特别是220nm或更短的远紫外光下的抗蚀剂图案形成的正性感光性组合物，其包含：（A）包含结构重复单元的树脂，其中存在特定的环结构并具有基团 在酸的作用下分解，导致碱显影剂溶解度的增加，（B）能够在用光化学射线或辐射照射时产生酸的光酸发生剂，（C）含氟表面活性剂 ，含硅表面活性剂或其混合物。

公开(公告)号：US06479211B1

公开(公告)日：2002-11-12

申请号：US09577884

申请日：2000-05-25

申请人： Kenichiro Sato ,  Kunihiko Kodama ,  Toshiaki Aoai ,  Hajime Nakao

发明人： Kenichiro Sato ,  Kunihiko Kodama ,  Toshiaki Aoai ,  Hajime Nakao

IPC分类号： G03F7039

CPC分类号： G03F7/0397 ,  G03F7/0048 ,  Y10S430/106

摘要： A positive photoresist composition for far ultraviolet exposure is disclosed, comprising a compound capable of generating an acid upon irradiation with actinic rays or radiation and a resin having a repeating unit represented by formula (I) and being capable of decomposing under the action of an acid to increase the solubility in alkali. The positive photoresist composition of the present invention may further comprise a fluorine-containing and/or silicon-containing surfactant, an acid decomposable resin, a compound capable of decomposing under the action of an acid to generate a sulfonic acid, and/or a specific solvent, according to the objects.

摘要翻译： 公开了一种用于远紫外线曝光的正性光致抗蚀剂组合物，其包含能够在光化射线或辐射照射时能够产生酸的化合物和具有由式（I）表示的重复单元并且能够在酸的作用下分解的树脂 以增加在碱中的溶解度。 本发明的正型光致抗蚀剂组合物可以进一步包含含氟和/或含硅表面活性剂，可酸分解树脂，能够在酸的作用下分解以产生磺酸的化合物和/或特定的 溶剂，根据目的。

公开(公告)号：US06291130B1

公开(公告)日：2001-09-18

申请号：US09361568

申请日：1999-07-27

申请人： Kunihiko Kodama ,  Kenichiro Sato ,  Toshiaki Aoai

发明人： Kunihiko Kodama ,  Kenichiro Sato ,  Toshiaki Aoai

IPC分类号： G03F7004

CPC分类号： G03F7/0397 ,  G03F7/0045 ,  Y10S430/106 ,  Y10S430/111

摘要： A positive photosensitive composition comprising (A) a compound which generates an acid upon irradiation with an actinic ray or radiation, and (B-1) a resin having a group which is decomposed by the action of an acid to increase solubility in an alkaline developing solution and containing at least one structure represented by formulae (I), (II) and (III)

摘要翻译： 一种正型光敏组合物，其包含（A）在用光化射线或辐射照射时产生酸的化合物和（B-1）具有通过酸作用分解的基团的树脂，以增加在碱性显影中的溶解度 溶液，含有式（I），（II）和（III）表示的至少一种结构，

公开(公告)号：US06265135B1

公开(公告)日：2001-07-24

申请号：US09419905

申请日：1999-10-18

申请人： Kunihiko Kodama ,  Toshiaki Aoai ,  Kazuya Uenishi

发明人： Kunihiko Kodama ,  Toshiaki Aoai ,  Kazuya Uenishi

IPC分类号： G03C1492

CPC分类号： G03F7/0392 ,  C08F12/22 ,  G03F7/0045 ,  Y10S430/143 ,  Y10S430/167

摘要： A positive-working electron beam or X-ray resist composition comprising: (a) a compound capable of generating an acid by irradiation of an electron beam or X-ray; (b) a resin containing a group which is decomposable by action of an acid to increase solubility in an alkali developing solution or (e) a resin insoluble in water and soluble in the alkali developing solution; and (c) a fluorine and/or silicon surfactant, the compound capable of generating an acid by irradiation of an electron beam or X-ray being a compound which generates benzenesulfonic acid, naphthalenesulfonic acid or anthracenesulfonic acid which is substituted by at least one fluorine atom and/or at least one group containing a fluorine atom.

摘要翻译： 一种正电子束或X射线抗蚀剂组合物，其包含：（a）能够通过电子束或X射线的照射产生酸的化合物;（b）含有可通过 酸以增加在碱性显影溶液中的溶解度，或（e）不溶于水并可溶于碱性显影液的树脂; 和（c）氟和/或硅表面活性剂，能够通过电子束的照射产生酸的化合物或者X射线是产生被至少一个氟取代的苯磺酸，萘磺酸或蒽磺酸的化合物 原子和/或至少一个含有氟原子的基团。

公开(公告)号：US06242153B1

公开(公告)日：2001-06-05

申请号：US09048787

申请日：1998-03-27

申请人： Kenichiro Sato ,  Toshiaki Aoai

发明人： Kenichiro Sato ,  Toshiaki Aoai

IPC分类号： G03F7004

CPC分类号： G03F7/0045 ,  G03F7/039 ,  Y10S430/106 ,  Y10S430/107 ,  Y10S430/111

摘要： A positive photoresist composition for far ultraviolet ray exposure use, which comprises a resin that contains a repeating structural unit composed of a monomer having a specified acid-decomposable group and another monomer having an amine structure in its molecule and is decomposed by the action of an acid thereby increasing its alkali solubility, and a compound that generates an acid by irradiation of an active light ray or radiation, or a positive photoresist composition for far ultraviolet ray exposure use, which comprises a resin that contains a monomer having a specified acid-decomposable group, as a repeating structural unit, and is decomposed by the action of an acid thereby increasing its alkali solubility, a compound that generates an acid by irradiation of an active light ray or radiation and a basic low molecular weight compound. To provide a positive photoresist composition for far ultraviolet ray exposure use which is sufficiently suited for a light particularly having a wave length region of from 170 nm to 220 nm, has high sensitivity to light, can provide excellent resist pattern profiles and is excellent in terms of aging storage stability.

摘要翻译： 一种用于远紫外线照射用途的正性光致抗蚀剂组合物，其包含含有由具有特定酸可分解基团的单体构成的重复结构单元的树脂和在其分子中具有胺结构的另一单体的树脂，其通过 酸，从而提高其碱溶性，以及通过照射活性光线或辐射产生酸的化合物或用于远紫外线照射用途的正性光致抗蚀剂组合物，其包含含有具有特定酸可分解性的单体的树脂 作为重复结构单元，通过酸的作用而分解，从而提高其碱溶性，通过活性光线或辐射的照射产生酸的化合物和碱性低分子量化合物。 为了提供充分适合于具有170nm至220nm波长区域的光的远紫外线曝光用正性光致抗蚀剂组合物，对光具有高灵敏度，可以提供优异的抗蚀剂图案轮廓，并且优点 的老化储存稳定性。

公开(公告)号：US6136504A

公开(公告)日：2000-10-24

申请号：US280679

申请日：1999-03-29

申请人： Shiro Tan ,  Toru Fujimori ,  Toshiaki Aoai

发明人： Shiro Tan ,  Toru Fujimori ,  Toshiaki Aoai

IPC分类号： G03F7/004 ,  G03F7/039

CPC分类号： G03F7/039 ,  G03F7/0045 ,  Y10S430/106 ,  Y10S430/111

摘要： The present invention provides an excellent chemically-sensitized positive-working photoresist composition which exhibits a high resolution and a good dimensional stability with time, generates no development residue (scum) and standing waves and is less liable to loss of lone pattern. A novel positive-working photoresist composition is provided comprising at least (a) a copolymer A having at least structural units representedby the following general formulae (I), (II) and (III), (b) a compound which generates an acid when irradiated with actinic rays or radiation and (c) a solvent: ##STR1## wherein R.sub.1 and R.sub.2 each independently represent a hydrogen atom or methyl group; R.sub.3 represents a tertiary alkyl or cycloalkyl group which may be substituted; and X represents a divalent organic residue.

摘要翻译： 本发明提供了一种优异的化学敏化正性光致抗蚀剂组合物，其显示出高分辨率和随时间稳定的尺寸稳定性，不产生显影残渣（浮渣）和驻波，并且不易损失孤单图案。 提供了一种新型的正性光致抗蚀剂组合物，其包含至少（a）至少具有由以下通式（I），（II）和（III）表示的结构单元的共聚物A，（b） 用光化射线或辐射照射，和（c）溶剂：其中R1和R2各自独立地表示氢原子或甲基; R3表示可以被取代的叔烷基或环烷基; X表示二价有机残基。

公开(公告)号：US6042991A

公开(公告)日：2000-03-28

申请号：US25451

申请日：1998-02-18

申请人： Toshiaki Aoai ,  Shiro Tan ,  Kenichiro Sato

发明人： Toshiaki Aoai ,  Shiro Tan ,  Kenichiro Sato

IPC分类号： G03F7/004 ,  G03F7/039 ,  G03C1/72 ,  G03C1/73

CPC分类号： G03F7/039 ,  G03F7/0045 ,  Y10S430/106 ,  Y10S430/111 ,  Y10S430/115

摘要： A positive working photosensitive composition suitable for exposure using a light source of wavelengths of 250 nm or shorter, particularly 220 nm or shorter; comprising (A) a compound capable of generating an acid upon irradiation with actinic rays or radiation and (B) a resin which comprises constitutional repeating units having alicyclic groups of particular structures, including adamantyl groups, and has groups capable of decomposing due to the action of acids to increase the solubility in an alkali developer.

公开(公告)号：US6013411A

公开(公告)日：2000-01-11

申请号：US794890

申请日：1997-02-05

申请人： Toshiaki Aoai ,  Toru Fujimori ,  Tsukasa Yamanaka ,  Kazuya Uenishi

发明人： Toshiaki Aoai ,  Toru Fujimori ,  Tsukasa Yamanaka ,  Kazuya Uenishi

IPC分类号： G03F7/004 ,  G03F7/039 ,  H01L21/027

CPC分类号： G03F7/039 ,  G03F7/0045 ,  Y10S430/106 ,  Y10S430/121 ,  Y10S430/122

摘要： A positive working photosensitive composition comprising a resin having repeating units represented by the following formulae (I), (II) and (III), respectively and a compound which generates an acid with irradiation of an active ray or radiation: ##STR1## wherein R.sub.1 represents a hydrogen atom or a methyl group; R.sub.2 represents --C(.dbd.O)--O--C(R.sub.6) (R.sub.7) (R.sub.8) or --O--R.sub.5 --C(.dbd.O)--O--(R.sub.6) (R.sub.7) (R.sub.8); R.sub.3 represents --O--C(R.sub.6)(R.sub.7) (R.sub.8), --O--Si(R.sub.6)(R.sub.7)(Rs) or --O--C(R.sub.9)(R.sub.10)--OR.sub.11 ; R.sub.4 represents a hydrogen atom, a halogen atom, an alkyl group, an aryl group, an alkoxy group, an acyl group or an acyloxy group; R.sub.5 represents an alkylene group; R.sub.6, R.sub.7, R.sub.8, R.sub.9 and R.sub.10 each independently represents a hydrogen atom, an alkyl group, a cycloalkyl group or an alkenyl group, provided that at least two among R.sub.6, R.sub.7 and R.sub.8 are groups other than a hydrogen atom; R.sub.11 represents an alkyl group or an aryl group; two groups selected from R.sub.6, R.sub.7 and R.sub.8 and two groups selected from R.sub.9, R.sub.10 and R.sub.11, each two groups may be combined to form a ring; and n is an integer from 1 to 3.

摘要翻译： 一种正性感光性组合物，其特征在于，具有分别具有下述式（I），（II）和（III）所示的重复单元的树脂和通过活性射线或辐射照射产生酸的化合物，其中R1表示氢 原子或甲基; R2表示-C（= O）-O-C（R6）（R7）（R8）或-O-R5-C（= O）-O-（R6）（R7）（R8） R3表示-O-C（R6）（R7）（R8），-O-Si（R6）（R7）（Rs）或-O-C（R9）（R10）-OR11; R4表示氢原子，卤素原子，烷基，芳基，烷氧基，酰基或酰氧基; R5表示亚烷基; R6，R7，R8，R9和R10各自独立地表示氢原子，烷基，环烷基或烯基，条件是R6，R7和R8中的至少两个是除氢原子以外的基团; R11表示烷基或芳基; 选自R6，R7和R8的两个基团和选自R9，R10和R11的两个基团，可以将两个基团组合形成环; n为1〜3的整数。

公开(公告)号：US5945250A

公开(公告)日：1999-08-31

申请号：US868932

申请日：1997-06-04

申请人： Toshiaki Aoai ,  Kenichiro Sato ,  Kunihiko Kodama

发明人： Toshiaki Aoai ,  Kenichiro Sato ,  Kunihiko Kodama

IPC分类号： G03F7/00 ,  G03F7/004 ,  G03F7/039 ,  H01L21/027 ,  B03C1/492 ,  C08F2/46

CPC分类号： G03F7/0045 ,  Y10S430/107 ,  Y10S430/115 ,  Y10S430/118 ,  Y10S430/12 ,  Y10S430/122

摘要： A photosensitive composition containing a sulfonium or iodonium salt resin having a specific repeating structural units has good solubility in solvents and high photosensitivity, are capable of giving an excellent resist pattern, and change little with time after exposure.

摘要翻译： 含有具有特定重复结构单元的锍盐或碘鎓盐树脂的光敏组合物在溶剂中具有良好的溶解性和高光敏性，能够得到优异的抗蚀剂图案，并且在曝光后随时间变化很小。

公开(公告)号：US5837420A

公开(公告)日：1998-11-17

申请号：US812165

申请日：1997-03-06

申请人： Toshiaki Aoai ,  Kunihiko Kodama ,  Kazuya Uenishi ,  Tsukasa Yamanaka

发明人： Toshiaki Aoai ,  Kunihiko Kodama ,  Kazuya Uenishi ,  Tsukasa Yamanaka

IPC分类号： G03F7/004 ,  G03F7/039 ,  H01L21/027 ,  G03C1/492

CPC分类号： G03F7/0045 ,  Y10S430/115 ,  Y10S430/122

摘要： A positive working photosensitive composition is disclosed, which comprises (a) a resin having groups capable of increasing solubility of the resin in an alkali developer through their decomposition due to the action of an acid and (b) a compound represented by formula (I) or (II) generating sulfonic acid by irradiation with active rays or radiant rays: ##STR1##

摘要翻译： 公开了一种正性感光性组合物，其包含（a）具有能够通过酸的作用使树脂在碱性显影剂中分解的溶解性的基团的树脂和（b）由式（I）表示的化合物， 或（II）通过用活性射线或辐射线照射产生磺酸：<图像（I）<图像>（II）