Invention Grant
- Patent Title: Positive photosensitive composition
- Patent Title (中): 正光敏组合物
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Application No.: US09361568Application Date: 1999-07-27
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Publication No.: US06291130B1Publication Date: 2001-09-18
- Inventor: Kunihiko Kodama , Kenichiro Sato , Toshiaki Aoai
- Applicant: Kunihiko Kodama , Kenichiro Sato , Toshiaki Aoai
- Priority: JP10-211137 19980727; JP10-263392 19980917; JP11-006662 19990113; JP11-186809 19990630
- Main IPC: G03F7004
- IPC: G03F7004
Abstract:
A positive photosensitive composition comprising (A) a compound which generates an acid upon irradiation with an actinic ray or radiation, and (B-1) a resin having a group which is decomposed by the action of an acid to increase solubility in an alkaline developing solution and containing at least one structure represented by formulae (I), (II) and (III)
Information query
