公开(公告)号：US5945250A

公开(公告)日：1999-08-31

申请号：US868932

申请日：1997-06-04

Applicant: Toshiaki Aoai ,  Kenichiro Sato ,  Kunihiko Kodama

Inventor： Toshiaki Aoai ,  Kenichiro Sato ,  Kunihiko Kodama

IPC: G03F7/00 ,  G03F7/004 ,  G03F7/039 ,  H01L21/027 ,  B03C1/492 ,  C08F2/46

CPC classification number: G03F7/0045 ,  Y10S430/107 ,  Y10S430/115 ,  Y10S430/118 ,  Y10S430/12 ,  Y10S430/122

Abstract: A photosensitive composition containing a sulfonium or iodonium salt resin having a specific repeating structural units has good solubility in solvents and high photosensitivity, are capable of giving an excellent resist pattern, and change little with time after exposure.

Abstract translation: 含有具有特定重复结构单元的锍盐或碘鎓盐树脂的光敏组合物在溶剂中具有良好的溶解性和高光敏性，能够得到优异的抗蚀剂图案，并且在曝光后随时间变化很小。