THREE-DIMENSIONAL MOUNTING METHOD AND THREE-DIMENSIONAL MOUNTING DEVICE
    32.
    发明申请
    THREE-DIMENSIONAL MOUNTING METHOD AND THREE-DIMENSIONAL MOUNTING DEVICE 有权
    三维安装方法和三维安装设备

    公开(公告)号:US20170005068A1

    公开(公告)日:2017-01-05

    申请号:US15038963

    申请日:2014-11-19

    摘要: A three-dimensional mounting method for successively laminating N number of upper-layer joining materials includes positioning a first upper-layer joining material relative to a lowermost-layer joining material by recognizing an alignment position of the lowermost-layer joining material and a lower face alignment position of the first upper-layer joining material by a two-field image recognition unit, storing positional coordinates of the alignment position of the lowermost-layer joining material, positioning an (n+1)-th upper-layer joining material relative to an n-th upper-layer joining material by recognizing an upper face alignment position of the n-th upper-layer joining material and a lower face alignment position of the (n+1)-th upper-layer joining material, storing positional coordinates of the upper face alignment position of the n-th upper-layer joining material, recognizing an upper face alignment position of the N-th uppermost-layer joining material, and storing positional coordinates of the upper face alignment position of the N-th uppermost-layer joining material.

    摘要翻译: 用于连续层压N个上层接合材料的三维安装方法包括通过识别最下层接合材料的对准位置和相对于最下层接合材料的下表面定位第一上层接合材料相对于最下层接合材料 通过双场图像识别单元对第一上层接合材料的对准位置,存储最下层接合材料的取向位置的位置坐标,定位第(n + 1)个上层接合材料相对于 通过识别第n个上层接合材料的上表面对准位置和第(n + 1)个上层接合材料的下表面对准位置,第n个上层接合材料,存储位置坐标 第n个上层接合材料的上表面对准位置,识别第N个最上层接合材料的上表面对准位置,并且存储位置 第N个最上层接合材料的上表面对准位置的坐标。

    TRANSFER DEVICE AND TRANSFER SUBSTRATE
    33.
    发明公开

    公开(公告)号:US20230360936A1

    公开(公告)日:2023-11-09

    申请号:US18355484

    申请日:2023-07-20

    摘要: A transfer device is provided that comprises a transfer substrate holding unit, a receiving substrate holding unit, and an active energy ray irradiation unit. The transfer substrate holding unit holds a transfer substrate with an ablation layer on which at least one element is held. The receiving substrate holding unit holds a receiving substrate such that the ablation layer of the transfer substrate is opposite the receiving substrate. The active energy ray irradiation unit irradiates the ablation layer of the transfer substrate with an active energy ray to cause ablation for transferring the at least one element held by the ablation layer from the transfer substrate to the receiving substrate. The active energy ray irradiation unit irradiates the ablation layer with the active energy ray at a plurality of locations in a holding region of the ablation layer that holds one of the at least one element.

    Light conversion member
    37.
    发明授权

    公开(公告)号:US11409164B2

    公开(公告)日:2022-08-09

    申请号:US16464864

    申请日:2017-10-31

    摘要: A light conversion member includes a light conversion film, a first gas barrier, and a first base material. The light conversion film converts color of light from a specific color. The first gas barrier is located on a side of the light conversion film where the light to be converted is incident. The first gas barrier includes one or more gas barrier layers that prevent moisture and gas from entering the light conversion film. The first base material is located on an opposite side of the first gas barrier from a face on which the light conversion film is located. The first base material transmits the light and holds the light conversion film and the first gas barrier. For a light of the specific color, a light transmittance of the first base material combined with the first gas barrier is higher than a light transmittance of the first base material alone.

    MOUNTING DEVICE AND MOUNTING METHOD

    公开(公告)号:US20210351057A1

    公开(公告)日:2021-11-11

    申请号:US17381823

    申请日:2021-07-21

    发明人: Yasushi TAMURA

    IPC分类号: H01L21/68 H01L21/67 H01L23/00

    摘要: a mounting device and a mounting method is provided with which, after lowering a mounting head holding a chip component in a direction perpendicular to a substrate to bring the chip component into close contact with the substrate subsequent to positioning the chip component and the substrate, a control unit causes a recognition mechanism to start a parallel recognition operation of a chip recognition mark and a substrate recognition mark and recognize the chip recognition mark and the substrate recognition mark through the mounting head in a mounted state in which the chip component is in close contact with the substrate, and calculates mounting position accuracy of the chip component and the substrate.

    Method for forming sealing film, and sealing film

    公开(公告)号:US10793952B2

    公开(公告)日:2020-10-06

    申请号:US15510845

    申请日:2015-10-29

    摘要: A method for forming a sealing film, in which a buffer layer and a barrier layer whose density is higher than that of the buffer layer are alternately formed on a substrate, includes forming a first buffer layer on a surface of the substrate, forming a first barrier layer on a surface of the first buffer layer, and forming a second buffer layer on a surface of the first barrier layer. A ratio of a thickness of a portion of the first buffer layer in a thickness direction of the substrate relative to a thickness of a portion of the first buffer layer in an inclined direction that is inclined with respect to the thickness direction is closer to 1 than a ratio of a thickness of a portion of the second buffer layer in the thickness direction relative to a thickness of a portion of the second buffer layer in the inclined direction.