公开(公告)号：US20090059216A1

公开(公告)日：2009-03-05

申请号：US12136799

申请日：2008-06-11

申请人： Yukihiro Shibata ,  Shunji Maeda ,  Shuichi Chikamatsu

发明人： Yukihiro Shibata ,  Shunji Maeda ,  Shuichi Chikamatsu

IPC分类号： G01N21/88

CPC分类号： G01N21/956 ,  G01N2021/8822

摘要： A defect inspection apparatus comprises: a stage which scans a sample in a horizontal plane; an illumination optical system which illuminates light at an oblique angle with respect to a normal of a sample surface, and illuminates light in a linear form on the sample at an angle inclined to a direction perpendicular to the scanning direction of the stage; a front scattered light detection optical system which is disposed in the same orientation as the scanning direction, positioned at an elevation angle where a specular reflection light from a pattern parallel to the scanning direction is not spatially detected, and detects scattered light from a region illuminated in the linear form; an image sensor detecting an image formed by the front scattered light detection optical system; and an image processing unit performing a comparison operation of the image detected by the image sensor, thereby determining a defect candidate.

摘要翻译： 缺陷检查装置包括：在水平面扫描样品的台阶; 照射光学系统，其以相对于样品表面的法线倾斜的角度照射光，并以垂直于所述载物台的扫描方向的方向以样品的线性方式照射样品上的光; 以与扫描方向相同的方向设置的前散射光检测光学系统，位于与扫描方向平行的图案的镜面反射光未被空间检测的仰角处，并且检测来自被照射的区域的散射光 呈线形; 检测由前散射光检测光学系统形成的图像的图像传感器; 以及图像处理单元，执行由图像传感器检测到的图像的比较操作，从而确定缺陷候选。

公开(公告)号：US07489395B2

公开(公告)日：2009-02-10

申请号：US11518195

申请日：2006-09-11

申请人： Minoru Yoshida ,  Shunji Maeda ,  Atsushi Shimoda ,  Kaoru Sakai ,  Takafumi Okabe

发明人： Minoru Yoshida ,  Shunji Maeda ,  Atsushi Shimoda ,  Kaoru Sakai ,  Takafumi Okabe

IPC分类号： G01N21/00

CPC分类号： G01N21/95607 ,  G01N21/9501 ,  G01N21/95684 ,  G01N2021/9513

摘要： A method and apparatus for inspecting pattern defects emitting a laser beam, adjusting a light-amount of the laser beam, converting the light-amount adjusted laser beam into a slit-like laser light flux, lowering coherency of the slit-like laser light flux, and irradiating a sample with the coherence reduced slit-like laser light flux. An image of reflection light from the sample is obtained, and a detector is provided which includes the image sensor for receiving the image of the reflection light and for converting it into a detected image signal. An image processor is provided for detecting defects on patterns formed on the sample in accordance with the detected image signal.

摘要翻译： 用于检查发射激光束的图案缺陷的方法和装置，调节激光束的光量，将调整光量的激光束转换成狭缝状激光束，降低狭缝状激光光束的相干性 并且用相干减少的狭缝状激光束照射样品。 获得来自样品的反射光的图像，并且提供检测器，其包括用于接收反射光的图像并将其转换成检测到的图像信号的图像传感器。 提供了一种图像处理器，用于根据检测到的图像信号检测在样本上形成的图案上的缺陷。

公开(公告)号：US20080317329A1

公开(公告)日：2008-12-25

申请号：US12141947

申请日：2008-06-19

申请人： Hisae Shibuya ,  Shunji Maeda

发明人： Hisae Shibuya ,  Shunji Maeda

IPC分类号： G06K9/78

CPC分类号： G06T7/0004 ,  G06T2207/30148

摘要： An image feature is calculated based on the image of a detected defect, a coordinate feature is calculated based on position coordinates of the detected defect, and false alarm judgment is performed according to a decision tree constructed by threshold processing to the image feature or the coordinate feature.

摘要翻译： 基于检测到的缺陷的图像计算图像特征，基于检测到的缺陷的位置坐标来计算坐标特征，并根据对图像特征或坐标的阈值处理构成的判定树进行虚假警报判断 特征。

公开(公告)号：US07433508B2

公开(公告)日：2008-10-07

申请号：US10797011

申请日：2004-03-11

申请人： Kaoru Sakai ,  Shunji Maeda ,  Takafumi Okabe

发明人： Kaoru Sakai ,  Shunji Maeda ,  Takafumi Okabe

IPC分类号： G06K9/00

CPC分类号： G06T7/001 ,  G06T2207/30148

摘要： In a pattern inspection apparatus for comparing images of corresponding areas of two patterns, which are formed so as to be identical, so as to judge that a non-coincident part of the images is a defect, the influence of unevenness in brightness of patterns caused by a difference of thickness or the like is reduced, whereby highly sensitive pattern inspection is realized. In addition, high-speed pattern inspection can be carried out without changing the image comparison algorithm. For this purpose, the pattern inspection apparatus operates to perform comparison processing of images in parallel in plural areas. Further, the pattern inspection apparatus operates to convert gradation of an image signal among compared images using different plural processing units such that, even in the case in which a difference of brightness occurs in an identical pattern among images, a defect can be detected correctly.

摘要翻译： 在用于比较形成为相同的两个图案的相应区域的图像的图形检查装置中，以判断图像的不重合的部分是缺陷，导致图案的亮度不均匀性的影响 通过减小厚度差等，从而实现高灵敏度图案检查。 此外，可以进行高速图案检查，而不改变图像比较算法。 为此，图案检查装置在多个区域中并行地执行图像的比较处理。 此外，图案检查装置进行操作以使用不同的多个处理单元来转换比较图像中的图像信号的灰度，使得即使在图像中以相同图案发生亮度差异的情况下，也可以正确检测缺陷。

公开(公告)号：US20080101685A1

公开(公告)日：2008-05-01

申请号：US11858215

申请日：2007-09-20

申请人： Shunji MAEDA ,  Kenji Oka ,  Yukihiro Shibata ,  Minoru Yoshida ,  Chie Shishido ,  Yuji Takagi ,  Atsushi Yoshida ,  Kazuo Yamaguchi

发明人： Shunji MAEDA ,  Kenji Oka ,  Yukihiro Shibata ,  Minoru Yoshida ,  Chie Shishido ,  Yuji Takagi ,  Atsushi Yoshida ,  Kazuo Yamaguchi

IPC分类号： G06K9/00

CPC分类号： G06T7/001 ,  G01N21/9501 ,  G01N21/95607 ,  G06T7/0004 ,  G06T2207/30148

摘要： A method of inspecting patterns to detect a defect of the patterns by using information of a scattered diagram of brightness of said first and second images.

摘要翻译： 通过使用所述第一和第二图像的亮度的散射图的信息来检查图案以检测图案的缺陷的方法。

公开(公告)号：US20080031511A1

公开(公告)日：2008-02-07

申请号：US11869217

申请日：2007-10-09

申请人： Kaoru Sakai ,  Shunji Maeda ,  Takafumi Okabe ,  Hiroshi Goto ,  Masayuki Kuwabara ,  Naoya Takeuchi

发明人： Kaoru Sakai ,  Shunji Maeda ,  Takafumi Okabe ,  Hiroshi Goto ,  Masayuki Kuwabara ,  Naoya Takeuchi

IPC分类号： G06K9/00

CPC分类号： G06T7/001 ,  G06T7/0002 ,  G06T7/32 ,  G06T7/33 ,  G06T2207/30148

摘要： A pattern inspection method including: sequentially imaging plural chips formed on a substrate; selecting a pattern which is suitable for calculating position gap between an inspection image of a subject chip and reference image stored in memory from an image of a firstly imaged chip among said sequentially imaged plural chips formed on the substrate; computing position gap between an inspection image of a chip obtained by the sequential imaging and reference image stored in a memory by using a positional information of a pattern image included in the inspection image and a reference pattern image included in the reference image which are both corresponding to the pattern selected at the selecting; aligning the inspection image and the reference image by using information of the calculated position gap; and comparing the aligned inspection image with the reference image and extracting a difference as a defect candidate.

摘要翻译： 一种图案检查方法，包括：顺序成像形成在基板上的多个芯片; 从形成在所述基板上的所述顺序成像的多个芯片中，选择适合于计算被检体图像的检查图像与存储在存储器中的参考图像之间的位置间隔的图案， 通过使用包括在检查图像中的图案图像的位置信息和包括在参考图像中的参考图案图像来计算通过顺序成像获得的芯片的检查图像和存储在存储器中的参考图像之间的位置间隙， 到选择时选择的图案; 通过使用计算出的位置间隙的信息对准检查图像和参考图像; 并且将对准的检查图像与参考图像进行比较，并提取差异作为缺陷候选。

公开(公告)号：US20080015802A1

公开(公告)日：2008-01-17

申请号：US11776572

申请日：2007-07-12

申请人： Yuta Urano ,  Akira Hamamatsu ,  Shunji Maeda ,  Kaoru Sakai

发明人： Yuta Urano ,  Akira Hamamatsu ,  Shunji Maeda ,  Kaoru Sakai

IPC分类号： G06F19/00 ,  G01J4/00 ,  G01N21/00

CPC分类号： G01N21/9501 ,  G01N21/4738 ,  G01N21/956

摘要： A pattern inspection apparatus which compares images of regions, corresponding to each other, of patterns that are formed so as to be identical and judges that non-coincident portions in the images are defects. The pattern inspection apparatus is equipped with an image comparing section which plots individual pixels of an inspection subject image in a feature space and detects excessively deviated points in the feature space as defects. Defects can be detected correctly even when the same patterns in images have a brightness difference due to a difference in the thickness of a film formed on a wafer.

摘要翻译： 一种模式检查装置，其将彼此对应的区域的图像进行比较，形成为相同的图案，并判断图像中的非重合部分是缺陷。 图案检查装置配备有图像比较部，其在特征空间中绘制检查对象图像的各个像素，并且将特征空间中的过度偏离的点作为缺陷进行检测。 即使图像中的相同图案由于晶片上形成的膜的厚度差而具有亮度差，因此也可以正确地检测缺陷。

公开(公告)号：US07295305B2

公开(公告)日：2007-11-13

申请号：US10914115

申请日：2004-08-10

申请人： Minoru Yoshida ,  Shunji Maeda ,  Hidetoshi Nishiyama

发明人： Minoru Yoshida ,  Shunji Maeda ,  Hidetoshi Nishiyama

IPC分类号： G01N21/00

CPC分类号： G01N21/9501 ,  G01N21/4788 ,  G01N21/956

摘要： An apparatus for inspecting a defect, has a light source; a rotating diffuser plate for reducing coherence of light emitted from the light source after its light intensity was adjusted and its illumination range is formed; oscillating mirrors that variably change the beam whose coherence was reduced on a pupil, irradiates it onto a wafer, and forms an image thereof. An image sensor images the wafer by focusing reflected light from the wafer and detects an image signal; a camera observes the detected image; and an image processing unit detects a defect of a pattern formed on the wafer based on the detected image signal. Thus, conditions for illuminating the sample can be changed variably in an arbitrary and easy manner, and a more minute defect can be detected with high sensitivity by changing transmissivity and phase conditions of a pupil filter on the detection side.

摘要翻译： 用于检查缺陷的装置，具有光源; 旋转扩散板，用于在调整其光强度并且形成其照明范围之后，减少从光源发射的光的相干性; 可变地改变在瞳孔上相干性降低的光束的振动反射镜将其照射到晶片上并形成其图像。 图像传感器通过聚焦来自晶片的反射光来检测晶片，并检测图像信号; 相机观察检测到的图像; 并且图像处理单元基于检测到的图像信号检测在晶片上形成的图案的缺陷。 因此，照射样品的条件可以以任意和容易的方式可变地改变，并且通过改变检测侧的瞳孔滤光片的透射率和相位条件，可以以高灵敏度检测更多的微小缺陷。

公开(公告)号：US20070195316A1

公开(公告)日：2007-08-23

申请号：US11785432

申请日：2007-04-17

申请人： Minoru Yoshida ,  Shunji Maeda ,  Hidetoshi Nishiyama ,  Masahiro Watanabe

发明人： Minoru Yoshida ,  Shunji Maeda ,  Hidetoshi Nishiyama ,  Masahiro Watanabe

IPC分类号： G01N21/00

CPC分类号： G01N21/8806 ,  G01N21/956

摘要： The pattern defect inspection apparatus and its method of the present invention comprises: a recipe setting unit for setting an inspection recipe and/or a review recipe; an illumination optical system including: a laser light source for emitting ultraviolet laser light; a quantity-of-light adjusting unit for adjusting a quantity of the ultraviolet laser light emitted from the laser light source; and an illumination range forming unit for forming on a sample an illumination range of the ultraviolet laser light; a coherence reducing system; and a detection optical system including: a condensing optical system; a diffracted-light control optical system; and a detecting unit.

公开(公告)号：US20070133863A1

公开(公告)日：2007-06-14

申请号：US11548259

申请日：2006-10-10

申请人： Kaoru Sakai ,  Shunji Maeda ,  Takafumi Okabe

发明人： Kaoru Sakai ,  Shunji Maeda ,  Takafumi Okabe

IPC分类号： G06K9/00

CPC分类号： G06T7/001 ,  G01N21/95607 ,  G03F1/84 ,  G06T7/32 ,  G06T2207/30148

摘要： The present invention provides a high-precision alignment method, device and code for inspections that compare an inspection image with a reference image and detect defects from their differences. In one embodiment an inspection image and a reference image are divided into multiple regions. An offset is calculated for each pair of sub-images. Out of these multiple offsets, only the offsets with high reliability are used to determine an offset for the entire image. This allows high-precision alignment with little or no dependency on pattern density or shape, differences in luminance between images, and uneven luminance within individual images. Also, detection sensitivity is adjusted as necessary by monitoring alignment precision.

摘要翻译： 本发明提供了一种用于检查的高精度对准方法，装置和代码，其将检查图像与参考图像进行比较，并从其差异中检测缺陷。 在一个实施例中，检查图像和参考图像被分成多个区域。 为每对子图像计算偏移量。 在这些多个偏移量中，仅使用具有高可靠性的偏移量来确定整个图像的偏移。 这允许对图案密度或形状几乎或不依赖的高精度对准，图像之间的亮度差异以及各个图像内的不均匀亮度。 此外，通过监视对准精度，根据需要调整检测灵敏度。