Method of forming a sample image and charged particle beam apparatus
    21.
    发明申请
    Method of forming a sample image and charged particle beam apparatus 有权
    形成样品图像和带电粒子束装置的方法

    公开(公告)号:US20030111602A1

    公开(公告)日:2003-06-19

    申请号:US10239062

    申请日:2002-10-22

    CPC classification number: G01N23/22 H01J37/222 H01J37/28

    Abstract: An object of the present invention is to provide a sample image forming method and a charged particle beam apparatus which are suitable for realizing suppressing of the view area displacement with high accuracy while the influence of charging due to irradiation of the charged particle beam is being suppressed. In order to attain the above object, the present invention provide a method of forming a sample image by scanning a charged particle beam on a sample and forming an image based on secondary signals emitted from the sample, the method comprising the steps of forming a plurality of composite images by superposing a plurality of images obtained by a plurality of scanning times; and forming a further composite image by correcting positional displacements among the plurality of composite images and superposing the plurality of composite images, and a charged particle beam apparatus for realizing the above method.

    Abstract translation: 本发明的目的是提供一种在抑制由于带电粒子束的照射引起的充电的影响被抑制的情况下,能够高精度地实现视区域位移的抑制的样本图像形成方法和带电粒子束装置 。 为了实现上述目的,本发明提供一种通过在样品上扫描带电粒子束并基于从样品发射的二次信号形成图像来形成样品图像的方法,该方法包括以下步骤:形成多个 通过叠加通过多个扫描时间获得的多个图像的合成图像; 以及通过校正多个合成图像之间的位置偏移并叠加多个合成图像来形成另一个合成图像,以及用于实现上述方法的带电粒子束装置。

    Multi-beam multi-column electron beam inspection system
    22.
    发明申请
    Multi-beam multi-column electron beam inspection system 有权
    多光束多列电子束检测系统

    公开(公告)号:US20030066963A1

    公开(公告)日:2003-04-10

    申请号:US10222759

    申请日:2002-08-15

    Abstract: An electron optics assembly for a multi-column electron beam inspection tool comprises a single accelerator structure and a single focus electrode mounting plate for all columns; the electron optical components are one per column and are independently alignable. The accelerator structure comprises first and final accelerator electrodes with a set of accelerator plates in between; the first and final accelerator plates have an aperture for each column and the accelerator plates have a single aperture such that the electron optical axes for all columns pass through the single aperture. Independently alignable focus electrodes are attached to the focus electrode mounting plate, allowing each electrode to be aligned to the electron optical axis of its corresponding column. There is one electron gun per column, mounted on the top of the single accelerator structure. In other embodiments, the electron guns are mounted to a single gun mounting plate positioned above the accelerator structure.

    Abstract translation: 用于多列电子束检查工具的电子光学组件包括用于所有柱的单个加速器结构和单个聚焦电极安装板; 电子光学部件是每列一个,并且可独立对准。 加速器结构包括在其间具有一组加速器板的第一和最终加速器电极; 第一和最终的加速器板具有用于每一列的孔,并且加速板具有单个孔,使得所有列的电子光轴通过单个孔。 独立地对准的聚焦电极附着到聚焦电极安装板上,允许每个电极与其相应列的电子光轴对准。 每列有一个电子枪,安装在单个加速器结构的顶部。 在其他实施例中,电子枪安装到位于加速器结构上方的单个枪安装板。

    Detector system for a particle beam apparatus, and particle beam apparatus with such a detector system
    23.
    发明申请
    Detector system for a particle beam apparatus, and particle beam apparatus with such a detector system 有权
    用于粒子束装置的检测器系统和具有这种检测器系统的粒子束装置

    公开(公告)号:US20020011565A1

    公开(公告)日:2002-01-31

    申请号:US09808714

    申请日:2001-03-14

    CPC classification number: H01J37/244

    Abstract: A detector system for a particle beam apparatus, in particular for a scanning electron microscope, has a target structure, which in a central region near the optical axis includes an electron-converting material. The target structure also includes either a non-converting material in a region remote from the optical axis or the region remote from the optical axis is offset in the direction of the optical axis with respect to the region near the optical axis that includes the electron-converting material. The detector system makes possible separate detection of only back-scattered electrons or only secondary electrons.

    Abstract translation: 用于粒子束装置的检测器系统,特别是扫描电子显微镜,具有目标结构,其在光轴附近的中心区域包括电子转换材料。 目标结构还包括远离光轴的区域中的非转换材料或远离光轴的区域相对于包括电子发射器件的光轴附近的光轴在光轴的方向上偏移, 转换材料。 检测器系统可以单独检测只有反向散射的电子或只有二次电子。

    Portable scanning electron microscope
    24.
    发明申请
    Portable scanning electron microscope 失效
    便携式扫描电子显微镜

    公开(公告)号:US20040238739A1

    公开(公告)日:2004-12-02

    申请号:US10453117

    申请日:2003-06-02

    Inventor: Harald Gross

    CPC classification number: H01J37/28 H01J2237/16 H01J2237/18 H01J2237/3175

    Abstract: We have developed a particular combination of elements and devices which enables the portability of a scanning electron microscope (SEM). In particular the combination enables a small size, typically less than about 50 liters, a manageable weight, typically less than about 15 kg, and a low power requirement, typically less than about 100 W, which permits operation using power supplied from a portable source such as a battery. Higher performance versions may exhibit increased volume in the range of about 150 liters, increased weight, in the range of 45 kg, and a power requirement in the range of 300 W. The higher performance version of the portable scanning electron microscope may be portable with the assistance of a dolly (rolling cart) or with the assistance of attached wheels and pulling appendage.

    Abstract translation: 我们已经研制出了能够实现扫描电子显微镜(SEM)便携性的元件和器件的特殊组合。 特别地,该组合能够实现通常小于约50升的小尺寸,通常小于约15kg的可管理重量和通常小于约100W的低功率要求,其允许使用从便携式源提供的功率进行操作 例如电池。 更高的性能版本可能会在大约150升,增加重量,45kg范围内的功率需求和300W范围内的功率需求方面表现出增加的体积。便携式扫描电子显微镜的更高性能版本可以携带 小车(滚动车)或辅助轮子和拉动附件的协助。

    Electron microscope
    26.
    发明申请
    Electron microscope 有权
    电子显微镜

    公开(公告)号:US20040144922A1

    公开(公告)日:2004-07-29

    申请号:US10643954

    申请日:2003-08-20

    CPC classification number: H01J37/256 H01J37/02 H01J37/28

    Abstract: The disclosure is concerned with an electron microscope comprising a casing for encasing an assembly and a display disposed to the casing. The assembly comprises a vacuum container, a vacuum pump for evacuating the vacuum container, an electron emitter disposed at the upper position of the vacuum vessel, a sample chamber disposed at the lower position of the vacuum container and capable of projecting from the casing and a detector for detecting an electron beam emitted from a sample placed in the sample chamber.

    Abstract translation: 本公开涉及一种电子显微镜,其包括用于封装组件的壳体和布置在壳体上的显示器。 该组件包括真空容器,用于抽空真空容器的真空泵,设置在真空容器上部位置的电子发射器,设置在真空容器下部位置并能够从壳体突出的样品室 检测器,用于检测从放置在样品室中的样品发射的电子束。

    Swinging objective retarding immersion lens electron optics focusing, deflection and signal collection system and method
    27.
    发明申请
    Swinging objective retarding immersion lens electron optics focusing, deflection and signal collection system and method 有权
    摆动目标延迟浸没透镜电子光学聚焦,偏转和信号采集系统及方法

    公开(公告)号:US20040046125A1

    公开(公告)日:2004-03-11

    申请号:US10601124

    申请日:2003-06-20

    Inventor: Zhong-Wei Chen

    CPC classification number: H01J37/28 H01J37/141 H01J2237/04756 H01J2237/1035

    Abstract: A swinging objective retarding immersion lens system and method therefore which provide a low voltage electron beam with high beam current, relatively high spatial resolution, a relative large scan field, and high signal collection efficiency. The objective lens includes a magnetic lens for generating a magnetic field in the vicinity of the specimen to focus the particles of the particle beam on the specimen, an electrode having a potential for providing a retarding field to the particle beam near the specimen to reduce the energy of the particle beam when the beam collides with the specimen; a deflection system including a plurality of deflection units situated along the beam axis for deflecting the particle beam to allow scanning on the specimen with large area, at least one of the deflection units located in the retarding field of the beam, the remainder of the deflection units located within the central bore of the magnetic lens; and a annular detection unit with a relatively small aperture, located underneath the primary beam define aperture, to capture secondary electron (SE) and backscattered electrons (BSE).

    Abstract translation: 一种摆动物镜延迟浸没透镜系统及其方法,其提供具有高光束电流的低电压电子束,相对高的空间分辨率,相对大的扫描场和高的信号收集效率。 物镜包括用于在样本附近产生磁场以将粒子束的粒子聚焦在样本上的磁性透镜,具有向样本附近的粒子束提供延迟场的电位的电极,以减少 当光束与样品碰撞时,粒子束的能量; 偏转系统包括沿着光束轴线设置的多个偏转单元,用于偏转粒子束以允许对具有大面积的样本进行扫描,位于光束的延迟场中的至少一个偏转单元,偏转的剩余部分 位于磁性透镜的中心孔内的单元; 和具有相对较小孔径的环形检测单元,位于主光束下方限定孔,以捕获二次电子(SE)和反向散射电子(BSE)。

    Scanning electron microscope
    28.
    发明申请
    Scanning electron microscope 有权
    扫描电子显微镜

    公开(公告)号:US20040016882A1

    公开(公告)日:2004-01-29

    申请号:US10615864

    申请日:2003-07-10

    Applicant: Hitachi, Ltd,

    Abstract: An object of the present invention is to provide a scanning electron microscope for reducing a process concerning inspection positioning or an input operation, thereby functioning with high precision at high speed. To accomplish the above object, the present invention provides a scanning electron microscope having a finction for identifying a desired position on the basis of a pattern registered beforehand, which includes a means for setting information concerning the pattern kind, the interval between a plurality of parts constituting the pattern, and the size of parts constituting the pattern and a means for forming a pattern image composed of a plurality of parts on the basis of the information obtained by the concerned means.

    Abstract translation: 本发明的目的是提供一种用于减少与检查定位或输入操作相关的处理的扫描电子显微镜,从而以高速度高精度地运行。 为了实现上述目的,本发明提供了一种扫描电子显微镜,其具有用于基于预先登记的图案来识别期望位置的装置,其包括用于设置关于图案种类的信息的装置,多个部分之间的间隔 构成图案的部分,以及构成图案的部分的尺寸,以及基于由相关装置获得的信息形成由多个部分组成的图案图像的装置。

    Electron microscope, method for operating the same, and computer-readable medium
    29.
    发明申请
    Electron microscope, method for operating the same, and computer-readable medium 失效
    电子显微镜,其操作方法和计算机可读介质

    公开(公告)号:US20030193025A1

    公开(公告)日:2003-10-16

    申请号:US10410131

    申请日:2003-04-10

    Inventor: Shigenori Takagi

    CPC classification number: H01J37/28 H01J2237/22

    Abstract: In an operation of an electron microscope, at least a spot size of an electron beam on a specimen, an acceleration voltage, a detector type, a specimen position, and an observation magnification are set as a predetermined image observation condition and an observation image is picked up under the predetermined image observation condition. Different image observation conditions are automatically set based on the observation image. A plurality of observation images are picked up based on the setup image observation conditions. The plurality of picked-up observation images are simultaneously displayed on a second display section. A desired observation image is selected from among the observation images displayed on the second display section. The selected observation image is displayed on a first display section on an enlarged scale.

    Abstract translation: 在电子显微镜的操作中,将样本上的电子束的至少点尺寸,加速电压,检测器类型,样本位置和观察倍率设置为预定图像观察条件,并且观察图像为 在预定图像观察条件下拾起。 基于观察图像自动设定不同的图像观察条件。 基于设置图像观察条件来拾取多个观察图像。 多个拾取观察图像同时显示在第二显示部分上。 从显示在第二显示部分上的观察图像中选择期望的观察图像。 所选择的观察图像以放大比例显示在第一显示部分上。

    Method and apparatus for measuring thickness of thin film
    30.
    发明申请
    Method and apparatus for measuring thickness of thin film 失效
    测量薄膜厚度的方法和装置

    公开(公告)号:US20030132381A1

    公开(公告)日:2003-07-17

    申请号:US10336766

    申请日:2003-01-06

    CPC classification number: G01B15/02 H01J2237/2815

    Abstract: A film thickness measuring apparatus applies an electron beam to a thin film as a measurement object formed on a substrate, and measures a value of substrate current that flows in the substrate thereupon. The film thickness measuring apparatus corrects the substrate current value taking into account an influence of a charge distribution generated in the neighborhood of the thin film due to the application of the electron beam or an influence of a configuration of the surface of the substrate in the neighborhood of the thin film. The film thickness measuring apparatus acquires reference data representing a correlation between film thicknesses and substrate current values with respect to standard samples and calculates a thickness of the thin film from the corrected substrate current value taking into account the reference data.

    Abstract translation: 膜厚测量装置将电子束作为形成在基板上的测量对象的薄膜施加电子束,并测量在其中流过衬底的衬底电流的值。 考虑到由于施加电子束而导致在薄膜附近产生的电荷分布的影响或者邻近的基板表面的构成的影响,膜厚测量装置校正了衬底电流值 的薄膜。 膜厚测量装置获取表示相对于标准样品的膜厚度和衬底电流值之间的相关性的参考数据,并且从校正的衬底电流值考虑参考数据计算薄膜的厚度。

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