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公开(公告)号:US20220193829A1
公开(公告)日:2022-06-23
申请号:US17479457
申请日:2021-09-20
Applicant: Samsung Display Co., Ltd.
Inventor: Cheol Min Park , Byung Hoon Kang , Seung Kim , Seung Ho Kim , Woo Suk Seo , Hoi Kwan Lee
IPC: B23K26/40 , B23K26/364
Abstract: A manufacturing method of a display device includes: forming a laminate by laminating resins on first and second side surfaces of a glass; removing the resins along a laser irradiation line by irradiating a laser on the laminate; separating the laminate into a plurality of laminates by performing primary etching using an etching liquid composition; vertically stacking the plurality of laminates; and performing secondary chemical etching on a structure formed by stacking the plurality of laminates.
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公开(公告)号:US12195385B2
公开(公告)日:2025-01-14
申请号:US17317370
申请日:2021-05-11
Applicant: SAMSUNG DISPLAY CO., LTD.
Inventor: Gyu In Shim , Byung Hoon Kang , Seung Kim , Seung Ho Kim , Su Jin Sung
IPC: C03C19/00 , B24B7/24 , H10K50/844 , H10K59/12 , H10K59/40 , H10K71/00 , H10K77/10 , H10K102/00
Abstract: A glass manufacturing apparatus includes a support configured to hold a glass including a first flat portion, a second flat portion, and a curved portion connecting one side of the first flat portion and one side of the second flat portion. The support includes a first flat surface supporting the first flat portion, a second flat surface facing the first flat surface and supporting the second flat portion, and a curved surface connecting the flat surface to the second flat surface and supporting the curved portion.
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公开(公告)号:US11639309B2
公开(公告)日:2023-05-02
申请号:US16931142
申请日:2020-07-16
Applicant: Samsung Display Co., LTD.
Inventor: Byung Hoon Kang , Seung Kim , Gyu In Shim , Hoi Kwan Lee
Abstract: A glass product includes: a first compressive region at a first surface; a second compressive region at a second surface; and a tensile region between the first and second compression regions. A stress profile of the first compressive region includes a first trend line between the first surface and a first transition point, a second trend line between the first transition point and a second transition point, and a third trend line between the second transition point and a point at a first compression depth from the first surface. A depth from the first surface to the first transition point is 10 μm or less, a stress at the first transition point is 200 MPa or greater, a depth from the first surface to the second transition point is 50 μm to 80 μm, and a stress at the second transition point is 40 MPa to 100 MPa.
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公开(公告)号:US20220088741A1
公开(公告)日:2022-03-24
申请号:US17348745
申请日:2021-06-15
Applicant: SAMSUNG DISPLAY CO., LTD.
Inventor: Gyu In SHIM , Byung Hoon Kang , Seung Kim , Seung Ho Kim
Abstract: A glass polishing apparatus includes a jig that holds a glass structure. The glass polishing apparatus includes a first flat portion, a second flat portion opposite to the first flat portion, and a curved portion connecting the first flat portion to the second flat potion The jig and includes a first holding surface holding the first flat portion, a second holding surface disposed opposite to the first holding surface and holding the second flat portion, and a third holding surface connecting the first holding surface to the second holding surface and holding the curved portion. At least a portion of a roller unit having a cylindrical shape is inserted between the first flat portion and the second flat portion.
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公开(公告)号:US11145846B2
公开(公告)日:2021-10-12
申请号:US16798924
申请日:2020-02-24
Applicant: Samsung Display Co., Ltd.
Inventor: Seung Jun Moon , Byung Hoon Kang , Dong Kyun Seo , Hee Kyun Shin , Jun Ho Sim , Woo Jin Cho
Abstract: An apparatus and a method for manufacturing a display device are provided. An apparatus for manufacturing a display device includes a first unit configured to remove impurities of a support substrate, a second unit configured to form a sacrificial layer on the support substrate, a third unit configured to form a flexible substrate on the sacrificial layer, and a fourth unit configured to form a display unit on the flexible substrate. The second unit includes a moving unit movable in a first direction to receive the support substrate, a first supply nozzle configured to spray a solution onto the support substrate to coat a graphene oxide layer, and a second supply nozzle configured to dry the graphene oxide layer coated on the support substrate while removing a portion of the graphene oxide layer, to form the sacrificial layer.
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公开(公告)号:US10930895B2
公开(公告)日:2021-02-23
申请号:US15967750
申请日:2018-05-01
Applicant: SAMSUNG DISPLAY CO., LTD.
Inventor: Hee Kyun Shin , Seung Jun Moon , Byung Hoon Kang , Min Woo Lee , Woo Jin Cho
Abstract: A display device includes a base, a light emitting device on a first surface of the base, and a plate-like inorganic layer on a second surface of the base, the plate-like inorganic layer including a first plate-like inorganic particle with a first size and a second plate-like inorganic particle with a second size different from the first size.
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公开(公告)号:US20200321563A1
公开(公告)日:2020-10-08
申请号:US16798924
申请日:2020-02-24
Applicant: Samsung Display Co., Ltd.
Inventor: Seung Jun Moon , Byung Hoon Kang , Dong Kyun Seo , Hee Kyun Shin , Jun Ho Sim , Woo Jin Cho
IPC: H01L51/56
Abstract: An apparatus and a method for manufacturing a display device are provided. An apparatus for manufacturing a display device includes a first unit configured to remove impurities of a support substrate, a second unit configured to form a sacrificial layer on the support substrate, a third unit configured to form a flexible substrate on the sacrificial layer, and a fourth unit configured to form a display unit on the flexible substrate. The second unit includes a moving unit movable in a first direction to receive the support substrate, a first supply nozzle configured to spray a solution onto the support substrate to coat a graphene oxide layer, and a second supply nozzle configured to dry the graphene oxide layer coated on the support substrate while removing a portion of the graphene oxide layer, to form the sacrificial layer.
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公开(公告)号:US10438976B2
公开(公告)日:2019-10-08
申请号:US16243702
申请日:2019-01-09
Applicant: SAMSUNG DISPLAY CO., LTD.
Inventor: Hyun Jin Cho , Joon-Hwa Bae , Byoung Kwon Choo , Byung Hoon Kang , Kwang Suk Kim , Woo Jin Cho , Jun Hyuk Cheon
IPC: H01L27/12 , H01L21/3105 , G09G3/3233 , C09G1/02 , B24B31/00 , H01L27/32 , H01L21/02 , H01L29/786 , H01L21/66
Abstract: A method for manufacturing a display device includes forming a first gate metal wire on a substrate, forming a first insulation layer that covers the first gate metal wire, forming a second gate metal wire on the first insulation layer, forming a second main insulation layer that covers the second gate metal wire, forming a second auxiliary insulation layer on the second main insulation layer, forming an exposed portion of an upper surface of the second main insulation layer by polishing the second auxiliary insulation layer, and forming a first data metal wire on the second main insulation layer and the second auxiliary insulation layer.
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公开(公告)号:US10424762B2
公开(公告)日:2019-09-24
申请号:US16155413
申请日:2018-10-09
Applicant: Samsung Display Co., Ltd.
Inventor: Byung Hoon Kang , Seung Jun Moon , Hee Kyun Shin , Min-Woo Lee , Woo Jin Cho
Abstract: A method for manufacturing a transparent display device includes: providing a transparent flexible substrate on a support substrate; forming a display unit on a front side of the transparent flexible substrate; separating the transparent flexible substrate from the support substrate; and cleaning a rear side of the transparent flexible substrate with plasma.
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公开(公告)号:US10199405B2
公开(公告)日:2019-02-05
申请号:US15671638
申请日:2017-08-08
Applicant: SAMSUNG DISPLAY CO., LTD.
Inventor: Joon-Hwa Bae , Byoung Kwon Choo , Byung Hoon Kang , Woo Jin Cho , Hyun Jin Cho , Jun Hyuk Cheon , Jee-Hyun Lee
IPC: H01L27/12 , H01L21/02 , H01L29/786 , H01L21/306 , H01L21/3105 , H01L21/321 , H01L29/66 , H01L21/768
Abstract: A method of manufacturing a transistor display panel and a transistor display panel, the method including forming a polycrystalline silicon layer on a substrate; forming an active layer by patterning the polycrystalline silicon layer; forming a first insulating layer covering the substrate and the active layer; exposing the active layer by polishing the first insulating layer using a polishing apparatus; and forming a second insulating layer that contacts the first insulating layer and the active layer, wherein exposing the active layer by polishing the first insulating layer includes coating a first slurry on a surface of the first insulating layer, the first slurry reducing a polishing rate of the active layer.
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