Abstract:
The present invention is a compound sliding seal unit of markedly reduced size and height dimensions which is employed as a discrete assembly for both the passage across and the at-will height adjustment of a mounted, rotatable shaft which extends from the atmospheric environment portion into the vacuum environmental portion of an ion implanter apparatus. The extended, rotatable shaft is typically fashioned as either a rotatable hollow tube or conduit (suitable for the passage of electrical components) and/or as a rotatable support suitable for the mounting of a pivotal scanning radial arm translation system.The manner of construction and the substantially reduced height dimensions of the compound sliding seal unit permits on-demand changes of height for the mounted, rotatable shaft which extends from the atmospheric environment and extends through the compound unit into the confined and limited spatial volume of a vacuum environment within a conventional ion implantation apparatus. The compound unit also allows the user to maintain a high vacuum within the vacuum environment despite the fact that the height of the feed-through member can be raised and lowered repeatedly at will. Its compact size frees space which can be used to extend the vacuum chamber for purposes such as a deep Faraday cup for beam measurement.
Abstract:
An electromagnetic regulator assembly for the production of contiguous magnetic fields which are applied to a continuous ion beam is described. The assembly is structured for controlling the uniformity of traveling continuous ribbon-shaped beams; and allows for direct adjustment of the magnetic field gradient of the magnetic field as the parameter for increasing the current uniformity.
Abstract:
Methods and apparatus are provided for scanning a charged particle beam. The apparatus includes scan elements and a scan signal generator for generating scan signals for scanning the charged particle beam in a scan pattern having a scan origin. In one embodiment, the apparatus includes a position controller for positioning the scan elements based on a parameter of the charged particle beam, such as energy. The scan elements may be positioned to achieve a fixed position of the scan origin for different beam energies. In another embodiment, the apparatus includes first and second sets of scan elements and a scan signal controller for controlling the scan signals supplied to the sets of scan elements based on a parameter of the charged particle beam, such as energy. The scan signal controller may control the ratio of the scan signals applied to the sets of scan elements, or may deenergize a set of scan elements, to minimize space charge forces on the charged particle beam that may reduce beam transmission through the apparatus.
Abstract:
A compact high current broad beam ion implanter capable of serial processing employs a high current density source, an analyzing magnet to direct a desired species through a resolving slit, and a second magnet to deflect the resultant beam while rendering it parallel and uniform along its width dimension. Both magnets have relatively large pole gaps, wide input and output faces, and deflect through a small radius of curvature to produce a beam free of instabilities. Multipole elements incorporated within at least one magnet allow higher order aberrations to be selectively varied to locally adjust beam current density and achieve the high degree of uniformity along the beam width dimension.