公开(公告)号：US5061070A

公开(公告)日：1991-10-29

申请号：US184639

申请日：1988-04-22

Applicant: John S. Batchelder ,  Donald M. DeCain ,  Marc A. Taubenblatt ,  Hermantha K. Wickramasinghe ,  Clayton C. Williams

Inventor： John S. Batchelder ,  Donald M. DeCain ,  Marc A. Taubenblatt ,  Hermantha K. Wickramasinghe ,  Clayton C. Williams

IPC: G01N15/14 ,  G01J9/02 ,  G01N15/00 ,  G01N15/02 ,  G01N15/06 ,  G01N21/23 ,  G01N21/45 ,  G01N21/94

CPC classification number: G01N21/45 ,  G01J2009/0261 ,  G01N2015/0011 ,  G01N2015/0053 ,  G01N2015/0238 ,  G01N21/94

Abstract: A method and apparatus for monitoring process fluids used in the manufacture of semiconductor components and other microelectronic devices relies upon detection of the phase shift of a pair of optical energy beams encountering a bubble or particle in the fluid. The system distinguishes between bubbles and particles having indices of refraction greater than the surrounding fluid and between different types and sizes of particles.

公开(公告)号：US5037202A

公开(公告)日：1991-08-06

申请号：US547735

申请日：1990-07-02

Applicant: John S. Batchelder ,  Marc A. Taubenblatt

Inventor： John S. Batchelder ,  Marc A. Taubenblatt

IPC: G01J9/02 ,  G01N15/02 ,  G01N15/14 ,  G01N21/21 ,  G01N21/45

CPC classification number: G01N15/0205 ,  G01J2009/0261 ,  G01N15/1434 ,  G01N2015/0238 ,  G01N21/45

Abstract: An apparatus is described for classifying particles and includes an optical system for transmitting to a focal plane which includes at least one particle, two substantially parallel optical beams, the beams being initially mutually coherent but of different polarizations. The beams are displaced and focused in the focal plane. A further optical system is positioned in the path which the beam takes after depating from the focal plane and combines the beams so that a particle-induced phase shift in one beam is manifest by a change in elliptical polarization of the combined beams. A first detector is responsive to the beam's intensity along a first polarization axis to produce a first output and a second detector is responsive to the beams intensity along a second polarization axis to produce a second output. The first and second outputs are added to provide an extinction signal and, in a separate device, are subtracted to provide to phase shift signal. The extinction signal and phase shift signal are both fed to a processor which classifies a particle in accordance therewith.

公开(公告)号：US4969198A

公开(公告)日：1990-11-06

申请号：US194610

申请日：1988-05-16

Applicant: John S. Batchelder ,  Raymond E. Bonner ,  Byron E. Dom ,  Robert S. Jaffe

Inventor： John S. Batchelder ,  Raymond E. Bonner ,  Byron E. Dom ,  Robert S. Jaffe

IPC: G06T7/00

CPC classification number: G06T7/001 ,  G03F7/7065 ,  G06T2207/10056 ,  G06T2207/30141 ,  G06T2207/30148

Abstract: A method and apparatus for automatic inspection of periodic patterns typically found on patterned silicon wafers, printed circuit board, and the like is disclosed herein. The method comprises an inspection algorithm of two parts: a low-level algorithm and a higher level algorithm. The low-level algorithm utilizes the known periodically of the pattern to find defects by comparing identical cells in the periodic array. The high-level algorithm applies the low-level algorithm, some number of times (N) in succession on the image; accumulates defective pixels to form a separate image; and then applies a threshold-sort operation on a neighborhood to determine center pixel defectiveness.The apparatus for implementing the above method comprises a parallel/pipeline architecture for high speed processing and RAM LUT's to implement a plurality of subtract and compare functions.

Abstract translation: 本文公开了用于自动检查在图案化硅晶片，印刷电路板等上通常发现的周期性图案的方法和装置。 该方法包括两部分的检查算法：低级算法和较高级算法。 低级算法利用周期性周期性的模式来通过比较周期性阵列中的相同单元来找到缺陷。 高级算法在图像上连续应用低级算法，次数（N）; 累积缺陷像素以形成单独的图像; 然后对邻域应用阈值分类操作，以确定中心像素缺陷。 用于实现上述方法的装置包括用于高速处理的并行/流水线架构和RAM LUT以实现多个减法和比较功能。