公开(公告)号：US20150226684A1

公开(公告)日：2015-08-13

申请号：US14696852

申请日：2015-04-27

Applicant: HITACHI HIGH-TECH SCIENCE CORPORATION

Inventor： Xin MAN ,  Toshiaki FUJII

IPC: G01N23/203

CPC classification number: G01N23/203

Abstract: A crystal analysis apparatus includes: a measurement data storage configured to store electron back-scattering pattern (EBSP) data measured at electron beam irradiation points on a plurality of cross-sections of a sample formed substantially in parallel at prescribed intervals; a crystal orientation database configured to accumulate therein information of crystal orientations corresponding to EBSPs; and a map constructing unit that constructs a three-dimensional crystal orientation map based on distribution of crystal orientations in normal directions of a plurality of faces of a polyhedral image having the cross-sections arranged at the prescribed intervals by reading out the crystal orientations in the normal directions of the faces from the crystal orientation database on the basis of the EBSP data stored in the measurement data storage.

Abstract translation: 晶体分析装置包括：测量数据存储器，被配置为存储在电子束照射点处测量的电子后向散射图案（EBSP）数据，所述数据基本上以规定间隔大致平行地形成的样品的多个横截面上; 晶体取向数据库，其被配置为在其中累积与EBSP对应的晶体取向的信息; 以及地图构造单元，其基于通过读出所述三维晶体取向图中的晶体取向，以基于以规定间隔布置的多面体图像的多个面的多个面的正交方向的分布来构造三维晶体取向图 根据存储在测量数据存储器中的EBSP数据，从晶体取向数据库的面的法线方向。

公开(公告)号：US20150206706A1

公开(公告)日：2015-07-23

申请号：US14601478

申请日：2015-01-21

Applicant: HITACHI HIGH-TECH SCIENCE CORPORATION

Inventor： Xin MAN

IPC: H01J37/26 ,  H01J37/305 ,  H01J37/20

CPC classification number: H01J37/20 ,  H01J37/28 ,  H01J37/3056 ,  H01J2237/2007 ,  H01J2237/20214 ,  H01J2237/2802 ,  H01J2237/31749

Abstract: A charged particle beam apparatus includes an electron beam column and an FIB column, in which an irradiation axis of the electron beam column and an irradiation axis of the FIB column are disposed to be perpendicular or substantially perpendicular to each other on a sample without interference. In addition, the first sample stage and a second sample stage are independently provided and moved to be tilted centering on an axial direction. The sample is moved by the first sample stage and a sample piece which is cut off from the sample is moved to be fixed to a tip end of a probe which is rotatable centering on the axial direction, thereby manufacturing the sample piece which reduces the influence of a curtaining effect.

Abstract translation: 带电粒子束装置包括电子束柱和FIB柱，其中电子束柱的照射轴和FIB柱的照射轴线在样本上彼此垂直或基本上垂直于无干扰。 此外，第一样品台和第二样品台独立地设置并移动成以轴向为中心倾斜。 样品通过第一样品台移动，并且从样品切下的样品片移动以固定到可以轴向旋转的探针的末端，从而制造减少影响的样品片 的效果。

公开(公告)号：US20130248735A1

公开(公告)日：2013-09-26

申请号：US13840311

申请日：2013-03-15

Applicant: HITACHI HIGH-TECH SCIENCE CORPORATION

Inventor： Xin MAN ,  Yo YAMAMOTO ,  Atsushi UEMOTO ,  Tatsuya ASAHATA

IPC: H01J37/20

CPC classification number: H01J37/20 ,  H01J37/023 ,  H01J37/3005 ,  H01J2237/0245

Abstract: Provided is a composite charged particle beam apparatus, including: an electron beam column for irradiating a sample with an electron beam; an ion beam column for irradiating the sample with an ion beam to perform etching processing; a sample stage drive portion for moving a sample stage in an irradiation axis direction of the electron beam; and a column adjusting portion for moving the ion beam column relatively to a sample chamber such that the sample is irradiated with the ion beam at a position irradiated with the electron beam.

Abstract translation: 提供一种复合带电粒子束装置，包括：用于用电子束照射样品的电子束柱; 离子束柱，用离子束照射样品进行蚀刻处理; 用于在电子束的照射轴方向移动样品台的样品台驱动部分; 以及用于相对于样品室移动离子束柱的柱调节部分，使得样品在被电子束照射的位置处被离子束照射。

公开(公告)号：US20130248708A1

公开(公告)日：2013-09-26

申请号：US13845608

申请日：2013-03-18

Applicant: HITACHI HIGH-TECH SCIENCE CORPORATION

Inventor： Xin MAN

IPC: H01J37/22

CPC classification number: H01J37/3053 ,  G01N1/32 ,  G01N23/2202 ,  H01J2237/226 ,  H01J2237/31745

Abstract: A cross-section processing and observation method including: acquiring a surface image by scanning and irradiating a surface of a sample with ion beam; setting, on the surface image, a first sliced region and a second sliced region for performing the slice processing, the second sliced region being adjacent to the first sliced region and having a longitudinal length obtained by subtracting a slice width of the second sliced region from a longitudinal length of the first sliced region; forming a cross-section by irradiating the first sliced region and the second sliced region with the ion beam; and acquiring a cross-sectional image by irradiating the cross-section with electron beam.

Abstract translation: 一种横截面处理和观察方法，包括：通过用离子束扫描和照射样品的表面来获取表面图像; 在所述表面图像上设置用于执行所述切片处理的第一切片区域和第二切片区域，所述第二切片区域与所述第一切片区域相邻，并且具有通过从所述第二切片区域从所述第二切片区域的切片宽度 所述第一切片区域的纵向长度; 通过用离子束照射第一切片区域和第二切片区域来形成横截面; 以及通过用电子束照射横截面来获取横截面图像。