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公开(公告)号：US10225918B2
公开(公告)日：2019-03-05
申请号：US16055274
申请日：2018-08-06
Applicant: GIGAPHOTON INC.
Inventor： Yuichi Nishimura , Takayuki Yabu
Abstract: An extreme ultraviolet light generating apparatus moves a generation position of extreme ultraviolet light based on an instruction from an external device and includes a chamber in which a target fed therein is irradiated with laser light so that the extreme ultraviolet light is generated from the target; a target feeder configured to output and feed the target into the chamber; a condensing mirror configured to condense the laser light on the target fed into the chamber; a stage configured to regulate a position of the target feeder; a manipulator configured to regulate a position of the condensing mirror; and a control unit configured to be able to control at least one of the stage, the manipulator, and a radiation timing of the laser light to the target, in a feedforward method, when the generation position is moved during generation of the extreme ultraviolet light.
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公开(公告)号：US10225917B2
公开(公告)日：2019-03-05
申请号：US16001441
申请日：2018-06-06
Applicant: GIGAPHOTON INC.
Inventor： Takahisa Fujimaki , Takayuki Yabu , Yuta Takashima , Fumio Iwamoto , Yutaka Shiraishi
Abstract: A target supply device may include a nozzle configured to output a liquid target substance contained in a tank, an excitation element, a droplet detection unit configured to detect a droplet output from the nozzle, a passage time interval measurement unit configured to measure a passage time interval of droplets, and a control unit. The control unit may be configured to set a proper range of the passage time interval, change the duty value of the electric signal to be input to the excitation element, store the passage time interval measurement values of the droplets generated with respect to a plurality of duty values and variation thereof in association with the duty values, and determine an operation duty value based on the variation from among the duty values with which the passage time interval measurement values are within the proper range, among the duty values.
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公开(公告)号：US09686845B2
公开(公告)日：2017-06-20
申请号：US15361120
申请日：2016-11-25
Applicant: GIGAPHOTON INC.
Inventor： Toru Suzuki , Takayuki Yabu
Abstract: A target sensor may include: a plurality of sensor elements, each of the plurality of sensor elements being configured to output a sensor signal that varies in accordance with an amount of light received on a light-receiving surface; and a signal generator configured to process the sensor signals from the plurality of sensor elements. The light-receiving surfaces of the plurality of sensor elements may be disposed at different positions in a second direction different from a first direction along which an image of the target illuminated by the illumination light may move. The signal generator may be configured to compare each of the sensor signals from the plurality of sensor elements with a threshold and output the signal indicating detection of a target to the controller in a case where at least one of the sensor signals from the plurality of sensor elements may exceed the threshold.
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24.发明授权公开(公告)号：US09661730B2
公开(公告)日：2017-05-23
申请号：US15151025
申请日：2016-05-10
Applicant: Gigaphoton Inc.
Inventor： Atsushi Ueda , Takayuki Yabu , Osamu Wakabayashi , Georg Soumagne , Takashi Saito
IPC: H05G2/00
Abstract: An extreme ultraviolet light generation apparatus may include: a chamber; a target supply unit configured to output a target toward a predetermined region inside the chamber; a first gas supply unit configured to blow out gas in a first direction toward a trajectory of the target between the target supply unit and the predetermined region; and a focusing optical system configured to concentrate a pulse laser beam to the predetermined region.
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公开(公告)号：US11219116B1
公开(公告)日：2022-01-04
申请号：US17314775
申请日：2021-05-07
Applicant: Gigaphoton Inc.
Inventor： Yuta Takashima , Yuichi Nishimura , Takayuki Yabu , Yoshifumi Ueno
Abstract: An extreme ultraviolet light generation system may include an irradiation position adjustment mechanism adjusting an irradiation position of the laser light; an extreme ultraviolet light sensor measuring energy of extreme ultraviolet light; a return light sensor measuring energy of return light traveling backward on the laser light path; and a processor controlling the irradiation position adjustment mechanism. The processor stores measurement results of the extreme ultraviolet light energy and the return light energy in association with each of the irradiation positions, limits a shift region of the irradiation position based on comparison between the return light energy and a threshold, and determines a target irradiation position based on the association between the irradiation position and the extreme ultraviolet light energy in a region where the return light energy does not exceed the threshold, and controlling the irradiation position adjustment mechanism in accordance with the target irradiation position.
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Patent Agency Ranking
公开(公告)号：US11043784B2
公开(公告)日：2021-06-22
申请号：US16595782
申请日：2019-10-08
Applicant: Gigaphoton Inc.
Inventor： Tsukasa Hori , Yoshifumi Ueno , Takayuki Yabu , Yoshiaki Kurosawa
Abstract: A laser apparatus includes: a plurality of envelope blocks each provided with an optical element and a first temperature sensor and covering part of a laser beam path, the optical element being disposed on the laser beam path, the first temperature sensor being configured to measure a first temperature of gas at a position away from the optical element; an envelope body including the envelope blocks and covering the laser beam path; and a control unit connected with each first temperature sensor and configured to specify an envelope block at which increase of the first temperature is measured in the envelope body as an envelope block at which anomaly is occurring.
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27.发明授权公开(公告)号：US10251254B2
公开(公告)日：2019-04-02
申请号：US16055279
申请日：2018-08-06
Applicant: Gigaphoton Inc.
Inventor： Yuichi Nishimura , Takayuki Yabu
Abstract: An extreme ultraviolet light generating apparatus includes: EUV light sensors configured to measure energy of extreme ultraviolet light from mutually different directions, the extreme ultraviolet light being generated by applying laser light to a target supplied to a predetermined region in a chamber; an application position adjusting unit configured to adjust an application position of the laser light to the target supplied to the predetermined region; and a controller configured to control the application position adjusting unit such that a centroid of the extreme ultraviolet light becomes a targeted centroid, the centroid of the extreme ultraviolet light being specified from measurement results of the EUV light sensors, the controller controlling the application position adjusting unit such that the application position is scanned in accordance with reference scan points mutually different in position, and calibrating the targeted centroid based on the measurement results acquired for the reference scan points.
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公开(公告)号：US10172224B2
公开(公告)日：2019-01-01
申请号：US15351988
申请日：2016-11-15
Applicant: Gigaphoton Inc.
Inventor： Takayuki Yabu , Hirokazu Hosoda , Takuya Ishii
Abstract: An extreme ultraviolet light generation apparatus may include: a chamber in which extreme ultraviolet light is generated from plasma generated by irradiating a target supplied into the chamber with a laser beam; a target generator that supplies the target into the chamber as a droplet; a droplet measurement unit that measures the droplet supplied from the target generator into the chamber; and a shielding member that shields the droplet measurement unit from electromagnetic waves emitted from the plasma, the droplet measurement unit including: a light source that emits continuous light to the droplet; a window provided in the chamber to allow the continuous light to transmit therethrough; and an optical sensor that receives the continuous light via the window. The shielding member includes a shielding body provided on the chamber side with respect to the window and configured to cover an optical path of the continuous light.
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公开(公告)号：US10102938B2
公开(公告)日：2018-10-16
申请号：US15953774
申请日：2018-04-16
Applicant: Gigaphoton Inc.
Inventor： Takayuki Yabu , Tamotsu Abe , Kenichi Miyao , Tooru Abe
Abstract: An extreme ultraviolet light generating apparatus may include a chamber including a window to allow first and second pulse laser beams to enter, a mirror to reflect the first pulse laser beam, a first actuator to control a position or a posture of the mirror, a beam combiner to cause optical paths of the first and second pulse laser beams to substantially coincide with each other, a reflective optical system to reflect the first and second pulse laser beams from the beam combiner, a second actuator to control a position or a posture of the reflective optical system, sensors each configured to output data for detecting a position of an optical path of the first pulse laser beam, and a controller to control the first actuator based on the data and control the second actuator based on a value related to control of the first actuator.
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公开(公告)号：US09310686B2
公开(公告)日：2016-04-12
申请号：US13953350
申请日：2013-07-29
Applicant: GIGAPHOTON INC.
Inventor： Takayuki Yabu , Tamotsu Abe
CPC classification number: G03F7/2004 , B05B5/0255 , B05B5/0531 , B05B12/02 , G03F7/70033 , H05G2/003
Abstract: A target supply method uses a target supply device that includes a target generation unit having a nozzle, a pressure control unit having a pressure sensor and an actuator, an electrode, a potential application unit, and a timer; further, the method include raising the pressure inside the target generation unit to a setting pressure by the actuator, applying different potentials to the electrode and a target material from each other by the potential application unit in the case where it is detected that the pressure inside the target generation unit is halfway raised to the setting pressure, and applying a constant first potential to the target material and a first pulse voltage to the electrode by the potential application unit to extract the target material with electrostatic force in the case where it is detected that the pressure inside the target generation unit has been raised to the setting pressure.
Abstract translation: 目标供给方法使用包括具有喷嘴的目标产生单元，具有压力传感器和致动器的压力控制单元，电极，潜在施加单元和定时器的目标供给装置; 此外，该方法包括：通过致动器将目标产生单元内的压力升高到设定压力，在检测到内部的压力的情况下，通过潜在施加单元在电极和目标材料之间施加不同的电位 目标产生单元中途升高到设定压力，并且通过潜在施加单元向目标材料施加恒定的第一电位和第一脉冲电压，以在检测到的情况下用静电力提取目标材料 目标产生单元内的压力已升至设定压力。
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