摘要:
A power-on reset circuit is provided which uses a dual voltage detection circuit to output a voltage detection signal. The dual voltage detection circuit is coupled to a first supply voltage terminal, a second supply voltage terminal, and a ground terminal. The voltage detection signal indicates whether the first supply voltage provided on the first supply voltage terminal is greater than an adequate voltage level. Furthermore, the voltage detection signal is driven by circuits powered by a second supply voltage provided on the second supply voltage terminal. One embodiment of the dual-voltage detection circuit comprises a first transistor coupled in series with a second transistor between the first supply voltage terminal and the ground terminal, as well as a third transistor coupled in series with a fourth transistor between the second supply voltage terminal and the ground terminal. Furthermore, some embodiments of the present invention also include a low pass filter coupled to the dual-voltage detection circuit to prevent spurious noise and ground bounces from causing a reset.
摘要:
An integrated circuit can include a processor system configured to execute program code. The processor system can be hard-wired and include a processor hardware resource. The IC also can include a programmable circuitry configurable to implement different physical circuits. The programmable circuitry can be coupled to the processor system. The programmable circuitry can be configurable to share usage of the processor hardware resource of the processor system. The processor system further can control aspects of the programmable circuitry such as power on and/or off and also configuration of the programmable circuitry to implement one or more different physical circuits therein.
摘要:
In one embodiment, a method and apparatus for configuring the internal memory cells of an integrated circuit through the logic fabric are disclosed. For example, an integrated circuit according to one embodiment includes a logic fabric and a plurality of input/output blocks coupled to the logic fabric, wherein the plurality of input/output blocks is positioned around the periphery of the logic fabric. The plurality of input/output blocks therefore forms a ring around the logic fabric, wherein a data path and a clock path are formed along the periphery of the logic fabric through the plurality of input/output blocks.
摘要:
An embodiment of a method to form a hybrid integrated circuit device is described. This embodiment of the method comprises: forming a first die using a first lithography, where the first die is on a substrate; and forming a second die using a second lithography, where the second die is on the first die. The first lithography used to form the first die is a larger lithography than the second lithography used to form the second die. The first die is an IO die.
摘要:
Formation of a hybrid integrated circuit device is described. A design for the integrated circuit is obtained and separated into at least two portions responsive to component sizes. A first die is formed for a first portion of the hybrid integrated circuit device using at least in part a first minimum dimension lithography. A second die is formed for a second portion of the device using at least in part a second minimum dimension lithography, where the second die has the second minimum dimension lithography as a smallest lithography used for the forming of the second die. The first die and the second die are attached to one another via coupling interconnects respectively thereof to provide the hybrid integrated circuit device.
摘要:
Formation of a hybrid integrated circuit device (400) is described. A design for the integrated circuit (100) is obtained and separated into at least two portions responsive to component sizes. A first die (200) is formed for a first portion of the hybrid integrated circuit device (400) using at least in part a first minimum dimension lithography. A second die (300) is formed for a second portion of the device using at least in part a second minimum dimension lithography, where the second die (300) has the second minimum dimension lithography as a smallest lithography used for the forming of the second die (300). The first die (200) and the second die (300) are attached to one another via coupling interconnects respectively thereof to provide the hybrid integrated circuit device (400).