公开(公告)号：US09356776B2

公开(公告)日：2016-05-31

申请号：US14265985

申请日：2014-04-30

Applicant: ELECTRONICS AND TELECOMMUNICATIONS RESEARCH INSTITUTE

Inventor： Seok Kap Ko ,  Seung Chul Son ,  Seung Hun Oh ,  Byung Tak Lee ,  Young Sun Kim

IPC: H04L29/06 ,  H04L9/08

CPC classification number: H04L9/0819 ,  H04L63/06 ,  H04L63/08

Abstract: Disclosed are a key managing system and method for sensor network security. The key managing system includes a secret key transmitter configured to transmit a portion of a secret key map, stored in a node, to a correspondent node, and transmit the secret key map of the node to the correspondent node by using the transmitted portion of the secret key map and an authenticator configured to acquire a trust level of the correspondent node which indicates a ratio of a total size of the secret key map of the node and a size of the secret key map transmitted to the correspondent node, compare the acquired trust level of the correspondent node and a threshold value, and authenticate the correspondent node and a message acquired from the correspondent node by using the comparison result.

Abstract translation: 公开了传感器网络安全的关键管理系统和方法。 密钥管理系统包括：秘密密钥发送器，被配置为将存储在节点中的秘密密钥映射的一部分传送到通信节点，并且通过使用所述传输的部分将所述节点的秘密密钥映射发送到对端节点 秘密密钥图和认证器，被配置为获取指示节点的秘密密钥映射的总大小与发送到对端节点的秘密密钥映射的大小的比率的通信节点的信任级别，比较获取的信任 通信节点的级别和阈值，并且通过使用比较结果来认证通信节点和从通信节点获取的消息。

公开(公告)号：US09129882B2

公开(公告)日：2015-09-08

申请号：US14500764

申请日：2014-09-29

Applicant: Electronics and Telecommunications Research Institute

Inventor： Eun Kyoung Jeon ,  Hyun Seo Kang ,  Kwon-Seob Lim ,  Hyoung Jun Park ,  Keo-Sik Kim ,  Jeong Eun Kim ,  Young Sun Kim ,  Young Soon Heo

IPC: H01L21/44 ,  H01L29/16 ,  H01L21/283 ,  H01L21/306 ,  H01L21/308

CPC classification number: H01L29/1606 ,  H01L21/3081

Abstract: Provided is a method of fabricating a graphene nano device. The method includes forming a first metal mask pattern on a substrate on which a graphene layer is formed, and forming a graphene pattern by performing an etching process on the graphene layer using the first metal mask pattern as an etching mask. The forming of the first metal mask pattern includes forming a first adhesive layer on the graphene layer, disposing the first metal mask pattern prepared in advance on the first adhesive layer, and heating the first adhesive layer to attach the first metal mask pattern on the substrate.

Abstract translation: 提供了一种制造石墨烯纳米器件的方法。 该方法包括在其上形成有石墨烯层的基板上形成第一金属掩模图案，并且通过使用第一金属掩模图案作为蚀刻掩模对石墨烯层进行蚀刻处理来形成石墨烯图案。 第一金属掩模图案的形成包括在石墨烯层上形成第一粘合剂层，将预先制备的第一金属掩模图案设置在第一粘合剂层上，并加热第一粘合剂层以将第一金属掩模图案附着在基板上 。